Patent classifications
C08G77/42
Resin composition, method for producing resin composition, film formation method, and cured product
A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component includes (I) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure.
Resin composition, method for producing resin composition, film formation method, and cured product
A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component includes (I) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure.
Crosslinked Polymers of Ethylene and Monocyclic Organosiloxane and Process
Disclosed is a process includes providing (A) an ethylene/MOCOS copolymer composed of (i) units derived from ethylene, (ii) from 0.01 wt % to 0.5 wt % units derived from a comonomer, and (iii) optionally units derived from a termonomer. The comonomer is a monocyclic organosiloxane (MOCOS) of formula (I) [R.sup.1, R.sup.2SiO.sub.2/2].sub.n wherein n is an integer greater than or equal to 3, each R.sup.1 is independently a (C.sub.2_C.sub.4) alkenyl or a H.sub.2C═C (R.sup.1a)—C(═O)—O—(CH.sub.2).sub.m_ wherein R.sup.1a is H or methyl; m is an integer from 1 to 4; and each R.sup.2 is independently H, (C.sub.1_C.sub.4) alkyl, phenyl, or R.sup.1. The process includes mixing (B) a free radical initiator with (A) the ethylene/MOCOS copolymer to form a mixture, heating the mixture, and forming a crosslinkable ethylene/MOCOS copolymer composition having a gel content greater than 70%.
Crosslinked Polymers of Ethylene and Monocyclic Organosiloxane and Process
Disclosed is a process includes providing (A) an ethylene/MOCOS copolymer composed of (i) units derived from ethylene, (ii) from 0.01 wt % to 0.5 wt % units derived from a comonomer, and (iii) optionally units derived from a termonomer. The comonomer is a monocyclic organosiloxane (MOCOS) of formula (I) [R.sup.1, R.sup.2SiO.sub.2/2].sub.n wherein n is an integer greater than or equal to 3, each R.sup.1 is independently a (C.sub.2_C.sub.4) alkenyl or a H.sub.2C═C (R.sup.1a)—C(═O)—O—(CH.sub.2).sub.m_ wherein R.sup.1a is H or methyl; m is an integer from 1 to 4; and each R.sup.2 is independently H, (C.sub.1_C.sub.4) alkyl, phenyl, or R.sup.1. The process includes mixing (B) a free radical initiator with (A) the ethylene/MOCOS copolymer to form a mixture, heating the mixture, and forming a crosslinkable ethylene/MOCOS copolymer composition having a gel content greater than 70%.
WATER-REPELLENT COMPOSITION
A water-repellent composition containing (1) a polymer having 2-100 wt %, with respect to the polymer, of a repeating unit derived from an amide group-containing monomer (a) represented by the following formula
##STR00001##
[wherein R.sup.1 is an organic moiety having an ethylenically unsaturated polymerizable group, R.sup.2 is a C.sub.7-30 hydrocarbon group, and R.sup.3 is a C.sub.1-5 hydrocarbon group], (2) a co-agent containing at least one co-agent compound selected from the group consisting of a blocked isocyanate compound, a melamine resin, a silicone polymer, a wax, an acetylene-based emulsifier, and a polyoxyalkylene group-containing emulsifier, and (3) a liquid media. Preferably, the water-repellent composition includes no fluoroalkyl group-containing monomer, and preferably no fluorine-containing monomer. Also disclosed is a method for producing the water-repellent composition, a method for treating a substrate with the water-repellent composition, and a method for producing a treated textile product which includes treating a textile product with the water-repellent composition.
AMORPHOUS SILICON FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND METHOD FOR PRODUCING AMORPHOUS SILICON FILM USING SAME
To provide an amorphous silicon forming composition, which has high affinity with a substrate, is excellent in filling properties, and is capable of forming a thick film. [Means for Solution] An amorphous silicon forming composition comprising: (a) a block copolymer comprising a linear and/or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon, wherein at least one silicon in the block A and at least one silicon in the block B are connected by a single bond and/or a crosslinking group comprising silicon, and (b) a solvent.
COMPOSITION COMPRISING AT LEAST ONE SILICONE ACRYLIC COPOLYMER AND AT LEAST ONE HYDROCARBON-BASED BLOCK COPOLYMER
The present invention relates to a composition comprising at least one silicone acrylic copolymer and at least one hydrocarbon-based block copolymer. The present invention also relates to a process for treating keratin fibers using a composition comprising at least one silicone acrylic copolymer and at least one hydrocarbon-based block copolymer.
COMPOSITION AND SILOXANE-BASED THERMOPLASTIC RESIN USING SAME, AND METHODS FOR PRODUCING SAME
To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially.
A composition containing a siloxane block-containing diol compound, wherein
the siloxane block-containing diol compound is represented by the following formula (I):
##STR00001##
wherein
R.sup.1 and R.sup.2 are each independently an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 30 carbon atoms which may have a substituent,
m is an integer of 1 to 25,
n is an integer of 3 to 200, and
Xs each independently represent any of the following formulae (I.sup.1) to (I.sup.6):
##STR00002##
COMPOSITION AND SILOXANE-BASED THERMOPLASTIC RESIN USING SAME, AND METHODS FOR PRODUCING SAME
To provide a composition containing a siloxane block-containing diol compound that is easy to manufacture industrially.
A composition containing a siloxane block-containing diol compound, wherein
the siloxane block-containing diol compound is represented by the following formula (I):
##STR00001##
wherein
R.sup.1 and R.sup.2 are each independently an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 30 carbon atoms which may have a substituent,
m is an integer of 1 to 25,
n is an integer of 3 to 200, and
Xs each independently represent any of the following formulae (I.sup.1) to (I.sup.6):
##STR00002##
Thermoset epoxy resin, its preparing composition and making process thereof
A thermoset epoxy resin, its preparing composition and making process are disclosed. In particular, the thermoset epoxy resin is glycidyl ether of diphenolic bis-carbamate and formed by curing a one component epoxy composition and has a general structure as shown in formula (1).