The present invention is a composition for forming a silicon-containing resist underlayer film, containing one or both of a hydrolysis product and a hydrolysis condensate of one or more silicon compounds (A-1) shown by the following general formula (1). This provides: a composition for forming a silicon-containing resist underlayer film with which it is possible to form a resist underlayer film having favorable adhesiveness to resist patterns regardless of whether in negative development or positive development, and also having favorable adhesiveness to finer patterns as in EUV photo-exposure; a patterning process; and a silicon compound.

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The present invention is a composition for forming a silicon-containing resist underlayer film, containing one or both of a hydrolysis product and a hydrolysis condensate of one or more silicon compounds (A-1) shown by the following general formula (1). This provides: a composition for forming a silicon-containing resist underlayer film with which it is possible to form a resist underlayer film having favorable adhesiveness to resist patterns regardless of whether in negative development or positive development, and also having favorable adhesiveness to finer patterns as in EUV photo-exposure; a patterning process; and a silicon compound.

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The present invention relates to stabilising compositions, particularly stabilising compositions which can be used to stabilise elastomeric materials, such as rubbers and/or butadiene based elastomers. The stabilising composition comprises: a first stabilising component comprising at least one phosphite antioxidant; a second stabilising component comprising at least one aminic antioxidant; and a third stabilising component comprising at least one phenolic antioxidant. Also disclosed herein is use of the stabilising composition for stabilising elastomeric materials, a stabilised composition comprising an elastomeric material and the aforementioned stabilising composition and a useful article comprising the stabilising composition.

The present invention relates to stabilising compositions, particularly stabilising compositions which can be used to stabilise elastomeric materials, such as rubbers and/or butadiene based elastomers. The stabilising composition comprises: a first stabilising component comprising at least one phosphite antioxidant; a second stabilising component comprising at least one aminic antioxidant; and a third stabilising component comprising at least one phenolic antioxidant. Also disclosed herein is use of the stabilising composition for stabilising elastomeric materials, a stabilised composition comprising an elastomeric material and the aforementioned stabilising composition and a useful article comprising the stabilising composition.

Provided is a latex-based composition capable of being applied to a surface to form a strippable coating on the surface that can encapsulate substances. The composition may include a latex polymer component and an anti-freeze component, and have a viscosity of less than or equal to about 90 cP. The composition may be delivered as an aerosol spray or a misting agent.

A radiation-sensitive resin composition includes: a polymer which has a first structural unit including a phenolic hydroxyl group, and a second structural unit represented by formula (1); and a radiation-sensitive acid generating agent which has a compound represented by formula (2), R.sup.1 represents a hydrogen atom, or the like; R.sup.2 represents a hydrogen atom or the like; and R.sup.3 represents a divalent monocyclic alicyclic hydrocarbon group having 3 to 12 ring atoms. Ar.sup.1 represents a group obtained by removing (q+1) hydrogen atoms on an aromatic ring from an arene formed by condensation of at least two benzene rings; R.sup.4 represents a monovalent organic group having 1 to 20 carbon atoms; q is an integer of 0 to 7; and R.sup.5 represents a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms, or the like.

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The present disclosure provides compositions, articles thereof, and methods of forming compositions. In at least one aspect, a composition includes (1) an epoxy, (2) an amino or amido hardener, (3) a polyaniline, (4) a dopant selected from a triazolyl, a thiazolyl, a quinolinyl, a salicylate, a benzoate, a glycolate, a phosphate, a sulfonate, an oxalate, or combination(s) thereof; and (5) a pigment selected from titanium dioxide, silica, talc, mica, aluminium stearate, or combination(s) thereof. The polyaniline+dopant comprises greater than 6 wt %, by weight of the composition. In at least one aspect, a method includes introducing an acid form of a polyaniline to a hydroxide to form a polyaniline hydroxide. The method includes introducing a dopant to the polyaniline hydroxide to form a doped polyaniline.

The present disclosure provides compositions, articles thereof, and methods of forming compositions. In at least one aspect, a composition includes (1) an epoxy, (2) an amino or amido hardener, (3) a polyaniline, (4) a dopant selected from a triazolyl, a thiazolyl, a quinolinyl, a salicylate, a benzoate, a glycolate, a phosphate, a sulfonate, an oxalate, or combination(s) thereof; and (5) a pigment selected from titanium dioxide, silica, talc, mica, aluminium stearate, or combination(s) thereof. The polyaniline+dopant comprises greater than 6 wt %, by weight of the composition. In at least one aspect, a method includes introducing an acid form of a polyaniline to a hydroxide to form a polyaniline hydroxide. The method includes introducing a dopant to the polyaniline hydroxide to form a doped polyaniline.

The present disclosure relates to an ionic compound including an anion group of Chemical Formula 1, and a coating composition and an organic light emitting device including the same.

The present disclosure relates to an ionic compound including an anion group of Chemical Formula 1, and a coating composition and an organic light emitting device including the same.