An addition reaction curing type polyorganosiloxane composition for bonding poly(phenylene sulfide) resins includes (A) a polyorganosiloxane containing two or more alkenyl groups in the molecule, (B) a polyorganohydrogensiloxane having, in the molecule, three or more silicon-atom-bonded hydrogen atoms, (C) a platinum-based catalyst, (D) an oxide or carbonate of a metal selected from among the metals in Groups 2 and 12 of the periodic table, and (E) an adhesion promoter, the content of the ingredient (D) being 0.1-20 wt % with respect to the whole composition.

The present specification relates to a compound represented by Chemical Formula 1, a composition for forming an optical film and an optical film comprising the same, and a display device comprising the optical film.

The present disclosure provides for a coating composition system suitable for forming a stain resistant and soft tactile texture coating onto a variety of substrate materials including plastic materials, metal materials, ceramic materials, and concrete materials. The coating composition system can be cured under mild curing conditions, and provides the resulting coating with excellent properties in terms of adhesion to the substrates, strength, and abrasion resistance. The present disclosure also provides for a method for preparing the coating composition system, and the use thereof.

The present disclosure provides for a coating composition system suitable for forming a stain resistant and soft tactile texture coating onto a variety of substrate materials including plastic materials, metal materials, ceramic materials, and concrete materials. The coating composition system can be cured under mild curing conditions, and provides the resulting coating with excellent properties in terms of adhesion to the substrates, strength, and abrasion resistance. The present disclosure also provides for a method for preparing the coating composition system, and the use thereof.

Perovskite-polymer composites including perovskite nanocrystals dispersed in a polymer matrix, wherein the perovskite nanocrystals have an average size of from about nm to about 20 nm. Methods for producing a perovskite-polymer composites that may include contacting a solid material comprising a polymer matrix with a solution comprising a perovskite precursor; allowing the solution to penetrate the solid material to yield a swollen solid material comprising the perovskite precursor dispersed within the polymer matrix; optionally contacting the swollen solid material with an antisolvent; and annealing the swollen solid material to crystallize the perovskite precursor and to yield the perovskite-polymer composite comprising perovskite nanocrystals dispersed in the polymer matrix.

A composition containing: (a) a polysiloxane resin, wherein the polysiloxane resin contains the following siloxane units: [R3SiO.sub.1/2], [(OZ).sub.qSiO.sub.(4-q)/2] and at least one of [(OZ).sub.tR.sup.EPSiO.sub.(3-t)/2] and [(OZ).sub.dRR.sup.EPSiO.sub.(2-d)/2]; where: each R is independently in each occurrence selected from hydrocarbyls, R.sup.EP is an epoxy functional hydrocarbyl group, subscript q is in each occurrence a number selected from a range of 0-3, subscript t is in each occurrence a number selected from a range of 0-2, and subscript d is in each occurrence a number selected from a range of 0-1 provided that the average concentration of OZ groups is at least 15 mole-percent relative to moles of silicon atoms in the polysiloxane resin; (b) a photo acid generator; (c) a moisture cure catalyst; and (d) optionally, an epoxy functional diluent.

A composition containing: (a) a polysiloxane resin, wherein the polysiloxane resin contains the following siloxane units: [R3SiO.sub.1/2], [(OZ).sub.qSiO.sub.(4-q)/2] and at least one of [(OZ).sub.tR.sup.EPSiO.sub.(3-t)/2] and [(OZ).sub.dRR.sup.EPSiO.sub.(2-d)/2]; where: each R is independently in each occurrence selected from hydrocarbyls, R.sup.EP is an epoxy functional hydrocarbyl group, subscript q is in each occurrence a number selected from a range of 0-3, subscript t is in each occurrence a number selected from a range of 0-2, and subscript d is in each occurrence a number selected from a range of 0-1 provided that the average concentration of OZ groups is at least 15 mole-percent relative to moles of silicon atoms in the polysiloxane resin; (b) a photo acid generator; (c) a moisture cure catalyst; and (d) optionally, an epoxy functional diluent.

This organopolysiloxane having a structural unit represented by general formula (1):

##STR00001##

(in the formula, R.sup.1 represents an unsubstituted or substituted alkyl group having 1-12 carbon atoms or an unsubstituted or substituted aryl group having 6-10 carbon atoms) and having at least one group that directly binds to a silicon atom and that is selected from the groups represented by general formula (2);

R.sup.2O—  (2)

(in the formula, R.sup.2 represents a hydrogen atom, an unsubstituted or substituted alkyl group having 1-10 carbon atoms, or an unsubstituted or substituted aryl group having 6-10 carbon atoms), is capable of achieving both hardness and bending resistance, exhibits excellent fast curing ability even when an amine-based compound is used as a curing catalyst, and is highly safe.

This organopolysiloxane having a structural unit represented by general formula (1):

##STR00001##

(in the formula, R.sup.1 represents an unsubstituted or substituted alkyl group having 1-12 carbon atoms or an unsubstituted or substituted aryl group having 6-10 carbon atoms) and having at least one group that directly binds to a silicon atom and that is selected from the groups represented by general formula (2);

R.sup.2O—  (2)

(in the formula, R.sup.2 represents a hydrogen atom, an unsubstituted or substituted alkyl group having 1-10 carbon atoms, or an unsubstituted or substituted aryl group having 6-10 carbon atoms), is capable of achieving both hardness and bending resistance, exhibits excellent fast curing ability even when an amine-based compound is used as a curing catalyst, and is highly safe.

Provided is a composition for an acoustic wave probe including a polysiloxane mixture containing at least polysiloxane having a vinyl group and a phenyl group, polysiloxane having two or more Si—H groups in a molecular chain, and zinc oxide, a silicone resin for an acoustic wave probe, the acoustic wave probe, an acoustic wave measurement apparatus, an ultrasound diagnostic apparatus, an ultrasound probe, a photoacoustic wave measurement apparatus, and an ultrasound endoscope.