C09D163/04

Dry film lubricants containing graphene

Dry film lubricants containing graphene improve the wear resistance and the frictional behavior of the lubricant.

Dry film lubricants containing graphene

Dry film lubricants containing graphene improve the wear resistance and the frictional behavior of the lubricant.

RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT

A resist underlayer film forming composition which has high storage stability, has a low film curing start temperature, can cause the generation of a sublimated product in a reduced amount, and enables the formation of a film that is rarely eluted into a photoresist solvent; a method for forming a resist pattern using the resist underlayer film forming composition; and a method for manufacturing a semiconductor device. The resist underlayer film forming composition includes a crosslinkable resin, a crosslinking agent, a crosslinking catalyst represented by formula (I) and a solvent. (A-SO.sub.3).sup.−(BH).sup.+[wherein A represents a linear, branched or cyclic saturated or unsaturated aliphatic hydrocarbon group which may be substituted, an aryl group which may be substituted by a group other than a hydroxy group, or a heteroaryl group which may be substituted; and B represents a base having a pKa value of 6.5 to 9.5.]

RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT

A resist underlayer film forming composition which has high storage stability, has a low film curing start temperature, can cause the generation of a sublimated product in a reduced amount, and enables the formation of a film that is rarely eluted into a photoresist solvent; a method for forming a resist pattern using the resist underlayer film forming composition; and a method for manufacturing a semiconductor device. The resist underlayer film forming composition includes a crosslinkable resin, a crosslinking agent, a crosslinking catalyst represented by formula (I) and a solvent. (A-SO.sub.3).sup.−(BH).sup.+[wherein A represents a linear, branched or cyclic saturated or unsaturated aliphatic hydrocarbon group which may be substituted, an aryl group which may be substituted by a group other than a hydroxy group, or a heteroaryl group which may be substituted; and B represents a base having a pKa value of 6.5 to 9.5.]

Resist underlying film forming composition

A resist underlayer film forming composition contains a resin containing a unit structure represented by formula (1): [in formula (1), R1 represents a thiadiazole group which is optionally substituted with a C1-6 alkyl group optionally interrupted by a carboxy group, a C1-6 alkyl group optionally substituted with a hydroxyl group, or a C1-4 alkylthio group, and R2 represents a hydrogen atom or formula (2): (in formula (2), R1 is the same as defined above, and * represents a binding moiety)]. The resist underlayer film forming composition provides a resist underlayer film which has excellent solvent resistance, excellent optical parameters, an excellent dry etching rate, and excellent embeddability.

Resist underlying film forming composition

A resist underlayer film forming composition contains a resin containing a unit structure represented by formula (1): [in formula (1), R1 represents a thiadiazole group which is optionally substituted with a C1-6 alkyl group optionally interrupted by a carboxy group, a C1-6 alkyl group optionally substituted with a hydroxyl group, or a C1-4 alkylthio group, and R2 represents a hydrogen atom or formula (2): (in formula (2), R1 is the same as defined above, and * represents a binding moiety)]. The resist underlayer film forming composition provides a resist underlayer film which has excellent solvent resistance, excellent optical parameters, an excellent dry etching rate, and excellent embeddability.

SOUR GAS RESISTANT COATING

Coating compositions that include one or more epoxy resin compositions, one or more metal-containing compound and one or more curing agents are described. The compositions can be applied to steel substrates, including steel substrates such as steel pipe to resist attack by sour gas. When applied to a substrate and cured, these coating compositions demonstrate reduced permeability to hydrogen sulfide.

SOUR GAS RESISTANT COATING

Coating compositions that include one or more epoxy resin compositions, one or more metal-containing compound and one or more curing agents are described. The compositions can be applied to steel substrates, including steel substrates such as steel pipe to resist attack by sour gas. When applied to a substrate and cured, these coating compositions demonstrate reduced permeability to hydrogen sulfide.

METHOD OF PROVIDING A HYDROPHOBIC COATING USING NON-FUNCTIONALIZED NANOPARTICLES
20220325111 · 2022-10-13 ·

An anti-corrosive coating for a substrate surface comprises an insulation layer positioned over the substrate and a cured epoxy layer positioned on the insulation layer, the cured epoxy layer including a plurality of nanoparticles having diameters within a range of about 200 nm to about 350 nm. Water droplets positioned on an external surface of the cured epoxy layer form a contact angle of at least 130 degrees.

METHOD OF PROVIDING A HYDROPHOBIC COATING USING NON-FUNCTIONALIZED NANOPARTICLES
20220325111 · 2022-10-13 ·

An anti-corrosive coating for a substrate surface comprises an insulation layer positioned over the substrate and a cured epoxy layer positioned on the insulation layer, the cured epoxy layer including a plurality of nanoparticles having diameters within a range of about 200 nm to about 350 nm. Water droplets positioned on an external surface of the cured epoxy layer form a contact angle of at least 130 degrees.