The present disclosure relates to: an antibacterial polymer coating composition comprising a (meth)acrylic polyol resin, which has a number average molecular weight of 3,000-20,000, a (co)polymer containing an ethylene glycol repeating unit, and a photosensitizer; an antibacterial polymer film comprising a cured product of the antibacterial polymer coating composition; and an antibacterial polymer film which comprises a substrate layer and a photosensitizer, the substrate layer comprising a (meth)acrylic polyol resin having a number average molecular weight of 3,000-20,000 and a (co)polymer containing an ethylene glycol repeating unit, and the photosensitizer being dispersed in the substrate layer.

The present invention relates to a cell membrane-mimicking brush polymer having surface properties mimicking a cell membrane and a self-assembly capability by means of a cell membrane mimicking functional group introduced to a brush terminal, and a method for preparing same.

The present invention relates to a cell membrane-mimicking brush polymer having surface properties mimicking a cell membrane and a self-assembly capability by means of a cell membrane mimicking functional group introduced to a brush terminal, and a method for preparing same.

Described herein are methods of coating both metallic and polymeric surfaces adding hydrophilicity comprising the steps mixing a coating composition comprising at least one polyol, at least one compound having at least two isocyanate groups, and an organic solvent; introducing nucleophilic functional groups on the surface thereby creating an active surface; subjecting the active surface to the coating composition thereby forming a coated surface; and curing the coated surface. Medical devices, for example, implantable medical devices can be coated by the methods described herein.

Described herein are methods of coating both metallic and polymeric surfaces adding hydrophilicity comprising the steps mixing a coating composition comprising at least one polyol, at least one compound having at least two isocyanate groups, and an organic solvent; introducing nucleophilic functional groups on the surface thereby creating an active surface; subjecting the active surface to the coating composition thereby forming a coated surface; and curing the coated surface. Medical devices, for example, implantable medical devices can be coated by the methods described herein.

The present disclosure relates to medical devices using coated polymers, methods for reducing platelet attachment and/or fouling associated with medical devices, and methods for coating polymers. Certain embodiments of the present disclosure provide a medical device comprising one or more polymeric materials coated with a hyperbranched polyglycerol.

The present disclosure relates to medical devices using coated polymers, methods for reducing platelet attachment and/or fouling associated with medical devices, and methods for coating polymers. Certain embodiments of the present disclosure provide a medical device comprising one or more polymeric materials coated with a hyperbranched polyglycerol.

Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.

A composite structure is provided, which includes a support, an active layer wrapping the support, a dendrimer grafted to the active layer through covalent bondings, and a plurality of anti-fouling groups, wherein each of the anti-fouling groups is grafted to terminals of the dendrimer through covalent bondings. The terminals of the dendrimer include amino group, hydroxyl group, or thiol group.