Provided are a surface treating agent which is capable of forming a surface layer excellent in acid resistance and has excellent long-term storage stability, an article having the surface layer, and a method for producing the article. The surface treating agent of the present invention is a surface treating agent containing a fluorine-containing ether compound having a fluoropolyether chain and a reactive silyl group, and one or more ions selected from the group consisting of an iodide ion and a bromide ion, in which the content of the ions is 0.05 to 2.00 ppm by mass with respect to the total mass of the surface treating agent.

Provided is a composite cover plate including a substrate body, wherein the substrate body includes two surfaces that are arranged opposite, at least one surface is provided with an antistatic film layer; the antistatic film layer includes a perfluoropolyether mixture and a silane coupling agent. Further provided is a method for preparing a composite cover plate, including: providing a substrate body with two surfaces that are arranged opposite, and spraying an antistatic film layer on at least one surface of the substrate body; wherein the antistatic film layer includes a perfluoropolyether mixture and a silane coupling agent. Further provided is a display device including a display module and a composite cover plate covering the surface of the display module, wherein the composite cover plate is any composite cover plate provided herein, an antistatic film layer is arranged on a side of the composite cover plate away from the display module.

Provided is a composite cover plate including a substrate body, wherein the substrate body includes two surfaces that are arranged opposite, at least one surface is provided with an antistatic film layer; the antistatic film layer includes a perfluoropolyether mixture and a silane coupling agent. Further provided is a method for preparing a composite cover plate, including: providing a substrate body with two surfaces that are arranged opposite, and spraying an antistatic film layer on at least one surface of the substrate body; wherein the antistatic film layer includes a perfluoropolyether mixture and a silane coupling agent. Further provided is a display device including a display module and a composite cover plate covering the surface of the display module, wherein the composite cover plate is any composite cover plate provided herein, an antistatic film layer is arranged on a side of the composite cover plate away from the display module.

This invention provides a polymer that is useful in a variety of applications, including as a binder polymer of a coating composition, and especially a packaging coating composition. Packaging articles (e.g., containers) comprising the polymer and methods of making such packaging articles are also provided.

This invention provides a polymer that is useful in a variety of applications, including as a binder polymer of a coating composition, and especially a packaging coating composition. Packaging articles (e.g., containers) comprising the polymer and methods of making such packaging articles are also provided.

A composition comprises: a compound having one partial structure represented by formula (1), and a solvent. n1 and n2 are each independently an integer of 0 to 2; and k1 and k2 are each independently an integer of 0 to 9. The compound preferably has an intermolecular bond-forming group. The compound is preferably represented by formula (2). Z represents the partial structure represented by the formula (1); Ar.sup.1 and Ar.sup.2 represent a substituted or unsubstituted arenediyl group having 6 to 20 carbon atoms; Ar.sup.3 and Ar.sup.4 represent a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; and p1 and p2 are each independently an integer of 0 to 3. ##STR00001## ##STR00002##

Provided are a polymer used for a manufacturing process of a semiconductor and a display, a resist underlayer film composition containing the polymer for a manufacturing process of a semiconductor and a display, and a method for manufacturing semiconductor device using the composition, and more specifically, the polymer of the present disclosure simultaneously has optimized etching selectivity and planarization characteristics, such that the resist underlayer film composition containing the polymer is usable as a hard mask for a multilayer semiconductor lithography process.