Methods, compositions, and kit(s) for removing corrosion or scale from a metal or a non-metal article are disclosed. In a first stage of the method, an article exhibiting corrosion can be exposed to an acid wash composition including a first acid component having one or more of HCl, Phosphoric Acid, Oxalic Acid, a second acid inhibitor/surfactant component including ethoxylated alkyl mercaptan, and a third thixotropic gelling agent component including Talc or Fumed silica, sufficient to cause gelling of the acid wash composition. In a second stage of the method performed subsequent to the first stage, the article can be exposed to an acid neutralizing composition comprising bicarbonate, borax, isopropyl alcohol and water.

Detergent compositions that include surfactant systems, encapsulates, and cationic deposition aid polymers. Methods of making and using such compositions.

A cleaning composition comprises at least one surfactant and at least one colorant. The cleaning composition can have a pH of about 3 or less. The colorant exhibits one of several specified structures at a pH of about 7. A method for cleaning a surface utilizes the cleaning composition.

The present invention relates to novel compounds containing fluorinated end groups, to the use thereof as surface-active substances, and to compositions comprising these compounds.

The present invention provides a microemulsion remover comprising, based on the total weight of the microemulsion remover, 1) from 10% to 60%, at least one organic solvent, ii) from 10% to 50%, at least one co-solvent, iii) from 0.1% to 10%, at least one base, iv) from 0.1% to 10%, at least one oxidizer, v) from 0.1% to 10%, at least one surfactant, and vi) water.

The present invention relates to a composition comprising: (a) at least one surfactant, at least one surfactant system, at least one soap, or any mixtures thereof; and (b) a polypeptide having lipase activity selected from the group consisting of: (I) a polypeptide having at least 80% sequence identity to the mature polypeptide of SEQ ID NO: 2; (II) a polypeptide encoded by a polynucleotide that hybridizes under low stringency conditions with (i) the mature polypeptide coding sequence of SEQ ID NO: 1, or (ii) the full-length complement of (i); (III) a polypeptide encoded by a polynucleotide having at least 80% sequence identity to the matore polypeptide coding sequence of SEQ ID NO: 1; (IV) a variant of the mature polypeptide of SEQ ID NO: 2 comprising a substitution, deletion, and/or insertion at one or more positions; and (V) a fragment of the polypeptide of (I), (II), (III), or (IV); wherein said composition is a cleaning and/or treatment composition. The invention furthermore relates to methods of producing and using the composition.

Monomeric and oligomeric compounds of Formula (I) comprising hydrophobic alkyl or alkenyl ester moieties and hydrophilic carboxylate moieties: ##STR00001##
wherein R.sup.1 is C.sub.1-C.sub.6 alkyl, R.sup.2 is C.sub.l0-C.sub.30 alkyl or C.sub.8-C.sub.30 alkenyl, Y is a cation, Z is a sulfur-containing moiety, and n and k are integers as defined herein. The compounds of Formula (I) have surfactant properties. Also provided are compositions comprising the compounds of Formula (I), and methods of using the compounds or compositions for cleaning purposes.

The present disclosure relates to stable aqueous compositions of alkyl sulfates, which are suitable for numerous commercial applications due to their favorable cleaning and foaming properties. More particularly, the disclosure relates to stable aqueous compositions of alkyl sulfates in combination with select hydrophobic agents, such as essential oils.

Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

A modified aqueous acid composition comprising: nitric acid; sulfuric acid; a compound comprising an amine moiety and a sulfonic acid moiety; and a peroxide. Also disclosed are methods of using such composition.