Provided is a surfactant which has a high surface tension reducing ability and a high solubility in a liquid medium, containing a fluorine-containing copolymer containing, as essential components, a monomer having a fluoroalkyl group having 1 to 7 carbon atoms, a hydrophilic monomer, and a monomer having an ion donor group. Further provided are a coating composition, an ink composition and a photographic emulsion composition, each comprising the surfactant.

Anionic surfactants have a formula: R.sub.fSO.sub.2N(H)CH.sub.2CH(CH.sub.3)OH; or R.sub.fSO.sub.2N(H)(CH.sub.2CH.sub.2O).sub.xH, where x is an integer from 2-6. R.sub.f is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) R.sub.fSO.sub.2N[CH.sub.2CH(CH.sub.3)OH].sub.2; (b) R.sub.fSO.sub.2N[CH.sub.2CH(CH.sub.3)OH][(CH.sub.2CH.sub.2O).sub.nH], where n is an integer from 1-6; (c) R.sub.fSO.sub.2N(R)[(CH.sub.2CH.sub.2O).sub.pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) R.sub.fSO.sub.2N[(CH.sub.2CH.sub.2O).sub.qH][(CH.sub.2CH.sub.2O).sub.mH], where q is an integer from 1-6 and m is an integer from 3-6. R.sub.f is a fluoroalkyl group having 3 to 8 carbon atoms.

The present disclosure relates to compositions and methods of using the compositions for treating a floor surface. The disclosed compositions clean the floor surface, repair damage, or maintain the original look of the floor. The disclosed compositions also do not provide a permanent finish on the floor, are temporary coatings, or do not significantly change the gloss of the floor after application.

Provided are amine-containing hydrofluoroether compounds represented by the following general formula (I), wherein (I) Y is a single bond or CF2 and wherein (i) Rf.1 and Rf2 are independently linear or branched perfluoroalkyl groups having with 1-8 carbon atoms and optionally comprise at least one catenated heteroatom, or (ii) Rf1 and Rf2 are bonded together to form a ring structure having 4-6 carbon atoms and optionally comprise one or more catenated heteroatoms; with the proviso that if Rf1 and Rf2 are bonded together to form a ring structure comprising a nitrogen heteroatom, said nitrogen heteroatom is tertiary and is bonded to a perfluoroalkyl group having 1-3 carbon atoms. ##STR00001##

Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

A tile system for covering a surface. The tile system comprises a first tile assembly connected to a second tile assembly by a connector. Each tile assembly comprises a first tile stacked on a second tile, the first tile and the second tile joined to a reinforcing material disposed therebetween. The connector comprises a first component and a second component that is complementary to the first component. The first component is mounted to the first tile assembly, and the second component is mounted to the second tile assembly.

Proposed are a rinse solution composition for extreme ultraviolet photolithography and a pattern formation method using the same. The rinse solution composition includes 0.0001 to 0.01 wt % of a fluorine-based surfactant, 0.0001 to 0.5 wt % of a pattern reinforcing agent which is a compound of Formula (1), a compound of Formula (2), or a mixture thereof, 0.0001 to 0.5 wt % of a substance selected from the group consisting of a triol derivative, a tetraol derivative, and a mixture thereof, and a residual amount of water.

Proposed is a process liquid composition for improving a lifting defect level of a photoresist pattern containing a surfactant and for reducing the number of defects of the photoresist pattern, the composition containing a surfactant and having a surface tension of 40 mN/m or less and a contact angle of 60 or smaller in the photoresist pattern having hydrophobicity represented by a contact angle of 70 or greater of water with respect to a photoresist surface in a photoresist pattern process.

A tile system for covering a surface. The tile system comprises a first tile assembly connected to a second tile assembly by a connector. Each tile assembly comprises a first tile stacked on a second tile, the first tile and the second tile joined to a reinforcing material disposed therebetween. The connector comprises a first component and a second component that is complementary to the first component. The first component is mounted to the first tile assembly, and the second component is mounted to the second tile assembly.

The present disclosure relates to compositions and methods of using the compositions for treating a floor surface. The disclosed compositions clean the floor surface, repair damage, or maintain the original look of the floor. The disclosed compositions also do not provide a permanent finish on the floor, are temporary coatings, or do not significantly change the gloss of the floor after application.