Provided is a means for allowing residues remaining on the surface of a polished object to be further reduced. Provided is a composition for surface treatment containing components (A) to (C) below and having pH of more than 7.0: the component (A): a piperazine-based compound represented by a formula (a) below and having two or more amino groups having pKa larger than the pH of the composition for surface treatment, the component (B): an anionic polymer, and the component (C): a buffer represented by a formula: A-COONH.sub.4.sup.+ (A is an alkyl group having 1 or more and 10 or less carbon atoms or a phenyl group).

##STR00001##

Described herein is a process for manufacturing ethoxylated polyethylene-imines. Also described herein are the ethoxylated polyethyleneimines and methods for using the ethoxylated polyethyleneimines.

The disclosure relates a surfactant package for use in hard surface cleaning compositions, preferably floor cleaning compositions which pair an anionic linear alkyl sulfonate surfactant and a nonionic surfactant in a ratio of 1:1 to 9:1. This combination provides for synergistic cleaning of both proteinaceous food soils (red soils) and hydrocarbon-based oily soils (black soils) while also reducing foam produced by the composition. Synergistic nonionic surfactants include EO/PO alcohol alkoxylates or EO/PO fatty alcohol surfactants with a propylene oxide to ethylene oxide to ratio of greater than 1.

A detergent additive comprising (i) a biochelant; (ii) a ring-opener, and (iii) a solvent. A method of treating a contaminated surface comprising contacting a detergent and a detergent additive with the contaminated surface wherein the detergent additive comprises (i) a biochelant; (ii) a ring-opener, and (iii) a solvent.

A cleaning solution includes a solvent having Hansen solubility parameters: 25>?.sub.d>13, 25>?.sub.p>3, 30>?.sub.h>4; an acid having an acid dissociation constant pKa: ?11<pKa<4, or a base having pKa of 40>pKa>9.5; and a surfactant. The surfactant is an ionic or non-ionic surfactant, selected from

##STR00001##

R is substituted or unsubstituted aliphatic, alicyclic, or aromatic group, and non-ionic surfactant has A-X or A-X-A-X structure, where A is unsubstituted or substituted with oxygen or halogen, branched or unbranched, cyclic or non-cyclic, saturated C2-C100 aliphatic or aromatic group, X includes polar functional groups selected from OH, ?O, S, P, P(O.sub.2), C(?O)SH, C(?O)OH, C(?O)OR, O, N, C(?O)NH, SO.sub.2OH, SO.sub.2SH, SOH, SO.sub.2, CO, CN, SO, CON, NH, SO.sub.3NH, and SO.sub.2NH.

Provided are: a novel compound that has excellent activity of dissolving a silicone compound and thereby solubilizing the silicone compound in an organic solvent; and a cleaner that contains the compound and can completely and rapidly remove the silicone compound deposited/remained on a mold and/or a molded article obtained using the mold. The novel compound is represented by Formula (1). The silicone-dissolvative cleaner contains (A) a silicone surfactant represented by Formula (1); and (B) an organic solvent. Formula (1) is expressed as follows:

##STR00001##

wherein A represents an ionic group selected from the group consisting of a sulfonic ion, a carboxylic ion, and a quaternary ammonium cation; and B represents a counter-ion to A and is selected from an alkali metal ion and a halide ion.

Cleaning compositions, which commonly are self-adherent gels, are provided. The cleaning compositions include (a) adhesion promoter, (b) glycine betaine amide, and (c) water. The glycine betaine amide is a compound of formula (I); where R is an aliphatic group having 8 to 22 carbon atoms and X represents an inorganic or organic anion. The adhesion promoter includes at least one compound including one or more polyalkoxy groups. The adhesion promoter may also include polysaccharide and/or synthetic polymer resin. Gel forms of the cleaning compositions typically have a gel melt temperature of at least about 55 C. and a viscosity at 25 C. of at least about 150,000 cP.

##STR00001##

A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

Problem to be Solved

To provide a composition that can efficiently remove a photoresist adhering to an edge portion and a back surface of a substrate, in a process of producing a mask which is used when the substrate is subjected to etching treatment to have an element, a circuit etc., formed thereon using the photoresist.

Solution

The composition for removing a resist of the present invention is a composition comprising a surfactant and a solvent, wherein the composition contains, as the surfactant, at least the following component (A).

Component (A): a polyglycerol derivative represented by the following formula (a):

R.sup.aO(C.sub.3H.sub.5O.sub.2R.sup.a).sub.nR.sup.a(a)

wherein n represents the number of the repeating units, and is an integer of 2 to 60; and R.sup.a identically or differently represents a hydrogen atom, a C.sub.1-18 hydrocarbon group or a C.sub.2-24 acyl group, provided that at least two of the (n+2) number of R.sup.a are C.sub.1-18 hydrocarbon groups and/or C.sub.2-24 acyl groups.

A cleaning composition for sanitizing and/or disinfecting hard surfaces, comprising: a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.