Patent classifications
C11D1/02
Cleaning solution and method of cleaning wafer
A cleaning solution includes a first solvent having Hansen solubility parameters 25>δ.sub.d>13, 25>δ.sub.p>3, and 30>δ.sub.h>4; an acid having an acid dissociation constant, pKa, of −11<pKa<4, or a base having a pKa of 40 > pKa>9.5; and a surfactant. The surfactant is one or more of an ionic surfactant, a polyethylene oxide and a polypropylene oxide, a non-ionic surfactant, and combinations thereof.
Cleaning solution and method of cleaning wafer
A cleaning solution includes a first solvent having Hansen solubility parameters 25>δ.sub.d>13, 25>δ.sub.p>3, and 30>δ.sub.h>4; an acid having an acid dissociation constant, pKa, of −11<pKa<4, or a base having a pKa of 40 > pKa>9.5; and a surfactant. The surfactant is one or more of an ionic surfactant, a polyethylene oxide and a polypropylene oxide, a non-ionic surfactant, and combinations thereof.
Cleaning compositions containing a polyetheramine
The present invention relates generally to cleaning compositions and, more specifically, to cleaning compositions containing a polyetheramine that is suitable for removal of stains from soiled materials.
Cleaning compositions containing a polyetheramine
The present invention relates generally to cleaning compositions and, more specifically, to cleaning compositions containing a polyetheramine that is suitable for removal of stains from soiled materials.
Detergent composition comprising a cationic copolymer containing (meth)acrylamide and diallyl dimethyl ammonium chloride
Fabric care compositions comprising a cationic polymer, a silicone, and a surfactant system. Methods of making and using such compositions.
Detergent compositions comprising lipase
The present invention relates a method of obtaining a detergent composition comprising introducing (a) a lipase variant of a parent lipase which variant has at least 60% sequence identity with SEQ ID NO: 2, a substitution at a position corresponding to D254 of the mature polypeptide of SEQ ID NO: 2 and has lipase activity and (b) an anionic surfactant, wherein said composition has increased stability in comparison with a corresponding composition comprising the parent lipase.
Detergent compositions comprising lipase
The present invention relates a method of obtaining a detergent composition comprising introducing (a) a lipase variant of a parent lipase which variant has at least 60% sequence identity with SEQ ID NO: 2, a substitution at a position corresponding to D254 of the mature polypeptide of SEQ ID NO: 2 and has lipase activity and (b) an anionic surfactant, wherein said composition has increased stability in comparison with a corresponding composition comprising the parent lipase.
Detergent composition comprising an acrylamide/maptac cationic polymer
Fabric care compositions comprising a cationic polymer, a silicone, and a surfactant system. Methods of making and using such compositions.
Detergent composition comprising a cationic polymer and anionic/nonionic surfactant mixture
Fabric care compositions comprising a cationic polymer, a silicone, and a surfactant system. Methods of making and using such compositions.
Treating solution for electronic parts, and process for producing electronic parts
The invention provides an aqueous solution capable of selectively protecting a nitrogen-containing silicon compound from corrosion by a treating solution for etching, cleaning or the like, etching oxygen-containing, carbon-containing silicon in particular, and making a large etch rate difference between a nitrogen-containing silicon compound and an oxygen-containing silicon compound, and a process for producing electronic parts as well. The invention is embodied by a treating solution for electronic parts that is an aqueous solution containing one or two or more of anionic surface active agents represented by the following formulae (1), (2) and (3), and a process for producing an electronic part. ##STR00001## wherein R.sub.1, R.sub.2, and R.sub.3 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X.sub.1 stands for a functional group capable of becoming an anionic ion. ##STR00002## wherein R.sub.4 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, X.sub.2 stands for a functional group capable of becoming an anionic ion, and n stands for a natural number of greater than 2. ##STR00003## wherein R.sub.5 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X.sub.3, and X.sub.4 stands for a functional group capable of becoming an anionic ion.