An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The amine-free composition preferably includes at least one oxidizing agent, at least one complexing agent, at least one basic compound, and water and has a pH in the range from about 2.5 to about 11.5. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

An amine-free composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The amine-free composition preferably includes at least one oxidizing agent, at least one complexing agent, at least one basic compound, and water and has a pH in the range from about 2.5 to about 11.5. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Polycationic polymeric antimicrobial surfactant and polymeric biocompatible antimicrobial surfactant compositions are useful in dispersing various compounds in a carrier liquid. The polycationic polymeric antimicrobial surfactant and polymeric biocompatible antimicrobial surfactant compositions employ polymers having both hydrophilic domains and hydrophobic domains so that the compositions can disperse particles such as polymer particles or droplets in a continuous phase as well as provide stable dispersions that have not been provided before. The antimicrobial properties of the compositions provide much-needed capabilities of fighting infectious agents such as bacteria and viruses in a wide spectrum of products such as paint, adhesives, and coatings. Methods of using these compositions as well as methods of making products using the compositions are disclosed.

The invention relates to compositions, methods of manufacture, and methods for reducing metal corrosion during alkaline cleaning. In particular, the method employs a hydroxyphosphono carboxylic acid in alkaline cleaning of hard surfaces.

The invention relates to compositions, methods of manufacture, and methods for reducing metal corrosion during alkaline cleaning. In particular, the method employs a hydroxyphosphono carboxylic acid in alkaline cleaning of hard surfaces.

A cleaning composition including a primarily C.sub.12 quaternary functionalized alkyl polyglucoside selected from the group consisting of stearyldimoniumhydroxypropyl laurylglucosides chloride and lauryldimoniumhydroxypropyl cocoglucosides chloride, a water conditioning agent, an acid source, a solvent, and water. In one embodiment, the cleaning composition is substantially free of alkyl phenol ethoxylates. The cleaning composition is capable of removing soils including up to 20% proteins. The cleaning compositions include a biorenewable, environmentally friendly alternative to nonyl phenol ethoxylates and exhibit superior cleaning of food soils.

Product for cleaning, sanification and hygienization, comprising a base solution with sanificant and/or hygienizing action to which probiotic bacteria and bacteriophage elements are mixed; the probiotic bacteria being preferably of the Bacillus subtilis, Bacillus megaterium and Bacillus pumilus genera, while the bacteriophage elements comprise, as an alternative or in combination, bacteriophages of the Caudavirales, Microviridae, Leviviridae, Inoviridae, Tectiviridae, Corticoviridae families.

Product for cleaning, sanification and hygienization, comprising a base solution with sanificant and/or hygienizing action to which probiotic bacteria and bacteriophage elements are mixed; the probiotic bacteria being preferably of the Bacillus subtilis, Bacillus megaterium and Bacillus pumilus genera, while the bacteriophage elements comprise, as an alternative or in combination, bacteriophages of the Caudavirales, Microviridae, Leviviridae, Inoviridae, Tectiviridae, Corticoviridae families.

A cleaning system for all laundry, high performance textiles, and sports gear, which includes a washing agent and a protective agent. The washing agent is configured to remove unwanted matter from the high performance textiles, sports gear, and/or other laundry. The protective agent is configured to create a bonded barrier comprising organosilane antimicrobial(s) on the high performance textiles, sports gear, and/or other laundry for protection against odors from bacteria, mold and mildew and/or the like. The washing agent and the protective agent are configured to be used in a two-step water-based treatment process in which the washing agent is provided in a given first step of the treatment process and the protective agent is provided in a given subsequent second step of the treatment process.

A cleaning system for all laundry, high performance textiles, and sports gear, which includes a washing agent and a protective agent. The washing agent is configured to remove unwanted matter from the high performance textiles, sports gear, and/or other laundry. The protective agent is configured to create a bonded barrier comprising organosilane antimicrobial(s) on the high performance textiles, sports gear, and/or other laundry for protection against odors from bacteria, mold and mildew and/or the like. The washing agent and the protective agent are configured to be used in a two-step water-based treatment process in which the washing agent is provided in a given first step of the treatment process and the protective agent is provided in a given subsequent second step of the treatment process.