A catalyzed highly alkaline cleaning composition for cleaning stainless steel and other surfaces, namely those treated in clean-in-place processes, is disclosed. The composition comprises gluconic acid or salt thereof (e.g. gluconate) to serve as a corrosion and stain inhibitor for the high alkalinity compositions. The composition retains the cleaning and corrosion prevention properties of conventional clean-in-place solutions while being less expensive to produce.

A solid block detergent composition is described which can be dispensed with a water spray to form an aqueous detergent for cutting and removing grease, removing and suspending soils and rinsing easily leaving cleaned ware. The solid block detergent contains a neutralized sulfonated anionic surfactant in combination with various processing aids to optimize soil removal in a formulation that can be pressed for form a solid.

A vehicle hard surface cleaning composition is provided that includes a surfactant present from 0.1 to 8.0 total weight percent, a hydrotrope present from 0.1 to 3.0 total weight percent, a wetting agent present from 0.1 to 5.0 total weight percent, a protectant present from 0.01 to 17 total weight percent, and a diluent making up a remainder of the composition. A method of cleaning a vehicle hard surface include applying the composition thereto and washing the composition therefrom to leave a residue of graphene or graphene oxide.

A vehicle hard surface cleaning composition is provided that includes a surfactant present from 0.1 to 8.0 total weight percent, a hydrotrope present from 0.1 to 3.0 total weight percent, a wetting agent present from 0.1 to 5.0 total weight percent, a protectant present from 0.01 to 17 total weight percent, and a diluent making up a remainder of the composition. A method of cleaning a vehicle hard surface include applying the composition thereto and washing the composition therefrom to leave a residue of graphene or graphene oxide.

An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor, a pattern forming method using the same, and a method of manufacturing an electronic device using the same. The treatment liquid for manufacturing a semiconductor comprising: one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, wherein a total content of particulate metal including at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing a semiconductor.

An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor, a pattern forming method using the same, and a method of manufacturing an electronic device using the same. The treatment liquid for manufacturing a semiconductor comprising: one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, wherein a total content of particulate metal including at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing a semiconductor.

A laundry detergent composition including a particulate material is provided. The particulate material may include one or more particles having an active component and a non-active component. The non-active component may have a dry particle size of from about 0.01 m to about 20 m. Unit dose articles may include a water-soluble fibrous structure and the laundry detergent composition or at least the particulate material.

A laundry detergent composition including a particulate material is provided. The particulate material may include one or more particles having an active component and a non-active component. The non-active component may have a dry particle size of from about 0.01 m to about 20 m. Unit dose articles may include a water-soluble fibrous structure and the laundry detergent composition or at least the particulate material.

A package for an automatic dishwashing cycle, the package comprising at least one detergent composition in the form of a solid and at least one detergent composition in the form of a gel, wherein the weight ratio of the total amount of solid detergent composition to the total amount of gel detergent composition is between about 1.60:1 and about 3.00:1.

An object of the present invention is to provide a method of manufacturing a semiconductor device. The method of manufacturing a semiconductor device includes a lithography step, an etching step, and an ion implantation step, wherein at least one of a treatment liquid for manufacturing a semiconductor device used at the end of each step or before moving to the next step includes one kind or two or more kinds of metal atoms selected from Cu, Fe, and Zn, and wherein a total content of particulate metal comprising at least one kind of the metal atoms is 0.01 to 100 mass ppt with respect to a total mass of the treatment liquid for manufacturing a semiconductor.