Patent classifications
C11D3/43
CLEANING COMPOSITIONS COMPRISING DISPERSINS VIII
Cleaning compositions may include a mix of enzymes that include dispersins and proteases. Said compositions may be used in cleaning processes and/or for deep cleaning of organic stains, and for removal or reduction of components of organic matter.
Home Care Compositions
Described herein are hard-surface cleaning compositions comprising: an alkyl polyglycoside; an organic solvent comprising a diol having the formula: C.sub.nH.sub.2n(OH).sub.2, wherein n=3 to 10 and mixtures thereof; an alpha hydroxy acid; and a humectant. Methods of making and using these hard-surface cleaning compositions are also described herein.
Home Care Compositions
Described herein are hard-surface cleaning compositions comprising: an alkyl polyglycoside; an organic solvent comprising a diol having the formula: C.sub.nH.sub.2n(OH).sub.2, wherein n=3 to 10 and mixtures thereof; an alpha hydroxy acid; and a humectant. Methods of making and using these hard-surface cleaning compositions are also described herein.
Laundry Composition
Described herein is a laundry composition including a delivery system having a biodegradable carrier and a perfume formulation entrapped within the biodegradable carrier, a free perfume oil, and laundry additives.
Laundry Composition
Described herein is a laundry composition including a delivery system having a biodegradable carrier and a perfume formulation entrapped within the biodegradable carrier, a free perfume oil, and laundry additives.
Rinsing Composition and Method for Treating Surface of Photoresist Material Using Same
The rinsing composition according to embodiments of the present invention includes a non-ionic fluorinated surfactant and a basic additive containing tetraalkylammonium hydroxide in a specific range of content, so as to reduce the number of defects possibly occurring in a pattern after development of photoresist in a fine patterning process, while preventing pattern collapse.
Rinsing Composition and Method for Treating Surface of Photoresist Material Using Same
The rinsing composition according to embodiments of the present invention includes a non-ionic fluorinated surfactant and a basic additive containing tetraalkylammonium hydroxide in a specific range of content, so as to reduce the number of defects possibly occurring in a pattern after development of photoresist in a fine patterning process, while preventing pattern collapse.
Wet sheet for cleaning
A wet sheet for cleaning includes multiple layers and is impregnated with a chemical solution. The wet sheet includes hydrophobic fiber layers arranged in a front surface layer and a back surface layer, and a hydrophilic fiber layer arranged in an intermediate layer. The hydrophobic fiber layers have an interlaced part with a high fiber density where the hydrophobic fiber layers are interlaced with the hydrophilic fiber layer. The interlaced part has at least one slightly interlaced part and at least one highly interlaced part which is formed in a dent shape and which is interlaced with a higher fiber density. The highly interlaced part is formed in an area ratio of 10 to 20% to an area of the front surface layer or the back surface layer. Static friction resistance of the wet sheet for cleaning is lower than kinetic friction resistance of the wet sheet for cleaning.
Spray container comprising a detergent composition
The need for a container and detergent composition which exhibit good cleaning, including on greasy soils, and good surface shine, while also maintaining spray visibility on the treated hard surface, is met by formulating an aqueous detergent composition using a low level of surfactant system, an aminoalcohol solvent, and a glycol ether solvent, at the specified ratios.
Spray container comprising a detergent composition
The need for a container and detergent composition which exhibit good cleaning, including on greasy soils, and good surface shine, while also maintaining spray visibility on the treated hard surface, is met by formulating an aqueous detergent composition using a low level of surfactant system, an aminoalcohol solvent, and a glycol ether solvent, at the specified ratios.