Patent classifications
C11D7/02
Composition for surface treatment, method for producing the same, surface treatment method, and method for producing semiconductor substrate
The present invention provides a means capable of improving a residue removing effect and improving storage stability in a composition for surface treatment which is used for reducing residues on a surface of an object to be polished after being polished chemical mechanical polishing. The present invention relates to a composition for surface treatment, wherein the composition contains a solvent and a dissolved gas, a concentration of the dissolved gas is 0.01 mg/L or more and 10 mg/L or less with respect to a total volume of the composition and the composition is used for reducing residues on a surface of an object to be polished after being polished by chemical mechanical polishing.
DECONTAMINATING AGENT FOR CHEMICAL WARFARE AGENT (CWA), METHOD OF DECONTAMINATING CWA USING THE SAME AND PRODUCT INCLUDING THE SAME
Related are a chemical warfare agent (CWA) decontaminant, a method of decontaminating a CWA using the CWA decontaminant, and a product including the CWA decontaminant. The CWA decontaminant may include a metal-organic framework (MOF) including at least one metallic compound among metal hydroxide, metal hydride, metal acetate, metal methoxide, and metal oxide, and the at least one metallic compound may be dispersed either on a surface of the MOF or in pores of the MOF, or both.
TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMOVING RESIST
A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0?10.sup.?10 to 1.0?10.sup.?4.
COMPOSITION, COMPOSITION RESERVOIR, AND METHOD FOR PRODUCING COMPOSITION
An object of the present invention is to provide a composition including hydrogen peroxide, which can be used for semiconductor device manufacturing and which exhibits an excellent storage stability and has a reduced effect of defects on a semiconductor substrate. Further, another object of the present invention is to provide a method for producing the composition including hydrogen peroxide, and a composition reservoir for storing the composition.
The composition of the present invention includes hydrogen peroxide, an acid, and a Fe component, in which a content of the Fe component is 10.sup.5 to 10.sup.2 in terms of mass ratio with respect to the content of the acid.
Protective coatings for detersive agents and methods of forming and detecting the same
A method of creating a protective coating on an alkali metal hydroxide-containing solid is provided. The method includes providing carbon dioxide to an alkali metal hydroxide-containing solid and allowing the alkali metal hydroxide and carbon dioxide to react thereby forming a carbonate or bicarbonate-containing layer on the exterior of the solid wherein the carbonate or bicarbonate-containing layer is non-hygroscopic and water soluble, and wherein greater than 80% of the hydroxide in the hydroxide-containing solid does not react with the carbon dioxide, and further wherein the alkali metal hydroxide-containing solid is substantially free of lithium hydroxide. A method of testing for the presence of carbonate-containing coating on an alkali metal hydroxide containing solid is also provided. The method includes exposing the coated solid to 95 weight percent ethanol, collecting the ethanol effluent and testing the effluent for alkali metal hydroxide. A suitably coated solid does not have dissolved alkali metal hydroxide in the ethanol effluent or is substantially free of alkali metal hydroxide.
Protective coatings for detersive agents and methods of forming and detecting the same
A method of creating a protective coating on an alkali metal hydroxide-containing solid is provided. The method includes providing carbon dioxide to an alkali metal hydroxide-containing solid and allowing the alkali metal hydroxide and carbon dioxide to react thereby forming a carbonate or bicarbonate-containing layer on the exterior of the solid wherein the carbonate or bicarbonate-containing layer is non-hygroscopic and water soluble, and wherein greater than 80% of the hydroxide in the hydroxide-containing solid does not react with the carbon dioxide, and further wherein the alkali metal hydroxide-containing solid is substantially free of lithium hydroxide. A method of testing for the presence of carbonate-containing coating on an alkali metal hydroxide containing solid is also provided. The method includes exposing the coated solid to 95 weight percent ethanol, collecting the ethanol effluent and testing the effluent for alkali metal hydroxide. A suitably coated solid does not have dissolved alkali metal hydroxide in the ethanol effluent or is substantially free of alkali metal hydroxide.
Dry and portable calcined phyllosilicate spot removal product and method
A stain removal product formulation and method utilizing a dry, portable product. The dry, portable removal product preferably contains specially treated ingredients, including a composition of microporous silica and alumina tetrahedra and combined with aluminum dioctahedral phyllosilicates family of minerals. Ingredients may vary depending on the type of stain to treat, for example, for stains having an oil, grease or fat base. Due to the nature of stains and their varied content the product formulation may also include a combination of other dry ingredients such as clays, minerals, baking soda, corn starch, flour or other dry ingredients. Optional ingredients which may be added including dry coloring and/or dry fragrance components. The dry product formulation is provided in a powder, granule or flake form in moisture resistant packages and kits.
Supply method for liquid and supply apparatus
A solution having a predetermined concentration is stably supplied to a use point, at which the amount of use of the solution changes, by only modifying currently-used equipment at a low cost and in a space-saving manner. In order to supply a solution containing a solute at a predetermined concentration from a preparation portion of the solution to a use point through a supply pipe, a retention portion that has no gas-liquid interface and at which the solution is retained is provided at an intermediate portion of the supply pipe. Even when the amount of use of the solution at the use point changes, the change is absorbed by the retention portion, whereby a solution having a predetermined concentration can be stably supplied to the use point.
RAPID SURFACE DISINFECTION METHOD AND APPARATUS
A device for rapidly sanitizing a surface is described. The device has an enclosure having an opening adapted to insert a surface, and an interior; a liquid nitric oxide solution applicator; and an absorbent material. The liquid nitric oxide solution applicator is in fluid communication with the interior of the enclosure and is adapted to apply liquid nitric oxide solution onto the surface when the surface is positioned within the enclosure. A method of rapidly sanitizing a surface is described. The devices and methods provided herein may be implemented to sanitize the surface of any body part or item that may be placed within the device. An infectious agent on the surface may be killed; i.e., the surface is disinfected. Non-limiting applications of the devices and methods include preventing nosocomial infections or food contamination, sanitizing household items, and implementing sanitizing procedures to comply with FDA Good Manufacturing Practices.
RAPID SURFACE DISINFECTION METHOD AND APPARATUS
A device for rapidly sanitizing a surface is described. The device has an enclosure having an opening adapted to insert a surface, and an interior; a liquid nitric oxide solution applicator; and an absorbent material. The liquid nitric oxide solution applicator is in fluid communication with the interior of the enclosure and is adapted to apply liquid nitric oxide solution onto the surface when the surface is positioned within the enclosure. A method of rapidly sanitizing a surface is described. The devices and methods provided herein may be implemented to sanitize the surface of any body part or item that may be placed within the device. An infectious agent on the surface may be killed; i.e., the surface is disinfected. Non-limiting applications of the devices and methods include preventing nosocomial infections or food contamination, sanitizing household items, and implementing sanitizing procedures to comply with FDA Good Manufacturing Practices.