Methods for cleaning a substrate are disclosed. The substrate comprises a dielectric surface and a metal surface. The methods comprise providing a cleaning agent to the reaction chamber.

Methods for cleaning a substrate are disclosed. The substrate comprises a dielectric surface and a metal surface. The methods comprise providing a cleaning agent to the reaction chamber.

The present invention relates to a carrier material for the release of one or more active agent(s) in a home care formulation, a delivery system for the release of one or more active agent(s) in a home care formulation, a home care formulation comprising the delivery system for the release of one or more active agent(s), a method for preparing the delivery system for the release of one or more active agent(s) in a home care formulation as well as the use of the delivery system for the release of one or more active agent(s) in a home care formulation.

The present invention relates to a carrier material for the release of one or more active agent(s) in a home care formulation, a delivery system for the release of one or more active agent(s) in a home care formulation, a home care formulation comprising the delivery system for the release of one or more active agent(s), a method for preparing the delivery system for the release of one or more active agent(s) in a home care formulation as well as the use of the delivery system for the release of one or more active agent(s) in a home care formulation.

Compositions useful for the selective removal of titanium nitride and/or photoresist etch residue materials relative to metal conducting, e.g., tungsten, and insulating materials from a microelectronic device having same thereon. The removal compositions contain at least one oxidant and one etchant, may contain various corrosion inhibitors to ensure selectivity.

A composition, containing a carrier medium and particles based on a metal compound with a weight-average particle diameter of 1 nm to 10 m is useful to clean metal or ceramic surfaces which are part of a dental restoration or of an implant abutment.

A composition, containing a carrier medium and particles based on a metal compound with a weight-average particle diameter of 1 nm to 10 m is useful to clean metal or ceramic surfaces which are part of a dental restoration or of an implant abutment.

The present invention is directed to visually contrasting aesthetic particles having increased water solubility, particularly useful for combination with granular laundry detergent composition.

The present invention is directed to visually contrasting aesthetic particles having increased water solubility, particularly useful for combination with granular laundry detergent composition.

The invention relates to a degreasing mixture for removing grease, oils, or similar hydrophobic components from a surface of a substrate. The degreasing mixture contains a solvent-free silicate mixture as the main component. The silicate mixture contains granules of phyllosilicate and granules of tectosilicate. Up to 90% by mass of the granules contained in the silicate mixture has a particle size of less than 60 m, and the maximum particle size of the granules of phyllosilicate is smaller than the maximum particle size of the granules of tectosilicate.