A unit dose detergent pack includes a pouch and a detergent composition encapsulated within the pouch. The detergent composition includes a surfactant component including an alcohol ethoxy sulfate having a C.sub.8-C.sub.20 backbone that is ethoxylated with from about 1 to about 10 moles of ethylene oxide and is present in an amount of from about 5 to about 30 weight percent actives, water present in a total amount of from about 5 to about 30 weight percent, and a particular tertiary amine present in an amount of at least about 0.5 weight percent actives. The detergent composition has a viscosity of less than about 5,000 cps when diluted with additional water at about a 2:1 weight ratio of the detergent composition:water. The block copolymer is incorporated as a rheology modifying agent.

Suggested is fragrance composition comprising or consisting of a selection of specific nitriles showing improved stability against decomposition and discoloration.

A treatment liquid contains water, hydroxylamine, and one or more kinds of hydrazines selected from the group consisting of hydrazine, a hydrazine salt, and a hydrazine derivative, in which a total content of the hydrazines is 1 part by mass or less with respect to 100 parts by mass of the hydroxylamine.

The present invention is a method for cleaning hard articles including, cleaning a hard article to which an oil stain is adhered with a cleaning liquid containing 1 ppm or more and less than 500 ppm of (a) a branched alkyl sulfosuccinate ester having a branched alkyl group with 9 or 10 carbons and water.

A processing solution composition for reducing micro-bridge defects in a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source and a method of forming a pattern using the same are proposed. The processing solution composition includes 0.0001 to 1 wt % of an alkaline material, 0.0001 to 1 wt % of a nonionic surfactant having an HLB (Hydrophilic-Lipophilic Balance) value of 9 to 16, and 98 to 99.9998 wt % of water, reduces the number of micro-bridge defects in a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source, and has a low LWR (Line Width Roughness) value, thus effectively improving the uniformity of the pattern.

Provided are compositions useful for the cleaning of microelectronic device structures. The residues may include post-CMP, post-etch, post-ash residues, pad and brush debris, metal and metal oxide particles and precipitated metal organic complexes such as copper-benzotriazole complexes. Advantageously, the compositions as described herein show improved aluminum, cobalt, and copper compatibility.

A liquid laundry detergent formulation for household use is provided, comprising: a liquid carrier; a cleaning surfactant; and a cleaning booster of Formula (I)

##STR00001##

wherein each R.sup.1 is independently a chain of Formula (II)

##STR00002##

wherein each R.sup.2 is independently selected from the group consisting of a C.sub.1-8 alkyl group and a chain of Formula (II); wherein R.sup.3 and R.sup.4 are independently an aliphatic C.sub.3-12 alkanediyl group; wherein each R.sup.5 is independently selected from the group consisting of a hydrogen and a —C.sub.1-4 alkyl group; wherein n is an average of 0 to 8; wherein m is an average of 5 to 50; and wherein the cleaning booster has a weight average molecular weight of ≤10,000 Daltons.

Described herein are aqueous cleaning compositions comprises a combination of polyalkylenimine and an acid, a surfactant, and a solvent mixture. Methods of making and using the same are also described.

There is provided a means capable of sufficiently removing organic residues present on the surface of an object to be polished after polishing containing silicon nitride or polysilicon. A surface treatment composition containing: a polymer having a constituent unit represented by Formula (1) in [Chem. 1] below; at least one of an anionic surfactant and a nonionic surfactant; and water, in which the surface treatment composition is used for treating the surface of an object to be polished after polishing,

##STR00001## in which, in Formula (1) above, R.sup.1 is a hydrocarbon group having the number of carbon atoms of 1 to 5, and R.sup.2 is a hydrogen atom or a hydrocarbon group having the number of carbon atoms of 1 to 3.

Acidic liquid fabric care compositions that include citric acid and/or a salt thereof, fragrance material that includes certain aldehydic perfume raw materials, and water. Related methods of using and making such compositions.