C11D17/08

Body and pet wash organic foaming soap composition and dispenser
11130932 · 2021-09-28 · ·

An organic liquid and foaming soap composition and dispenser for use as a human hand, body wash and a pet wash, comprising: a) a foam-able organic liquid soap composition comprising the anti-microbial active ingredients of: organic shea butter; USDA approved natural spearmint oil; USDA approved natural lime oil; organic thyme oil; organic rosemary extract; and, b) a portable or fixed, manual or automatic foaming soap dispenser. The organic soap composition may further comprise a base soap comprising: saponified organic coconut oil; organic olive oil; organic sunflower oil; organic jojoba oil; organic aloe vera; and glycerin. And the organic soap composition has a shelf-life of about three years, and able to eradicate about 74.6% through 77.6% of the bacterial strain Staphylococcus aureus after at least one minute of direct contact with the composition. The dispenser is a fixed wall or sink mounted, or a portable bottle, including a mini-foaming leave-on sanitizer.

Body and pet wash organic foaming soap composition and dispenser
11130932 · 2021-09-28 · ·

An organic liquid and foaming soap composition and dispenser for use as a human hand, body wash and a pet wash, comprising: a) a foam-able organic liquid soap composition comprising the anti-microbial active ingredients of: organic shea butter; USDA approved natural spearmint oil; USDA approved natural lime oil; organic thyme oil; organic rosemary extract; and, b) a portable or fixed, manual or automatic foaming soap dispenser. The organic soap composition may further comprise a base soap comprising: saponified organic coconut oil; organic olive oil; organic sunflower oil; organic jojoba oil; organic aloe vera; and glycerin. And the organic soap composition has a shelf-life of about three years, and able to eradicate about 74.6% through 77.6% of the bacterial strain Staphylococcus aureus after at least one minute of direct contact with the composition. The dispenser is a fixed wall or sink mounted, or a portable bottle, including a mini-foaming leave-on sanitizer.

LIQUID HAND DISHWASHING DETERGENT COMPOSITION

A liquid hand dishwashing detergent composition having a higher fraction of components derived from natural, renewable sources is described. The liquid hand dishwashing detergent composition has a surfactant system which includes anionic surfactant having a combination of alkyl sulphate anionic surfactant and acyl taurate anionic surfactant.

LIQUID HAND DISHWASHING DETERGENT COMPOSITION

A liquid hand dishwashing detergent composition having a higher fraction of components derived from natural, renewable sources is described. The liquid hand dishwashing detergent composition has a surfactant system which includes anionic surfactant having a combination of alkyl sulphate anionic surfactant and acyl taurate anionic surfactant.

Cleaning solution composition

Provided is a cleaning solution composition which, when cleaning the surface of a semiconductor substrate or glass substrate, does not damage SiO.sub.2, Si.sub.3N.sub.4, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.

Detergent compositions containing a surfactant system including a nonionic and an ionic surfactant
11118136 · 2021-09-14 · ·

A wash composition includes a surfactant system, a solvent system, and one or more beneficial compositions. The surfactant system includes a) a linear alkylbenzenesulfonate (LAS), and b) a fatty acid methyl ester ethoxylate (MEE). Optionally, the surfactant system may further include c) an alkyl ether sulfate (AES), and d) a nonionic alcohol ethoxylate (AE). The wash composition may be embodied as a unit dose composition or a heavy-duty liquid. Methods for increasing the effectiveness of fabric cleaning that include using the wash composition are also provided.

METHOD OF MAKING A CLEANING COMPOSITION

A method of making a translucent cleaning composition is disclosed. The method includes providing a perfume; providing a hydrogen bond receiving compound; providing a hydrogen bond providing compound; combining the hydrogen bond receiving compound with the hydrogen bond providing compound to create a eutectic liquid; adding the perfume to the eutectic liquid to create a perfumed eutectic liquid; and adjusting the pH of the perfumed eutectic liquid to above 6.0.

METHOD OF MAKING A CLEANING COMPOSITION

A method of making a translucent cleaning composition is disclosed. The method includes providing a perfume; providing a hydrogen bond receiving compound; providing a hydrogen bond providing compound; combining the hydrogen bond receiving compound with the hydrogen bond providing compound to create a eutectic liquid; adding the perfume to the eutectic liquid to create a perfumed eutectic liquid; and adjusting the pH of the perfumed eutectic liquid to above 6.0.

CLEANING LIQUID COMPOSITION

The purpose of the present invention is to provide a cleaning liquid composition useful in cleaning substrates, etc., which have undergone treatment such as chemical mechanical polishing (CMP) in a process for manufacturing electronic devices such as semiconductor elements. This cleaning liquid composition for cleaning substrates having Cu wiring includes one or more basic compounds and one or more heteromonocyclic aromatic compounds containing a nitrogen atom, and has a hydrogen ion concentration (pH) of 8-11.

CLEANING LIQUID COMPOSITION

The purpose of the present invention is to provide a cleaning liquid composition useful in cleaning substrates, etc., which have undergone treatment such as chemical mechanical polishing (CMP) in a process for manufacturing electronic devices such as semiconductor elements. This cleaning liquid composition for cleaning substrates having Cu wiring includes one or more basic compounds and one or more heteromonocyclic aromatic compounds containing a nitrogen atom, and has a hydrogen ion concentration (pH) of 8-11.