C11D17/08

Manganese bleach catalyst granules for use in dishwash detergents

The present invention relates to co-granules comprising an enzyme and a bleach catalyst and to their use in bleach-containing granular automatic dishwash (ADW) detergents.

SEMICONDUCTOR SUBSTRATE CLEANING AGENT
20210130749 · 2021-05-06 · ·

To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities.

The semiconductor substrate cleaning agent of the present invention contains at least the following component (A) and component (B):

Component (A): a water-soluble oligomer having a weight average molecular weight of not less than 100 and less than 10000; and
Component (B): water.

It is preferable that the water-soluble oligomer is at least one compound selected from compounds represented by the following formulas (a-1) to (a-3).


R.sup.a1O—(C.sub.3H.sub.6O.sub.2).sub.n—H  (a-1)


R.sup.a2O—(R.sup.a3O).sub.n′—H  (a-2)


(R.sup.a4).sub.3-s—N—[(R.sup.a5O).sub.n″—H].sub.s  (a-3)

SEMICONDUCTOR SUBSTRATE CLEANING AGENT
20210130749 · 2021-05-06 · ·

To provide a cleaning agent that can remove impurities such as metal polishing dust adhering to a semiconductor substrate without corroding metal and can prevent re-adhesion of the impurities.

The semiconductor substrate cleaning agent of the present invention contains at least the following component (A) and component (B):

Component (A): a water-soluble oligomer having a weight average molecular weight of not less than 100 and less than 10000; and
Component (B): water.

It is preferable that the water-soluble oligomer is at least one compound selected from compounds represented by the following formulas (a-1) to (a-3).


R.sup.a1O—(C.sub.3H.sub.6O.sub.2).sub.n—H  (a-1)


R.sup.a2O—(R.sup.a3O).sub.n′—H  (a-2)


(R.sup.a4).sub.3-s—N—[(R.sup.a5O).sub.n″—H].sub.s  (a-3)

System and method for distributing scented, color-coded, or color scented dilution ratios of disinfectants, disinfectant based cleaning concentrates and ready to use foaming and non foaming hard surface, soft surface and skin cleaning concentrates that are diluted into ready to use form products
11008211 · 2021-05-18 ·

A system and method for distributing color-coded dilution ratios of cleaning concentrates at different dilution ratios and flow rates. The system mixes a concentrated cleaning composition with different quantities of water to produce diluted concentrates. A plurality of separate dyes or scented dyes are added to the diluted concentrates, with each color of dye correlating to a unique diluted concentrate. This provides a visual indication of the dilution ratio of the diluted concentrate. A plurality of metering devices selectively dispense the dyed diluted concentrates at different dilution ratios and at multiple flow rates. The metering devices are labeled with identification markings, indicating dilution ratios and flow rates. The dilution ratio and the flow rate are selected based on the type of cleaning that is required, and the type of dispensing means used for cleaning. A plurality of lines carry the concentrated cleaning composition, water, dyes, and dyed diluted concentrate.

Cleansing composition

A liquid cleansing composition comprising water in an amount sufficient to form a liquid composition, a fatty acid soap, a structuring agent, and talc. The cleansing composition has a creamy texture and provides good skinfeel properties.

Cleansing composition

A liquid cleansing composition comprising water in an amount sufficient to form a liquid composition, a fatty acid soap, a structuring agent, and talc. The cleansing composition has a creamy texture and provides good skinfeel properties.

Compositions comprising sugar amine and fatty acid

What are described are compositions comprising a) one or more sugar amines of the formula (I) in which R1 and R2 are independently H, CH.sub.3 or 2-hydroxyethyl and/or one or more corresponding protonated sugar amines with the counterion RCOO in which R is defined as R from the substances of component b) below, and b) one or more substances selected from the group consisting of fatty acids of the formula RCOOH, fatty acid salts of the formula RCOO-M+ and mixtures thereof, in which R is a linear or branched saturated alkyl radical having 11 to 21 carbon atoms or a linear or branched, mono- or polyunsaturated alkenyl radical having 11 to 21 carbon atoms and M+ is a counterion. The compositions described are very advantageous, for example, for production of liquid washing compositions, and of shower gels, liquid soaps or face cleansers. In addition, the sugar amines are advantageously suitable as neutralizing agents for fatty acids. ##STR00001##

Compositions comprising sugar amine and fatty acid

What are described are compositions comprising a) one or more sugar amines of the formula (I) in which R1 and R2 are independently H, CH.sub.3 or 2-hydroxyethyl and/or one or more corresponding protonated sugar amines with the counterion RCOO in which R is defined as R from the substances of component b) below, and b) one or more substances selected from the group consisting of fatty acids of the formula RCOOH, fatty acid salts of the formula RCOO-M+ and mixtures thereof, in which R is a linear or branched saturated alkyl radical having 11 to 21 carbon atoms or a linear or branched, mono- or polyunsaturated alkenyl radical having 11 to 21 carbon atoms and M+ is a counterion. The compositions described are very advantageous, for example, for production of liquid washing compositions, and of shower gels, liquid soaps or face cleansers. In addition, the sugar amines are advantageously suitable as neutralizing agents for fatty acids. ##STR00001##

LIQUID COMPOSITION FOR REDUCING DAMAGE OF COBALT, ALUMINA, INTERLAYER INSULATING FILM AND SILICON NITRIDE, AND WASHING METHOD USING SAME

The present invention relates to: a liquid composition suitable for the washing of a semiconductor element provided with a low-dielectric-constant interlayer insulating film; and a method for washing a semiconductor element. The liquid composition according to the present invention is characterized by containing tetrafluoroboric acid (A) in an amount of 0.01 to 30% by mass, or boric acid (B1) and hydrogen fluoride (B2) at a (boric acid)/(hydrogen fluoride) ratio of (0.0001 to 5.0/by mass)/(0.005 to 5.0% by mass), and having a pH value of 0.0 to 4.0. The liquid composition according to the present invention can reduce the damage of a low-dielectric-constant interlayer insulating film, cobalt or a cobalt alloy, alumina, a zirconia-based hard mask and a silicon nitride during the process of producing a semiconductor integrated circuit, and accordingly can be used suitably for removing dry etching residues occurring on the surface of the semiconductor integrated circuit.

Method for washing clothing
10947479 · 2021-03-16 · ·

The present invention relates to a method for washing clothing, including washing clothing with a detergent liquid having a pH of 3.5 or more and 8.5 or less at 20 C. obtained by mixing the following component (A) and component (B), and water having a hardness: component (A): an internal olefin sulfonate having 15 or more and 24 or less carbon atoms; and component (B): protease.