Patent classifications
C11D17/08
Odor Free Laundry Detergent Soap
An odor free detergent soap includes Diatomaceous Earth, Olive oil, Borax, Coconut oil, Palm oil, Shea butter, Sodium Hydroxide, Water, Sodium 5 Bicarbonate, Carbon Dioxide and preparation method thereof. Further, the odor free detergent soap is bio-degradable and non-toxic insect killer. The food grade diatomaceous earth is used because it would not harm to the skin and also would not harm to the pet. The odor free laundry detergent soap is good for the washing clothes of people having sensitive skin.
Odor Free Laundry Detergent Soap
An odor free detergent soap includes Diatomaceous Earth, Olive oil, Borax, Coconut oil, Palm oil, Shea butter, Sodium Hydroxide, Water, Sodium 5 Bicarbonate, Carbon Dioxide and preparation method thereof. Further, the odor free detergent soap is bio-degradable and non-toxic insect killer. The food grade diatomaceous earth is used because it would not harm to the skin and also would not harm to the pet. The odor free laundry detergent soap is good for the washing clothes of people having sensitive skin.
Methods of making unit-dose products with supercooling
Disclosed is a method for producing a unit-dose capsule which includes optionally forming the first film into the shape of a first cavity, supercooling a first component to a temperature at which the equilibrium state of the first component is a gel, dispensing the first component in a supercooled state into the first cavity, such that the first component gels to form at least one layer of gel adhered to and/or in contact with the first film, forming a second film into the shape of a second cavity, filling the second cavity with a second component, sealing the first film to the second film to form a sealed cavity comprising at least one chamber containing the first component and the second component. The method may further include wetting and perforating the first film. The unit-dose capsule comprises the sealed container and the two components.
LIQUID HAND DISHWASHING CLEANING COMPOSITION
The need for a liquid hand-dishwashing composition which provides further improved sudsing volume and longevity when washing dishware using diluted liquid hand dishwashing compositions, especially in the presence of greasy soil and particulate soil, while still providing the desired cleaning, is met when the composition is formulated with a surfactant system comprising an anionic surfactant and a co-surfactant, and poly(1,3-propyleneglycol).
LIQUID HAND DISHWASHING CLEANING COMPOSITION
The need for a liquid hand-dishwashing composition which provides further improved sudsing volume and longevity when washing dishware using diluted liquid hand dishwashing compositions, especially in the presence of greasy soil and particulate soil, while still providing the desired cleaning, is met when the composition is formulated with a surfactant system comprising an anionic surfactant and a co-surfactant, and poly(1,3-propyleneglycol).
Liquid laundry detergent composition
The present invention relates to liquid laundry detergent compositions comprising a polyetheramine.
Liquid laundry detergent composition
The present invention relates to liquid laundry detergent compositions comprising a polyetheramine.
CLEANING FLUID
A cleaning fluid includes a static liquid (13) at a first temperature, a dynamic liquid (16) that flows toward an object held in the static liquid (13), and a fine gas bubble group (22) formed from a gas at a second temperature that is different from the first temperature, the gas being entrapped by a flow of the dynamic liquid (16) and flowing toward the object. This can provide a cleaning fluid that exhibits a remarkably better cleaning effect than ever before.
Semiconductor element cleaning solution that suppresses damage to tungsten-containing materials, and method for cleaning semiconductor element using same
According to the present invention, it is possible to provide a cleaning solution which removes a photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and a material that contains 10 atom % or more of tungsten, wherein the cleaning solution contains 0.001-5 mass % of an alkaline earth metal compound, 0.1-30 mass % of an inorganic alkali and/or an organic alkali, and water.
Semiconductor element cleaning solution that suppresses damage to tungsten-containing materials, and method for cleaning semiconductor element using same
According to the present invention, it is possible to provide a cleaning solution which removes a photoresist on a surface of a semiconductor element having a low dielectric constant film (a low-k film) and a material that contains 10 atom % or more of tungsten, wherein the cleaning solution contains 0.001-5 mass % of an alkaline earth metal compound, 0.1-30 mass % of an inorganic alkali and/or an organic alkali, and water.