The present invention provides a cleaning liquid for a semiconductor substrate that has been subjected to CMP, in which the cleaning liquid has an excellent selectivity for RuO.sub.2 removing performance; and a method for cleaning a semiconductor substrate that has been subjected to CMP. The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a perhalogen acid and a halogen acid.

A two-stage method produces a liquid soap, having an alkaline pH and stable viscosity, so as to be efficacious in controlling pathogens and generating a thick lather which optimizes its cleansing and disinfecting effects. The method involves saponification of natural and/or synthetic oils/fats using of two lyes—potassium hydroxide and sodium hydroxide—which, when combined in roughly equal proportions, yield a lathery liquid soap without the need for synthetic surfactants or chemical thickeners. The method is also distinctive insofar as it first produces a solid soap concentrate, from which the liquid soap can be made simply by dissolving the solid soap concentrate in water.

The present invention is a method for cleaning hard articles including, cleaning a hard article to which an oil stain is adhered with a cleaning liquid containing 1 ppm or more and less than 500 ppm of (a) a branched alkyl sulfosuccinate ester having a branched alkyl group with 9 or 10 carbons and water.

The present invention is a method for cleaning hard articles including, cleaning a hard article to which an oil stain is adhered with a cleaning liquid containing 1 ppm or more and less than 500 ppm of (a) a branched alkyl sulfosuccinate ester having a branched alkyl group with 9 or 10 carbons and water.

A cleaning composition for an oral appliance, including the following components (A) and (B): (A) an unsaturated fatty acid having 10 or more and 20 or less carbon atoms or a salt thereof in an amount of 0.5 mass % or more and 14 mass % or less in terms of the fatty acid, and (B) one or more surfactants selected from the group consisting of an anionic surfactant (b1), a nonionic surfactant (b2), and an amphoteric surfactant (b3), and the composition has a pH at 25° C. of 5.5 or higher and 14 or lower.

A cleaning liquid for cleaning a substrate having a first metal atom-containing layer that contains ruthenium and a second metal atom-containing layer that contains a metal atom other than ruthenium, both of the layers contacting each other, and at least one of the first metal atom-containing layer and the second metal atom-containing layer is exposed on a surface. The cleaning liquid includes at least one of a compound represented by General Formula (a1), a hydrate of the compound, and a salt of the compound, and at least one amine other than the hydrazine compound and a quaternary hydroxide. In General Formula (a1), R.sup.1 and R.sup.2 represent an organic group including no carbonyl group or a hydrogen atom

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Provided is a cleaner composition which causes no malfunction due to clogging even when contained in a pump foamer container, or the like, and repeatedly used, and is excellent in resilience and persistence of foam, and feeling after washing off. The cleaner composition includes a soap that is obtained by neutralizing a higher fatty acid with sodium N-methyltaurate, and a polymer including dimethyl diallyl ammonium chloride as a monomer unit and having a molecular weight of 200000 or less.

An object is to provide a hydrofluoroolefin-based or hydrochlorofluoroolefin-based azeotropic or azeotropic-like composition. The azeotropic or azeotropic-like composition contains trans-1-chloro-3,3,3-trifluoropropene and 1-chloro-1,3,3,3-tetrafluoropropene. In the azeotropic or azeotropic-like composition, 1-chloro-1,3,3,3-tetrafluoropropene exists in an effective amount to form an azeotropic or azeotropic-like mixture with trans-1-chloro-3,3,3-trifluoropropene.

The present disclosure relates to detergents and cleaning agents comprising at least one protease and at least one organic compound of the formula (I) which acts as a protease inhibitor and therefore is a suitable enzyme stabilizer, and to the use of said compounds as enzyme stabilizers in protease-containing detergents and cleaning agents. The present disclosure also relates to the corresponding washing and cleaning methods and to the use of the detergents and cleaning agents.

The present disclosure relates to detergents and cleaning agents comprising at least one protease and at least one organic compound of the formula (I) which acts as a protease inhibitor and therefore is a suitable enzyme stabilizer, and to the use of said compounds as enzyme stabilizers in protease-containing detergents and cleaning agents. The present disclosure also relates to the corresponding washing and cleaning methods and to the use of the detergents and cleaning agents.