An ultraflat and ultralow-friction metallic glass thin film is fabricated. The metallic glass thin film is a binary alloy, wherein a content of one metal element of the binary alloy is between 45 atomic % and 64 atomic %. The metallic glass thin film has an atomically smooth surface with a surface roughness R.sub.a less than 0.1 nm and a total height of profile R.sub.t less than 0.15 nm; the friction coefficient is below 1×10.sup.−2. Due to the metallic glass thin film being treated by ion bombardment, the metallic glass thin film is thermally ultrastable.

Provided is a tantalum sputtering target that contributes to improvement of film thickness uniformity during a high-power sputtering. A tantalum sputtering target having a purity of 99.99% by mass or more and an average value of Vickers hardness on a sputtering surface of from 85 to 110 Hv, the tantalum sputtering target satisfying both of the following conditions (1) and (2): (1) when a cross section perpendicular to the sputtering surface is measured by EBSP, an average value of Kernel Average Misorientation values (KAM values) is from 0.2° to 2.8°; and (2) when a cross section perpendicular to the sputtering surface is measured by EBSP, an average value of orientation area ratios of a {100} plane oriented at a misorientation of within 15° relative to a normal direction of the sputtering surface is 20% or more.

Provided is a tantalum sputtering target that contributes to improvement of film thickness uniformity during a high-power sputtering. A tantalum sputtering target having a purity of 99.99% by mass or more and an average value of Vickers hardness on a sputtering surface of from 85 to 110 Hv, the tantalum sputtering target satisfying both of the following conditions (1) and (2): (1) when a cross section perpendicular to the sputtering surface is measured by EBSP, an average value of Kernel Average Misorientation values (KAM values) is from 0.2° to 2.8°; and (2) when a cross section perpendicular to the sputtering surface is measured by EBSP, an average value of orientation area ratios of a {100} plane oriented at a misorientation of within 15° relative to a normal direction of the sputtering surface is 20% or more.

Systems and methods in accordance with embodiments of the invention implement tailored metallic glass-based strain wave gears and strain wave gear components. In one embodiment, a method of fabricating a flexspline of a strain wave gear includes: forming a MG-based composition into a flexspline using one of a thermoplastic forming technique and a casting technique; where the forming of the MG-based composition results in a formed MG-based material; where the formed flexspline is characterized by: a minimum thickness of greater than approximately 1 mm and a major diameter of less than approximately 4 inches.

Systems and methods in accordance with embodiments of the invention implement tailored metallic glass-based strain wave gears and strain wave gear components. In one embodiment, a method of fabricating a flexspline of a strain wave gear includes: forming a MG-based composition into a flexspline using one of a thermoplastic forming technique and a casting technique; where the forming of the MG-based composition results in a formed MG-based material; where the formed flexspline is characterized by: a minimum thickness of greater than approximately 1 mm and a major diameter of less than approximately 4 inches.

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element.

An embodiment relates to a material comprising a ceramic formed from an amorphous metal alloy (amorphous metal ceramic composite), wherein the composite exhibits a higher corrosion resistance than that of Haynes 230 when exposed to molten chlorides such as KCl or MgCl.sub.2 or combinations thereof at temperatures up to 750° C. Yet, another embodiment relates to a method comprising obtaining a substrate, forming a coating of an amorphous metal alloy, heating the coating, and transforming at least a portion the amorphous metal alloy into an amorphous metalceramic composite.

A family of rivets including both blind and bucked-type rivets made at least partially from an amorphous metal alloy. A blind rivet includes a head portion and a tail portion. At least one of the head portion and the tail portion is configured to elastically deform to secure a first member in position relative to a second member. The head portion and the tail portion may include one or more deformable legs having an interface feature configured to engage with one of the first member and the second member. A bucked-type rivet assembly includes a formable member and an anvil. The anvil is configured to thermoplastically deform the formable member proximate to the second member by passing current through an electrical circuit that includes at least one of the formable member and anvil.

A family of rivets including both blind and bucked-type rivets made at least partially from an amorphous metal alloy. A blind rivet includes a head portion and a tail portion. At least one of the head portion and the tail portion is configured to elastically deform to secure a first member in position relative to a second member. The head portion and the tail portion may include one or more deformable legs having an interface feature configured to engage with one of the first member and the second member. A bucked-type rivet assembly includes a formable member and an anvil. The anvil is configured to thermoplastically deform the formable member proximate to the second member by passing current through an electrical circuit that includes at least one of the formable member and anvil.

Cu-based bulk amorphous alloys in the quaternary Cu—Zr—Hf—Al alloy system are disclosed. A method of casting such alloys and articles comprising such alloys also are disclosed.