The present invention relates to a component comprising a surface coated with a coating comprising a MoxCryN layer, where x and y correspond to the coefficients of Mo content and Cr content in atomic percentage, respectively, when only Mp and Cr are considered, and so x+y is considered to be 100 at %.

Separators, high performance electrochemical devices, such as, batteries and capacitors, including the aforementioned separators, systems and methods for fabricating the same. In one implementation, a separator is provided. The separator comprises a polymer substrate (131), capable of conducting ions, having a first surface and a second surface opposing the first surface. The separator further comprises a first ceramic-containing layer (136), capable of conducting ions, formed on the first surface. The first ceramic-containing layer (136) has a thickness in arrange from about 1,000 nanometers to about 5000 nanometers. The separator further comprises a second ceramic-containing layer (138), capable of conducting ions, formed on the second surface. The second ceramic-containing layer (138) is a binder-free ceramic-containing layer and has a thickness in arrange from about 1 nanometer to about 1,000 nanometers.

A preparation device has a chamber, molten metal containers, a rotatable base in the chamber and having a deposition substrate, laser sets generating a dual-pulse laser, a base controller and a data collection control unit. The containers communicate with the chamber and each has a pulse pressurization apparatus pressing the molten metal into the chamber. The laser sets correspond to the containers such that beams of an emitted dual-pulse laser bombard the pulsed droplets, plasmas are generated and are sputtered and deposited on the substrate forming a multi-element alloy thin film. The unit collects base temperature and displacement information, and controls the pressurization frequency of the pulse pressurization apparatus, and the emission frequency and energy of the dual-pulse laser of the laser sets controlling the frequency and energy of the dual-pulse laser bombarding the corresponding pulsed droplets. The base controller controls the base temperature, rotation and movement.

An HEMT device of a normally-on type, comprising a heterostructure; a dielectric layer extending over the heterostructure; and a gate electrode extending right through the dielectric layer. The gate electrode is a stack, which includes: a protection layer, which is made of a metal nitride with stuffed grain boundaries and extends over the heterostructure, and a first metal layer, which extends over the protection layer and is completely separated from the heterostructure by said protection layer.

[Problem to be solved] To produce an SiO powder having a rounded spherical particulate shape and a small particle diameter; and further having a low degree of impurity contamination, efficiently and economically.

[Solution] A mixture of Si and SiO.sub.2 as an SiO gas generation raw material 9 is loaded into a crucible 2. The mixture in the crucible 2 is heated under a reduced pressure so as to generate SiO gas. The generated SiO gas is accumulated on a deposition base 5 rotating on the crucible 2. When SiO deposit 10 accumulated on the deposition base 5 is scraped off with a blade 7, a tip of the blade 7 is separated from a surface of the deposition base 5, and in a state in which a portion of the SiO deposit 10 accumulated on the deposition base 5 is left on the deposition base 5, the remaining SiO deposit 10 is scraped off by the blade 7 and collected as an SiO powder 11.

An apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The apparatus includes a vaporizer assembly having an injection valve for receiving a liquid reactant, vaporizing the liquid reactant, and delivering the vaporized liquid reactant. The injection valve includes a valve body encompassing an interior region therein, a gas inlet port, a liquid inlet port, and a vapor outlet port all in fluid communication with the interior region. The vaporizer assembly further includes a first inlet line having a first end fluidly coupled with the liquid inlet port and a second end to be connected to a liquid source. The vaporizer assembly further includes a second inlet line with a first end fluidly coupled with the gas inlet port, a second end fluidly coupled with a carrier gas source, and a heater positioned between the first end and the second end.

A metal cutting tool includes a main body made of cemented carbide, cermet, ceramic, steel or high-speed steel, and a multi-layer wear protection coating. The wear protection coating includes a lower layer having an overall composition of Ti.sub.m Al.sub.(1-m) N with 0.25<m<0.55 and an overall thickness of 500 nm to 3 μm. The lower layer has 50 to 600 pairs of alternately stacked sub-layers in a sequence (A-B-A-B- . . . ) and having a composition Ti.sub.a Al.sub.(1-a) N with 0.45≤a≤0.55 and a thickness of 1 nm to 10 nm. The upper layer has 30 to 400 triples of alternately stacked sub-layers in a sequence (C-D-E-C-D-E- . . . ). The sub-layers of the upper layer have a composition Ti.sub.x Al.sub.ySi.sub.zN with x+y+z=1 and 0.20≤x≤0.45, 0.20≤y≤0.45 and 0.20≤z≤0.45 and a thickness of 1 nm to 10 nm.

The present invention provides a vapour deposition method for preparing an amorphous lithium borosilicate compound or doped lithium borosilicate compound, the method comprising: providing a vapour source of each component element of the compound, wherein the vapour sources comprise at least a source of lithium, a source of oxygen, a source of boron and a source of silicon, and, optionally, a source of at least one dopant element; providing a substrate at a temperature of less than about 180° C.; delivering a flow of said lithium, said oxygen, said boron and said silicon, and, optionally, said dopant element, wherein the rate of flow of said oxygen is at least about 8×10.sup.−8 m.sup.3/s; and co-depositing the component elements from the vapour sources onto the substrate wherein the component elements react on the substrate to form the amorphous compound.

An external part of a timepiece has a substrate that includes a base layer and a surface layer, the surface layer including Ti or stainless steel; and a coating disposed on the substrate. The coating includes an outermost layer formed primarily of TiC defining an external surface, and an interior layer formed primarily of TiC positioned between the substrate and the outermost layer. An elastic modulus of the interior layer is greater than the elasticmodulus of the outermost layer.

A manufacturing method of the ESD protection device includes the following steps. A surface treatment is performed on the substrate. A link layer is formed on the substrate after the surface treatment, wherein a material of the link layer includes a metal material. A progressive layer is formed on the link layer, wherein a material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. A composite layer is formed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1×10.sup.7 to 1×10.sup.8 Ω/sq.