Provided is a method for arranging a protective coating for a thermally stressed structure, having at least one layer of alpha-aluminium oxide or of element-modified alpha-aluminium oxide, and wherein the protective coating is applied by reactive cathodic arc vaporization. A protective coating produced by the method and a component having a protective coating is also provided.

Provided are: an oriented electromagnetic steel sheet with outstanding coating adhesion and magnetic properties after stress relief annealing; and a method for manufacturing the oriented electromagnetic steel sheet. The oriented electromagnetic steel sheet comprises: a steel sheet; a non-oxide ceramic coating disposed on the steel sheet and containing a non-oxide; and an insulating tensile coating disposed on the non-oxide ceramic coating and containing an oxide. The thickness of the non-oxide ceramic coating is 0.020-0.400 μm. The thickness of the insulating tensile coating is at least 1.0 μm. The chromium content on the steel plate side of the non-oxide ceramic coating is less than 25 atomic %, and the chromium content on the insulating tensile coating side of the non-oxide ceramic coating is at least 25 atomic %.

A ball and a valve seat for a fuel injector, and a method for coating the same are provided to form a Ta—C:H—SiO functional layer having a low frictional characteristic as the outermost layer to reduce a frictional coefficient. A Mo-based material is applied to a bonding layer and a supporting layer for bonding and supporting the Ta—C:H—SiO functional layer is applied to a base material to improve heat resistance. Accordingly, only pure ionic Mo particles are deposited to form the bonding layer and the supporting layer, thereby increasing an adhesive force and a bonding force to improve durability.

A capacitive element and a dielectric thin film having a small dielectric loss and a large relative permittivity, particularly at low frequencies. [Solution] This dielectric thin film includes an A-B—O—N oxynitride. When the A-B—O—N oxynitride is represented by the compositional formula A.sub.aB.sub.bO.sub.oN.sub.n, (o+n)/a<3.00 is satisfied.

A method for regulating color of a hard coating, including the following steps: providing an amorphous alloy layer; forming an amorphous metal oxide layer on a surface of the amorphous alloy layer to stack the amorphous metal oxide layer on the amorphous alloy layer, so that the amorphous metal oxide layer and the amorphous alloy layer together form the hard coating, wherein a band gap of the amorphous metal oxide layer is in a range from 2 eV to 5 eV, and the color of the hard coating is capable of varying within the visible light spectrum depending on thickness of the amorphous metal oxide layer; and controlling the thickness of the amorphous metal oxide layer in the formation of the amorphous metal oxide layer to obtain the amorphous metal oxide layer of a predetermined color. A hard coating and a method for preparing the same are also provided.

Coating (210) deposited on a surface of a substrate (201) comprising a multi-layered film (216) consisting of a plurality of A-layers and a plurality of B-layers deposited alternating one on each other forming a A/B/A/B/A . . . architecture, the A-layers comprising aluminium chromium boron nitride and the B-layers comprising aluminium chromium nitride and not comprising boron, whereas the multi-layered film (216) comprises at least a first portion (216a) and a last portion (216c), wherein the average boron content in the first coating portion (216a) is higher than the average boron content in the last coating portion (216c), and both the first coating portion (216a) and the last coating portion (216c) exhibit inherent compressive stresses and wherein the inherent compressive stress in the first coating portion (216a) is lower than it in the last coating portion (216c).

An HEMT device of a normally-on type, comprising a heterostructure; a dielectric layer extending over the heterostructure; and a gate electrode extending right through the dielectric layer. The gate electrode is a stack, which includes: a protection layer, which is made of a metal nitride with stuffed grain boundaries and extends over the heterostructure, and a first metal layer, which extends over the protection layer and is completely separated from the heterostructure by said protection layer.

An ESD protection composite structure includes a link layer, a progressive layer, and a composite layer. The link layer is used for disposing the ESD protection composite structure on a substrate, wherein a material of the link layer includes a metal material. The progressive layer is disposed on the link layer, wherein the material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. The composite layer is disposed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1×10.sup.7 Ω/sq to 1×10.sup.8 Ω/sq.

A component for a processing chamber includes a ceramic body having at least one surface with a first average surface roughness. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness that is less than the first average surface roughness.

A hard carbon film that forms a sliding surface of a sliding member, wherein the hard carbon film includes terminal atoms that bond to carbon atoms and has a plurality of protruding shaped parts, part of which protrude from the surface thereof, with the periphery of each of the plurality of protruding shaped parts being terminated by a terminal atom. A manufacturing method for the hard carbon film for producing the hard carbon film on a sliding surface of the sliding member using arc vapor deposition having graphite as the vaporization source, wherein a gas containing the terminal atoms that bond to carbon atoms is introduced, and the plurality of protruding shaped parts is grown on the surface of the hard carbon film while terminating the periphery of the plurality of protruding shaped parts by bonding of the terminal atoms to carbon atoms.