C23C14/0021

COATED TOOL AND CUTTING TOOL INCLUDING SAME
20200180039 · 2020-06-11 ·

A coated tool may include a base member and a coating layer located on the base member. The coating layer may include a plurality of AlTi layers and a plurality of AlCr layers. The AlTi layers may include at least one kind selected from nitride, carbide or carbonitride, each including aluminum and titanium. The AlCr layers may include at least one kind selected from nitride, carbide or carbonitride, each including aluminum and chromium. The coating layer may include a laminate structure in which the AlTi layers and the AlCr layers are alternately laminated one upon another. The AlCr layers may include a first AlCr layer and a second AlCr layer located farther away from the base member than the first AlCr layer. A content ratio of chromium in the second AlCr layer may be higher than a content ratio of chromium in the first AlCr layer.

PVD BOND COAT
20200165718 · 2020-05-28 ·

Superalloy workpiece including a superalloy substrate and an interface layer (IF-1) of essentially the same superalloy composition directly on a surface of the superalloy substrate, followed by a transition layer (TL) of essentially the same superalloy and supperalloy oxides or a different metal composition and different metal oxides whereby oxygen content of the transition layer is increasing from IF-1 towards a barrier layer (IF-2) of super alloy oxides or of different metal oxides.

Surface-coated cutting tool and method for manufacturing same

A surface-coated cutting tool includes a base material and a coating film formed on a surface of the base material. The coating film includes a first alternating layer and a second alternating layer formed on the first alternating layer. The first alternating layer includes first and second layers. The second alternating layer includes third and fourth layers. One or a plurality of the first layers and one or a plurality of the second layers are layered alternately, and one or a plurality of the third layers and one or a plurality of the fourth layers are layered alternately.

HARD CUBIC AL-RICH ALTIN COATING LAYERS PRODUCED BY PVD FROM CERAMIC TARGETS
20240018642 · 2024-01-18 ·

A PVD coating process, preferably an arc evaporation PVD coating process for producing an aluminum-rich Al.sub.xTi.sub.1-xN-based thin film having an aluminium content of >70 at-% based on the total amount of aluminium and titanium in the thin film, a cubic crystal structure and an at least partially non-columnar microstructure with a non-columnar content of >1 vol-% based on the volume of the total microstructure, wherein ceramic targets are used as material source for the aluminium-rich Al.sub.xTi.sub.1-xN-based thin film.

METHODS AND APPARARATUS COMPRISING A FIRST CONDUIT CIRCUMSCRIBED BY A SECOND CONDUIT

A fluid distributor comprises a first conduit extending along a first elongated axis and a second conduit circumscribing the first conduit. A first area comprises a cross-sectional flow area of the first conduit taken perpendicular to the first elongated axis. The first conduit comprises a first plurality of orifices comprising a first combined cross-sectional area. The second conduit comprises a second plurality of orifices comprising a second combined cross-sectional area. A first ratio of the first area to the first combined cross-sectional area can be about 2 or more. A second ratio of the first combined cross-sectional area to the second combined cross-sectional area can be about 2 or more. An angle between a direction of an orifice axis of a first orifice of the first plurality of orifices and a direction of an orifice axis of a first orifice of the second plurality of orifices can be from about 45 to 180.

PLASMA CORRIDOR FOR HIGH VOLUME PE-CVD PROCESSING

A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.

Optical sensor for analyte detection

Devices, systems, and methods for detection of an analyte in a sample are disclosed. In some embodiments, an optical sensor can include a metallic layer and a plurality of dielectric pillars extending through the metallic layer. A plurality of regions of concentrated light can be supported in proximity to the ends of the plurality of dielectric pillars when a surface of the metallic layer is illuminated. Concentrated light within one or more of these regions can interact with an analyte molecule, allowing for detection of the analyte.

SURFACE-COATED CUTTING TOOL

To improve the adhesion resistance and wear resistance of a surface-coated cutting tool. The surface-coated cutting tool includes a tool substrate, and a single-component coating layer composed of a composite nitride of Cr (chromium), Al (aluminum), and V (vanadium) and disposed on the surface of the tool substrate. The composite nitride is characterized by being represented by a compositional formula: Cr.sub.aAl.sub.bV.sub.cN satisfying the following relations:


0.11a0.26;


0.73b0.85;


0<c0.04; and


a+b+c1

(wherein a, b, and c each represent an atomic proportion). The single-component coating layer has both a hexagonal phase and a cubic phase.

DECORATIVE ARTICLE AND TIMEPIECE
20200081402 · 2020-03-12 ·

An external part of a timepiece has a substrate that includes a base layer and a surface layer, the surface layer including Ti or stainless steel; and a coating disposed on the substrate. The coating includes an outermost layer formed primarily of TiC defining an external surface, and an interior layer formed primarily of TiC positioned between the substrate and the outermost layer. An elastic modulus of the interior layer is greater than the elasticmodulus of the outermost layer.

DIRECT LIQUID INJECTION SYSTEM FOR THIN FILM DEPOSITION

A method and apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The DLI system includes a liquid precursor source vaporization system, which vaporizes liquid stably and efficiently. In one implementation, the DLI system is a closed loop integrated system which combines, an injection valve (IV) along with a Liquid Flow Meter (LFM), an ampoule assembly as a source of pressurized precursor, an inert push gas to pressurize the precursor in the ampoule assembly, a temperature controller to maintain a targeted temperature regime, leak detection and controlled carrier gas flow to gas heater.