The preparation method for a nano composite coating having a shell-simulated multi-arch structure includes: constructing a discontinuous metal seed layer using a vacuum plating technology; and inducing the deposition of a continuous multi-arch structure layer utilizing the discontinuous metal seed layer, thereby realizing the controllable orientated growth of the nano composite coating having the shell-simulated multi-arch structure. The nano composite coating having the shell-simulated multi-arch structure is of a red abalone shell-simulated nacreous layer aragonite structure, meanwhile has high hardness and high temperature resistance, has excellent performances such as high breaking strength, low friction coefficient and corrosion and abrasion resistance in seawater under the condition of maintaining good breaking tenacity, is simple and controllable in preparation process and low in cost, has unlimited workpiece shapes, is easily produced on large scale, and has huge potential in the fields of new energy, efficiency power, ocean engineering, nuclear energy, and micro-electronic/optoelectronic devices.

Systems and techniques for depositing organic material on a substrate are provided, in which one or more shield gas flows prevents contamination of the substrate by the chamber ambient. Thus, multiple layers of the same or different materials may be deposited in a single deposition chamber, without the need for movement between different deposition chambers, and with reduced chance of cross-contamination between layers.

A mask assembly includes a first mask area including first opening areas, and a second mask area including second opening areas having centers located at vertices of virtual squares in a row direction and a column direction, half-etching areas having centers located at centers of the virtual squares, and a non-etching area surrounding the second opening areas and the half-etching areas. Each of the second opening areas includes a base portion and at least one protrusion portion protruding from the base portion.

A deposition mask according to the present invention includes a first substrate that is a single-crystal substrate, wherein a first region that is at least a portion of the first substrate, includes a plurality of rectangular areas each of which has one or a plurality of openings, a substrate thickness in the rectangular area is smaller than a substrate thickness in an area that is a part of the first region and is not the rectangular area, and an angle θ1 between a side of the rectangular area and a cleavage direction of the first substrate is in a range of 0°<θ1<90°.

A method of manufacturing a mask, includes forming an organic material layer on a mask substrate and patterning a hard mask on the organic material layer, etching the organic material layer to form a mask sheet including through holes, removing the hard mask on the mask sheet, forming a conductive material layer on the mask sheet, and etching the conductive material layer to form a conductive layer.

A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.

A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.

A system for performing substrateless and/or local donor Laser Induced Forward Transfer (LIFT), comprising a reservoir comprising at least one opening and an energy source configured to deliver energy to a donor material within said reservoir, characterized by at least one of: said reservoir is embedded into a medical device; said reservoir is in fluid connection with a medical device; said reservoir is incorporated into a medical device; said reservoir contains at least one biologically active substance; and, said reservoir is in fluid connection with at least one source of at least one biologically active substance. This system enables deposition of material by LIFT without any need for a donor substrate. Methods of substrateless and local donor LIFT, in particular for medical and biological applications, are also disclosed.

A metal sheet has a longitudinal direction and a width direction. The metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another. Each of the shapes is an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet. A length in the width direction of a surface of the metal sheet is a surface distance. A minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance. A ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction. A maximum value of elongation difference ratios is less than or equal to 2×10.sup.−5.

A vapor deposition mask includes a mask main body and a support joined to the mask main body. The mask main body has a first alignment mark whereas the support has a second alignment mark. The first alignment mark and the second alignment are provided at such positions as to overlap with each other in plan view, and either one of the alignment marks is larger than the other of the alignment marks.