Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of the substrate is removed to define a substrate opening through a periphery portion of the substrate. The mask layer with the mask openings through the mask layer extending across the substrate opening.

A display processing mask manufacturing apparatus includes a stage, a clamp arranged outside the stage, and a chuck configured to move in a direction and arranged above the stage. The clamp includes a first clamp and a second clamp spaced apart from the first clamp in a first direction and arranged at a position opposite to a position of the first clamp with respect to the stage, and the chuck includes a first chuck and a second chuck spaced apart from the first chuck in a second direction crossing the first direction.

A mask assembly, an apparatus for manufacturing a display device, and a method of manufacturing a display device are provided. A mask assembly includes: a mask frame including a frame body portion and dividers, the frame body portion being arranged at an outside of the mask frame, and the dividers dividing an inside of the frame body portion into a plurality of openings, each of the dividers being connected in a first direction and a second direction; and a plurality of mask sheets arranged on a top surface of the mask frame, coupled to the mask frame, and including at least one pattern opening, mask sheets of the plurality of mask sheets being apart from each other in the first direction.

A film-forming apparatus comprises: a processing chamber defining a processing space, a first sputter-particle emitter and a second sputter-particle emitter having targets, respectively, from which sputter-particles are emitted in different oblique directions in the processing space, a sputter-particle blocking plate having a passage hole through which the sputter particles emitted from the first sputter-particle emitter and the second sputter-particle emitter pass, a substrate support configured to support a substrate and provided at a side opposite the first sputter-particle emitter and the second sputter-particle emitter with respect to the sputter-particle blocking plate in the processing space, a substrate moving mechanism configured to linearly move the substrate supported on the substrate support, and a controller configured to control the emission of sputter-particles from the first sputter-particle emitter and the second sputter-particle emitter while controlling the substrate moving mechanism to move the substrate linearly.

An alpha-alumina coated turbocharger turbine wheel includes a hub portion, a plurality of blades disposed about the hub portion, each blade of the plurality of blades having a leading edge and a trailing edge, a centerline passing axially through the hub portion, and a back-side wall defined radially between the leading edge of each blade of the plurality of blades and the centerline. The turbocharger turbine wheel is made of a metal alloy and a surface coating layer of alpha-alumina. The surface coating layer of alpha-alumina may be disposed only on the hub portion, the plurality of blades, and a radially-outer portion of the back-side wall. The radially-outer portion is defined between a radial distance from the centerline and the leading edge of each blade of the plurality of blades. Alternatively, the surface coating layer of alpha-alumina may be disposed on the hub portion, the plurality of blades, and an entirety of the back-side wall.

A display panel, a mask plate, and a manufacturing method of the display panel are provided. The display area includes an installation area and a non-installation area. The installation area is configured to install a preset component. The display panel further includes a pixel layer. The pixel layer includes a plurality of first sub-pixels disposed in the non-installation area and a plurality of second sub-pixels disposed in the installation area. Each of the plurality of first sub-pixels includes a first cathode, and each of the plurality of second sub-pixels includes a second cathode, wherein a thickness of the second cathode is less than a thickness of the first cathode.

A method for repairing a mask plate. The mask plate includes a frame having an opening, a plurality of first shielding strips and a plurality of mask strips. The method includes: identifying a mask strip deformation area, identifying the area of the mask plate having a mask strip that expands outward and deforms along the second direction as the mask strip deformation area; replacing a shielding strip, performing a net tensioning process for the second shielding strip, replacing at least part of the first shielding strips in the mask strip deformation area with a second shielding strip and connecting the second shielding strip to the upper side frame and the lower side frame, so that the mask strip that expands outward and deforms is retracted inward along the second direction.

A mask assembly includes a mask frame in which a first opening is defined, the mask frame including a front surface through which the first opening extends, and a deposition mask which is attached to the front surface of the mask frame and through which a plurality of second openings is defined. The mask frame includes an in which the front surface extends along a direction of gravity, the deposition mask includes an initial mask which is attached to the front surface of the mask frame in the thereof and through which the plurality of second openings is defined, and the of the mask frame having the front surface which extends along the direction of gravity disposes the first opening of the mask frame corresponding to all of the plurality of second openings of the initial mask along the direction of gravity.

Apparatus for depositing germanium and carbon onto one or more substrates comprises a vacuum chamber, at least first and second magnetron sputtering devices and at least one movable mount for supporting the one or more substrates within the vacuum chamber. The first magnetron sputtering device is configured to sputter germanium towards the at least one mount from a first sputtering target comprising germanium, thereby defining a germanium sputtering zone within the vacuum chamber. The second magnetron sputtering device is configured to sputter carbon towards the at least one mount from a second sputtering target comprising carbon, thereby defining a carbon sputtering zone within the vacuum chamber. The at least one mount and the at least first and second magnetron sputtering devices are arranged such that, when each substrate is moved through the germanium sputtering zone on the at least one movable mount, germanium is deposited on the said substrate, and when each substrate is moved through the carbon sputtering zone on the at least one movable mount, carbon is deposited on the said substrate.

A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.