A coated cutting tool includes a substrate of cemented carbide, cubic boron nitride (cBN) or cermet containing tungsten carbide hard grains and a tungsten carbide (WC) layer deposited immediately on top of the substrate surface. The tungsten carbide (WC) layer is a mixture or combination of hexagonal tungsten mono-carbide α-WC phase and cubic tungsten mono-carbide β-WC phase and unavoidable impurities.

A surface coated cutting tool comprises: a tool substrate and a coating layer on a surface of the tool substrate; wherein the coating layer comprises a lower layer, an intermediate layer, and an upper layer, in sequence from the tool substrate toward the surface of the tool. The lower layer comprises an A layer having an average composition represented by formula: (Al.sub.1-xCr.sub.x)N, where x is 0.20 to 0.60; the intermediate layer comprises a B layer having an average composition represented by formula: (Al.sub.1-a-bCr.sub.aSi.sub.b)N, where a is 0.20 to 0.60 and b is 0.01 to 0.20; and the upper layer comprises a C layer having an average composition represented by formula: (Ti.sub.1-α-βSi.sub.αW.sub.β)N where α is 0.01 to 0.20 and β is 0.01 to 0.10; and the upper layer has a repeated variation in W level with an average interval of 1 nm to 100 nm between adjacent local maxima and minima.

Provided is a cutting tool comprising a base body and a hard carbon film arranged on the base body, in which, when the cross section of the hard carbon film is observed using a high angle annular dark field scanning transmission electron microscope, the area proportion of black regions with an equivalent circle diameter of 10 nm or more is 0.7% or less, and the hard carbon film has a hydrogen content of 5 atom% or less.

The present invention relates to an antimicrobial plastic film and a winding coating method, the antimicrobial plastic film includes a plastic film main part, wherein a surface of said plastic film main part is coated with an antimicrobial coating, the antimicrobial coating includes a bonding layer, a carrier layer, a first antimicrobial layer and a second antimicrobial layer, the winding coating method includes the steps of vacuum treatment , applying a bonding layer, applying a carrier layer, applying a first antimicrobial layer, and applying a second antimicrobial layer

A method for introducing a soft metal into a hard coating during a physical vapor deposition process. The method including steps of providing a substrate; depositing a bonding layer on the substrate; and depositing the hard coating on the bonding layer using vapor deposition wherein the soft metal forms islands in the hard coating.

The present invention relates to a method for obtaining a photovoltaic CZTS thin-film solar cell including arranging a precursor solution, preparing a substrate, and depositing said precursor solution on said substrate.

A component for a plasma processing apparatus includes a substrate and a film on at least a part of the substrate. The film includes an oxide, a fluoride, an oxyfluoride, or a nitride of a rare earth element. A ratio σ22/σ11 of a compressive stress σ11 to occur across a surface of the film to be exposed to plasma and a compressive stress σ22 to occur across the surface in a direction perpendicular to the compressive stress σ11 is 5 or less. A plasma processing apparatus includes the above component.

The present invention relates to coated sliding parts having coating systems which allow better sliding performance under dry and/or under lubricated conditions. The coating systems according to the present invention being characterized by having an outermost layer which—is a smooth oxide-containing layer in case of sliding applications under lubricated conditions, or—is a self-lubricated layer comprising molybdenum nitride, in case of sliding applications under dry or lubricated conditions, is a self lubricated layer with a structured surface comprising a multitude of essentially circular recesses with diameters of several micrometers or below, the recesses randomly distributed over the surface.

Method for producing a photochromic material and a component including the photochromic material, where the method comprises the steps of:-first the formation on a substrate of a layer of an essentially oxygen free metal hydride with a predetermined thickness using a physical vapor deposition process; and -second exposing the metal hydride layer to oxygen where the oxygen reacts with the metal hydride, resulting in a material with photochromic properties.

Method for producing a photochromic material and a component including the photochromic material, where the method comprises the steps of:-first the formation on a substrate of a layer of an essentially oxygen free metal hydride with a predetermined thickness using a physical vapor deposition process; and -second exposing the metal hydride layer to oxygen where the oxygen reacts with the metal hydride, resulting in a material with photochromic properties.