A film forming system comprises a chamber, a stage, a holder, a cathode magnet, a shield, a first moving mechanism, and a second moving mechanism. The chamber provides a processing space. The stage is provided in the processing space and configured to support a substrate. The holder is configured to hold a target that is provided in the processing space. The cathode magnet is provided outside the chamber with respect to the target. The shield has a slit and is configured to block particles released from the target around the slit. The first moving mechanism is configured to move the shield between the stage and the target along a scanning direction substantially parallel to a surface of the substrate mounted on the stage. The second moving mechanism is configured to move the cathode magnet along the scanning direction.

A method to transfer a layer of harder thin film substrate onto a softer, flexible substrate. In particular, the present invention provides a method to deposit a layer of sapphire thin film on to a softer and flexible substrate e.g. quartz, fused silica, silicon, glass, toughened glass, PET, polymers, plastics, paper and fabrics. This combination provides the hardness of sapphire thin film to softer flexible substrates.

An attachment system and method for optical parts for applying treatments and deposits on at least one surface of said parts without sparse zones on said surface. The system includes an optical part holder in the form of a flange provided with two branches connected at respective first branch ends thereof by a spring link and provided at respective second branch ends thereof with facing tabs and means for bringing said tabs together suited for tightening the branches on an edge of said parts. The method includes a step of positioning an optical part holder in the form of a flange on the edge of said optical part, where a front surface of said flange is positioned recessed from the surface to be treated or flush with the surface to be treated and a step of tightening the flange on the edge of said optical part.

The invention relates to a method for the production of materials. In particular the invention relates to nanostructured materials, and an apparatus and method for the production thereof. In accordance with the invention, nanostructured materials are produced by the subsequent steps of producing nanoparticles; transporting the nanoparticles into, and optionally through, a porous carrier by a gas flow; and depositing the nanoparticles onto the surface of said porous carrier in an essentially isotropic manner.

Embodiments of the disclosure generally relate to methods of forming gratings. The method includes depositing a resist material on a grating material disposed over a substrate, patterning the resist material into a resist layer, projecting a first ion beam to the first device area to form a first plurality of gratings, and projecting a second ion beam to the second device area to form a second plurality of gratings. Using a patterned resist layer allows for projecting an ion beam over a large area, which is often easier than focusing the ion beam in a specific area.

Solid films and articles having a surface with discrete regions patterned with a deposited low molecular weight organic compound, such as pharmaceutical actives and new chemical entities, are provided. The organic compound may be present at ≥ about 99 mass % in the one or more discrete regions and may be crystalline or amorphous. The deposited organic compound may be deposited as a film having high surface area. The deposited organic compound exhibits enhanced solubility and bioavailability, by way of non-limiting example. Methods of organic vapor jet printing deposition method of such a low molecular weight organic compound in an inert gas stream are also provided.

Disclosed is a thermal barrier coating system for components of a turbomachine, especially for high temperature-stressed or hot gas-stressed components of a turbomachine, comprising a ceramic coating of fully or partially stabilized zirconium oxide, and an oxide cover coating which comprises aluminum and at least one element from the group lanthanum, magnesium, silicon, calcium and sodium. The aluminum oxide exists at least partially as free α-Al.sub.2O.sub.3. Also disclosed is a method for producing a corresponding thermal barrier coating system.

A virtual adhesion method is provided. The virtual adhesion method includes increasing a magnetic characteristic of an initial structure, supporting the initial structure on a surface of a substrate, generating a magnetic field directed such that the initial structure is forced toward the surface of the substrate and forming an encapsulation, which is bound to exposed portions of the surface, around the initial structure.

A high-temperature component of a refractory metal or a refractory metal alloy has an emissivity-increasing coating. The coating is formed of tantalum nitride and/or zirconium nitride; and tungsten with a tungsten content between 0 and 98 wt. %.

A high-temperature component of a refractory metal or a refractory metal alloy has an emissivity-increasing coating. The coating is formed of tantalum nitride and/or zirconium nitride; and tungsten with a tungsten content between 0 and 98 wt. %.