Patent classifications
C23C14/58
ELECTROCHROMIC DEVICES
Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In various embodiments, a counter electrode is fabricated to include a base anodically coloring material and one or more additives.
High Rate Sputter Deposition of Alkali Metal-Containing Precursor Films Useful to Fabricate Chalcogenide Semiconductors
The present invention provides methods to sputter deposit films comprising alkali metal compounds. At least one target comprising one or more alkali metal compounds and at least one metallic component is sputtered to form one or more corresponding sputtered films. The at least one target has an atomic ratio of the alkali metal compound to the at least one metallic component in the range from 15:85 to 85:15. The sputtered film(s) incorporating such alkali metal compounds are incorporated into a precursor structure also comprising one or more chalcogenide precursor films. The precursor structure is heated in the presence of at least one chalcogen to form a chalcogenide semiconductor. The resultant chalcogenide semiconductor comprises up to 2 atomic percent of alkali metal content, wherein at least a major portion of the alkali metal content of the resultant chalcogenide semiconductor is derived from the sputtered film(s) incorporating the alkali metal compound(s). The chalcogenide semiconductors are useful in microelectronic devices, including solar cells.
CANTILEVER SENSORS FOR MOLECULE DETECTION
The invention relates to a process for preparation of an unpassivated cantilever comprising the steps of: 1) providing a silicon cantilever sensor having two sides; 2) coating one side of the cantilever with at least a gold layer; and 3) functionalizing both sides of the cantilever with a self-assembled monolayer (SAM) of a probe molecule by incubating the cantilever in a solution having a concentration of the probe molecule of between 1 to 1000 μM.
The invention also relates to an unpassivated cantilever sensor comprising a silicon layer coated on one side with a coating comprising Au and being uncoated or unpassivated on the opposite side, wherein the Au coated surface comprises a self-assembled monolayer of a probe molecule and wherein the surface area occupied per probe molecule is in the range 0.4-1.5 nm.sup.2.
CANTILEVER SENSORS FOR MOLECULE DETECTION
The invention relates to a process for preparation of an unpassivated cantilever comprising the steps of: 1) providing a silicon cantilever sensor having two sides; 2) coating one side of the cantilever with at least a gold layer; and 3) functionalizing both sides of the cantilever with a self-assembled monolayer (SAM) of a probe molecule by incubating the cantilever in a solution having a concentration of the probe molecule of between 1 to 1000 μM.
The invention also relates to an unpassivated cantilever sensor comprising a silicon layer coated on one side with a coating comprising Au and being uncoated or unpassivated on the opposite side, wherein the Au coated surface comprises a self-assembled monolayer of a probe molecule and wherein the surface area occupied per probe molecule is in the range 0.4-1.5 nm.sup.2.
COUNTER ELECTRODE FOR ELECTROCHROMIC DEVICES
The embodiments herein relate to electrochromic stacks, electrochromic devices, and methods and apparatus for making such stacks and devices. In various embodiments, an anodically coloring layer in an electrochromic stack or device is fabricated to include nickel tungsten tantalum oxide (NiWTaO). This material is particularly beneficial in that it is very transparent in its clear state.
COUNTER ELECTRODE MATERIAL FOR ELECTROCHROMIC DEVICES
Various embodiments herein relate to electrochromic devices, methods of fabricating electrochromic devices, and apparatus for fabricating electrochromic devices. In a number of cases, the electrochromic device may be fabricated to include a particular counter electrode material. The counter electrode material may include a base anodically coloring material. The counter electrode material may further include one or more halogens. The counter electrode material may also include one or more additives.
COUNTER ELECTRODE MATERIAL FOR ELECTROCHROMIC DEVICES
Various embodiments herein relate to electrochromic devices, methods of fabricating electrochromic devices, and apparatus for fabricating electrochromic devices. In a number of cases, the electrochromic device may be fabricated to include a particular counter electrode material. The counter electrode material may include a base anodically coloring material. The counter electrode material may further include one or more halogens. The counter electrode material may also include one or more additives.
Ion implantation for superconductor tape fabrication
A method of forming a superconductor tape, includes depositing a superconductor layer on a substrate, forming a metal layer comprising a first metal on a surface of the superconductor layer, and implanting an alloy species into the metal layer where the first metal forms a metal alloy after the implanting the alloy species.
Method for manufacturing a decorative surface
A layer of lanthanum boride of stoichiometry LaB.sub.x where x is between 9 and 12 is deposited on substrate, for example a stainless steel watch dial, and subsequently treated with a laser, such that the portion(s) of the layer treated with the laser change colour according to the laser power. This produces multicoloured surfaces having high resistance to corrosion and abrasion. The layer of LaB.sub.x is deposited by PVD and by cathode sputtering, using a LaB.sub.6 target of purple-violet colour, such that the colour of the deposited layer differs from the colour of the target. The laser treatment at specific powers changes the stoichiometry of the layer in the treatment portions, such that the colour of these portions changes according to the stoichiometry obtained. At higher powers, the laser will remove the layer of LaB.sub.x. Thus the colour of the treated portions is determined by the material of the substrate.
TRANSPARENT AND HIGHLY STABLE SCREEN PROTECTOR
The invention relates to a method for producing at least one solid layer and comprises at least the steps of: providing a carrier substrate (4) having a sacrificial layer (8) arranged thereon or arranging a sacrificial layer (8) on the provided carrier substrate (4), producing a useful layer (6) by way of chemical or physical gas phase deposition on the sacrificial layer (8) to form a multi-layer arrangement (2), removing the useful layer (6) as a result of a material weakening produced between the useful layer (6) and the carrier substrate (4), said material weakening being brought about by modifications (12) to the sacrificial layer (8) which were produced means of laser beams (10).