Aspects of the disclosure include systems and methods for removing a sample from a carrier material and depositing the sample onto a substrate. The sample can be placed in an aperture of a substrate guide on a stage within a cavity. Etching fluid can be introduced into the cavity to etch the carrier material from the sample and then drained. A rinsing material can be introduced into the cavity to rinse the etching fluid and then drained. A sample deposition process can be performed wherein rinsing fluid is introduced into the cavity to raise the sample guide and sample above the level of a substrate on a substrate holder. The substrate holder can be positioned relative to the sample guide so that the sample within the aperture aligns with the substrate on the substrate holder. The rinsing fluid is drained so that the sample is lowered onto the substrate.

A calibration system adapted to calibrate a resistance of an electrical device having a lead wire comprises a resistance detector adapted to detect the resistance of the electrical device, a first container containing an etching solution adapted to etch the lead wire, and a heater configured to heat the electrical device. If a first resistance of the electrical device detected by the resistance detector at a first temperature is within a first predetermined range, the electrical device is heated with the heater to a second temperature higher than the first temperature. A second resistance of the electrical device is detected by the resistance detector at the second temperature. If the second resistance is beyond a second predetermined range, the lead wire is etched by the etching solution to adjust the resistance of the electrical device until the second resistance at the second temperature is within the second predetermined range.

A method for the production of a metal strip is provided. The method includes providing an amorphous metal strip having a first main surface and a second, opposing main surface. The first and/or the second main surface are treated with a wet-chemical etching process and/or a photochemical etching process.

Provided herein are nanoparticle compositions comprising an organophosphate compound and pharmaceutically acceptable carriers.

This disclosure provides systems, methods, and apparatus related to graphene. In one aspect, a method includes submerging a frame support in an etching solution that is contained in a container. A growth substrate, a graphene sheet disposed on the growth substrate, and a primary support disposed on the graphene sheet is placed on a surface of the etching solution. The growth substrate is dissolved in the etching solution to leave the graphene sheet and the primary support floating on a surface of the etching solution. The etching solution in the container is replaced with a washing solution. The washing solution is removed from the container so that the graphene sheet becomes disposed on the frame support.

This disclosure provides systems, methods, and apparatus related to graphene. In one aspect, a method includes submerging a frame support in an etching solution that is contained in a container. A growth substrate, a graphene sheet disposed on the growth substrate, and a primary support disposed on the graphene sheet is placed on a surface of the etching solution. The growth substrate is dissolved in the etching solution to leave the graphene sheet and the primary support floating on a surface of the etching solution. The etching solution in the container is replaced with a washing solution. The washing solution is removed from the container so that the graphene sheet becomes disposed on the frame support.

A substrate support includes a disk having a disk shape to support at least one substrate, at least one pocket groove which is formed to be concave from an upper surface of the disk in a shape corresponding to the substrate such that at least an edge portion of the substrate is seated therein, a free space forming portion which is spaced inwardly at a predetermined distance from an edge of the pocket groove and formed to be concave from at least a part of a bottom surface of the pocket groove so as to define a stepped portion that supports at least the edge portion of the substrate and forms a free space below the substrate when the substrate is seated on the stepped portion, and an exhaust passage which connects an outer circumferential surface of the disk to at least a part of the free space forming portion.

A substrate support includes a disk having a disk shape to support at least one substrate, at least one pocket groove which is formed to be concave from an upper surface of the disk in a shape corresponding to the substrate such that at least an edge portion of the substrate is seated therein, a free space forming portion which is spaced inwardly at a predetermined distance from an edge of the pocket groove and formed to be concave from at least a part of a bottom surface of the pocket groove so as to define a stepped portion that supports at least the edge portion of the substrate and forms a free space below the substrate when the substrate is seated on the stepped portion, and an exhaust passage which connects an outer circumferential surface of the disk to at least a part of the free space forming portion.

The present invention generally relates to a process for transferring a graphitic thin film and a kit for the same.

The present invention generally relates to a process for transferring a graphitic thin film and a kit for the same.