C23F1/46

Method and device for regeneration of hydrochloric acid
10494259 · 2019-12-03 · ·

The subject matter of the present invention is a method to extract or recover hydrochloric acid from hydrochloric acid solutions containing metal by means of pyrohydrolytic treatment, followed by absorption and/or condensation of the gaseous hydrogen chloride thus formed in order to form hydrochloric acid. According to the invention, a first partial flow of the hydrochloric acid solution containing metal undergoes pyrohydrolytic treatment and a second partial flow of the metal-containing solution is fed to the absorption column. A device for implementing the process according to the invention is also the subject of the present invention.

Method for electrolytic recycling and regenerating acidic cupric chloride etchants
10443138 · 2019-10-15 ·

A method for electrolytic recycling and regenerating acidic cupric chloride etchants, comprising: (1) employing an acidic cupric chloride etchant that contains iron ions in PCB etching, controlling the oxidation-reduction potential (ORP) of said acidic cupric chloride etchant within the range of 360-700 mV; (2) transferring an etchant waste of step (1) to an electrolysis tank and electrolyzing said etchant waste; (3) the chlorine gas generated by electrolysis oxidizes the electrolyte in the electrolysis tank and thereby dissolved into the electrolyte, in the effect of the ORP of the electrolyte; (4) regenerating an etchant by oxidizing Fe(II) ions and Cu(I) ions in the electrolyte to Fe(III) ions and Cu(II) ions using the chlorine gas of step (3) that is dissolved into the electrolyte, and when the chlorine gas is fully dissolved into the electrolyte, the oxidizing step of the electrolyte is finished and an etchant is regenerated; (5) transferring the etchant regenerated in step (4) to an etching production line.

Method for electrolytic recycling and regenerating acidic cupric chloride etchants
10443138 · 2019-10-15 ·

A method for electrolytic recycling and regenerating acidic cupric chloride etchants, comprising: (1) employing an acidic cupric chloride etchant that contains iron ions in PCB etching, controlling the oxidation-reduction potential (ORP) of said acidic cupric chloride etchant within the range of 360-700 mV; (2) transferring an etchant waste of step (1) to an electrolysis tank and electrolyzing said etchant waste; (3) the chlorine gas generated by electrolysis oxidizes the electrolyte in the electrolysis tank and thereby dissolved into the electrolyte, in the effect of the ORP of the electrolyte; (4) regenerating an etchant by oxidizing Fe(II) ions and Cu(I) ions in the electrolyte to Fe(III) ions and Cu(II) ions using the chlorine gas of step (3) that is dissolved into the electrolyte, and when the chlorine gas is fully dissolved into the electrolyte, the oxidizing step of the electrolyte is finished and an etchant is regenerated; (5) transferring the etchant regenerated in step (4) to an etching production line.

TIN STRIPPING METHOD
20190203319 · 2019-07-04 · ·

The present invention provides an additive for tin stripping, comprising 0.1 to 20 wt % of copper corrosion inhibitor and 0.1 to 20 wt % of nickel corrosion inhibitor; wherein said weight percentage is based on the total weight of said additive. The present additive can be used with nitric acid conventionally used for metal-stripping for not only reducing the usage of nitric acid but also improving the efficiency of tin stripping. The present invention also provides a method for Tin recycle and a reaction tank for metal recycle. Both of them are favorable for satisfying the needs of metal recycle (especially, tin recycle) in the field.

TIN STRIPPING METHOD
20190203319 · 2019-07-04 · ·

The present invention provides an additive for tin stripping, comprising 0.1 to 20 wt % of copper corrosion inhibitor and 0.1 to 20 wt % of nickel corrosion inhibitor; wherein said weight percentage is based on the total weight of said additive. The present additive can be used with nitric acid conventionally used for metal-stripping for not only reducing the usage of nitric acid but also improving the efficiency of tin stripping. The present invention also provides a method for Tin recycle and a reaction tank for metal recycle. Both of them are favorable for satisfying the needs of metal recycle (especially, tin recycle) in the field.

BOWL, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING
20240209514 · 2024-06-27 ·

A bowl includes a body portion having a recovery hole to which a recovery line is connected, a guide portion extending upwardly from an upper portion of the body portion and then extending in a lateral direction, and a connection frame installed across the inside of the body portion and the inside of the guide portion.

BOWL, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING
20240209514 · 2024-06-27 ·

A bowl includes a body portion having a recovery hole to which a recovery line is connected, a guide portion extending upwardly from an upper portion of the body portion and then extending in a lateral direction, and a connection frame installed across the inside of the body portion and the inside of the guide portion.

Methods, Systems And Apparatuses For Copper Removal From Aluminum Desmutting Solutions

Methods, systems and apparatuses for treating operating aluminum desmutting solutions by reacting, mixing and filtering a partial desmutting solution flow are disclosed.

Methods, Systems And Apparatuses For Copper Removal From Aluminum Desmutting Solutions

Methods, systems and apparatuses for treating operating aluminum desmutting solutions by reacting, mixing and filtering a partial desmutting solution flow are disclosed.

ETCHANT COMPOSITION FOR MULTILAYERED METAL FILM OF COPPER AND MOLYBDENUM, METHOD OF ETCHING USING SAID COMPOSITION, AND METHOD FOR PROLONGING LIFE OF SAID COMPOSITION

Provided is an etchant composition for a multilayered metal film comprising both a layer comprising copper and a layer comprising molybdenum, the etchant composition: being capable of etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component; being effective in preventing the molybdenum layer from being undercut; making it easy to regulate the component concentrations so as to accommodate the cross-sectional shape control and cross-section; and being stable. Also provided are a method of etching using the etchant composition and a method for prolonging the life of the etchant composition. The etchant composition according to the present invention is an etchant composition for use in etching en bloc a multilayered metal film comprising a layer constituted of copper or an alloy including copper as the main component and a layer constituted of molybdenum or an alloy including molybdenum as the main component, and comprises hydrogen peroxide, an organic acid, an amine compound, an azole, and a hydrogen peroxide stabilizer (no inorganic acid is contained therein).