C25D1/003

APPARATUS FOR MULTI-SCALE DIRECTED ENERGY DEPOSITION WITH INTEGRAL NON-ABRASIVE REDUCTION OF WAVINESS
20220250159 · 2022-08-11 ·

Aspects are provided for additively manufacturing a component with reduced surface roughness based on direct energy deposition (DED). A DED apparatus for additively manufacturing a component includes a material supply, one or more deposition heads coupled to the material supply to deposit feedstock from the material supply, and an energy source configured to heat the feedstock as the feedstock is being deposited by the one or more deposition heads. The energy source is configured to reheat one or more portions of a surface of the component to reduce surface roughness as the component is being additively manufactured. The one or more deposition heads may also comprise a plurality of deposition heads which are sized to deposit the feedstock from the material supply at different resolutions to form a surface of the component with reduced surface roughness as the component is being additively manufactured. Thus, structural integrity may be improved.

REACTOR FOR LAYER DEPOSITION BY CONTROLLABLE ANODE ARRAY

An apparatus and method for electrochemically depositing a layer using a reactor configured to contain an electrolyte solution with an anode array containing a plurality of independently electrically controllable anodes arranged in a two-dimensional array, a cathode, an addressing circuit for receiving a signal containing anode address data, and for outputting a signal causing an anode array pattern; in communication with the addressing circuit, the current controller and the anode array, the second controller operable to communicate with the current controller to command the flow of current to each anode in the anode array thereby causing an electrochemical reaction at the cathode to deposit a layer corresponding to the anode array pattern signal received from the addressing circuit.

METHODS OF FORMING HIGH-TEMPERATURE ELECTROFORMED COMPONENTS AND RELATED COMPONENTS

An electroformed composite component includes reinforcing particles in a metal matrix. The composite component is formed by a method including passing an electric current between an anode and a cathode in the presence of an electrolyte. The electrolyte includes a metal salt and a plurality of reinforcing particle precursors. The method further includes depositing a composite layer on the cathode, wherein the composite layer includes the metal matrix and the plurality of reinforcing particle precursors dispersed in the metal matrix. An optional heat treatment can be performed subsequently to transform the precursor particles to more stable forms with concomitant improvement in composite material properties.

MATRIX-CONTROLLED PRINTHEAD FOR OF AN ELECTROCHEMICAL ADDITIVE MANUFACTURING SYSTEM

Process for manufacturing a printhead for a 3D manufacturing system that uses metal electrodeposition to construct parts. The printhead may be constructed by depositing layers on top of a backplane that contains control and power circuits. Deposited layers may include insulating layers and an anode layer that contain deposition anodes that are in contact with the electrolyte to drive electrodeposition. Insulating layers may for example be constructed of silicon nitride or silicon dioxide; the anode layer may contain an insoluble conductive material such as platinum group metals and their associated oxides, highly doped semiconducting materials, and carbon based conductors. The anode layer may be deposited using chemical vapor deposition or physical vapor deposition. Alternatively in one or more embodiments the printhead may be constructed by manufacturing a separate anode plane component, and then bonding the anode plane to the backplane.

MATRIX-CONTROLLED PRINTHEAD FOR OF AN ELECTROCHEMICAL ADDITIVE MANUFACTURING SYSTEM

Process for manufacturing a printhead for a 3D manufacturing system that uses metal electrodeposition to construct parts. The printhead may be constructed by depositing layers on top of a backplane that contains control and power circuits. Deposited layers may include insulating layers and an anode layer that contain deposition anodes that are in contact with the electrolyte to drive electrodeposition. Insulating layers may for example be constructed of silicon nitride or silicon dioxide; the anode layer may contain an insoluble conductive material such as platinum group metals and their associated oxides, highly doped semiconducting materials, and carbon based conductors. The anode layer may be deposited using chemical vapor deposition or physical vapor deposition. Alternatively in one or more embodiments the printhead may be constructed by manufacturing a separate anode plane component, and then bonding the anode plane to the backplane.

ELECTROCHEMICAL ADDITIVE MANUFACTURING METHOD USING DEPOSITION FEEDBACK CONTROL

A system and method of using electrochemical additive manufacturing to add interconnection features, such as wafer bumps or pillars, or similar structures like heatsinks, to a plate such as a silicon wafer. The plate may be coupled to a cathode, and material for the features may be deposited onto the plate by transmitting current from an anode array through an electrolyte to the cathode. Position actuators and sensors may control the position and orientation of the plate and the anode array to place features in precise positions. Use of electrochemical additive manufacturing may enable construction of features that cannot be created using current photoresist-based methods. For example, pillars may be taller and more closely spaced, with heights of 200 μm or more, diameters of 10 μm or below, and inter-pillar spacing below 20 μm. Features may also extend horizontally instead of only vertically, enabling routing of interconnections to desired locations.

Matrix-controlled printhead grid control for an electrochemical additive manufacturing system

Process for manufacturing a printhead for a 3D manufacturing system that uses metal electrodeposition to construct parts. The printhead may be constructed by depositing layers on top of a backplane that contains control and power circuits. Deposited layers may include insulating layers and an anode layer that contain deposition anodes that are in contact with the electrolyte to drive electrodeposition. Insulating layers may for example be constructed of silicon nitride or silicon dioxide; the anode layer may contain an insoluble conductive material such as platinum group metals and their associated oxides, highly doped semiconducting materials, and carbon based conductors. The anode layer may be deposited using chemical vapor deposition or physical vapor deposition. Alternatively in one or more embodiments the printhead may be constructed by manufacturing a separate anode plane component, and then bonding the anode plane to the backplane.

TRANSFORMER HELIX WINDING PRODUCTION
20220084747 · 2022-03-17 ·

Methods and apparatus for producing helix windings used for a transformer are provided. For example, apparatus comprise an electrically conductive mandrill comprising an elongated body, a head comprising an eyelet detail, and a winding structure disposed along the elongated body.

ELECTROCHEMICAL DEPOSITION OF FUNCTIONALIZED HIGH ENTROPY ALLOYS
20220081794 · 2022-03-17 ·

A method of depositing a high entropy alloy onto an electrode surface is provided. The method includes providing a bath including a plurality of ions of a plurality of metals. The method further includes submerging, at least partially, an electrode including an electrode surface in the bath. The method further includes applying a voltage to the electrode to form a high entropy alloy on the electrode surface.

Electro-Formed Metal Foils
20220045260 · 2022-02-10 ·

A process for producing a cube textured foil is described. The process includes providing a cube textured metal foil M. The process further includes electroplating an epitaxial layer of an alloy on the foil M, whereby the epitaxial layer substantially replicates the cube texture of the metal foil M. The process further includes electroplating a non-epitaxial layer of an alloy on the epitaxial layer. The process further includes separating the electroplated alloy from the cube textured metal foil M to obtain an electro-formed alloy with one cube textured surface.