Patent classifications
C25D1/10
Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition
A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 m. The target surface has a surface roughness Sz of less than or equal to 0.308 m.
METAL MASK SUBSTRATE FOR VAPOR DEPOSITION, METAL MASK FOR VAPOR DEPOSITION, PRODUCTION METHOD FOR METAL MASK SUBSTRATE FOR VAPOR DEPOSITION, AND PRODUCTION METHOD FOR METAL MASK FOR VAPOR DEPOSITION
A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 m. The target surface has a surface roughness Sz of less than or equal to 0.308 m.
METAL MASK SUBSTRATE FOR VAPOR DEPOSITION, METAL MASK FOR VAPOR DEPOSITION, PRODUCTION METHOD FOR METAL MASK SUBSTRATE FOR VAPOR DEPOSITION, AND PRODUCTION METHOD FOR METAL MASK FOR VAPOR DEPOSITION
A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 m. The target surface has a surface roughness Sz of less than or equal to 0.308 m.
VAPOR DEPOSITION MASK SUBSTRATE, VAPOR DEPOSITION MASK SUBSTRATE MANUFACTURING METHOD, VAPOR DEPOSITION MASK MANUFACTURING METHOD, AND DISPLAY DEVICE MANUFACTURING METHOD
A metal sheet has a longitudinal direction and a width direction. The metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another. Each of the shapes is an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet. A length in the width direction of a surface of the metal sheet is a surface distance. A minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance. A ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction. A maximum value of elongation difference ratios is less than or equal to 210.sup.5.
VAPOR DEPOSITION MASK SUBSTRATE, VAPOR DEPOSITION MASK SUBSTRATE MANUFACTURING METHOD, VAPOR DEPOSITION MASK MANUFACTURING METHOD, AND DISPLAY DEVICE MANUFACTURING METHOD
A metal sheet has a longitudinal direction and a width direction. The metal sheet has shapes in the width direction that are taken at different positions in the longitudinal direction of the metal sheet and differ from one another. Each of the shapes is an undulated shape including protrusions and depressions repeating in the width direction of the metal sheet. A length in the width direction of a surface of the metal sheet is a surface distance. A minimum value of surface distances at different positions in the longitudinal direction of the metal sheet is a minimum surface distance. A ratio of a difference between a surface distance and the minimum surface distance to the minimum surface distance is an elongation difference ratio in the width direction. A maximum value of elongation difference ratios is less than or equal to 210.sup.5.
ROLL STAMP FOR IMPRINT DEVICE, AND MANUFACTURING METHOD THEREFOR
The present invention relates to a roll stamp and a method of manufacturing the same, the roll stamp including a cylindrical metal mold including a debossed pattern formed on an outer side and a hollow portion formed on an inner side, and a dummy roller inserted into the hollow portion. Because a joining portion is not formed on the entire area of the cylindrical metal mold, a problem in which edge regions are separated does not occur. Also, due to the absence of the joining portion, it is possible to perform a patterning process continuously.
ROLL STAMP FOR IMPRINT DEVICE, AND MANUFACTURING METHOD THEREFOR
The present invention relates to a roll stamp and a method of manufacturing the same, the roll stamp including a cylindrical metal mold including a debossed pattern formed on an outer side and a hollow portion formed on an inner side, and a dummy roller inserted into the hollow portion. Because a joining portion is not formed on the entire area of the cylindrical metal mold, a problem in which edge regions are separated does not occur. Also, due to the absence of the joining portion, it is possible to perform a patterning process continuously.
Method of producing transdermal absorption sheet
Provided is a method of producing a transdermal absorption sheet using an electroforming mold. A method of manufacturing an electroforming mold includes preparing a mold which is a matrix having a recessed pattern, immersing the mold in a degassed pretreatment liquid stored in a pretreatment liquid tank, then applying ultrasound waves generated from an ultrasound oscillator to the recessed pattern of the mold, and filling recessed portions constituting the recessed pattern with the pretreatment liquid. By immersing the mold in an electroforming tank and performing an electroforming treatment, an electroforming mold is manufactured. A mold having a recessed pattern is manufactured from the electroforming mold and a transdermal absorption sheet is produced using the mold.
Method of producing transdermal absorption sheet
Provided is a method of producing a transdermal absorption sheet using an electroforming mold. A method of manufacturing an electroforming mold includes preparing a mold which is a matrix having a recessed pattern, immersing the mold in a degassed pretreatment liquid stored in a pretreatment liquid tank, then applying ultrasound waves generated from an ultrasound oscillator to the recessed pattern of the mold, and filling recessed portions constituting the recessed pattern with the pretreatment liquid. By immersing the mold in an electroforming tank and performing an electroforming treatment, an electroforming mold is manufactured. A mold having a recessed pattern is manufactured from the electroforming mold and a transdermal absorption sheet is produced using the mold.
Mask for thin film deposition, method of manufacturing the same, and method of manufacturing a display apparatus using the same
A mask for thin film deposition of a display apparatus having both end portions coupleable to a frame in a state of tension in a lengthwise direction thereof, the mask including: a first portion having a first thickness and a plurality of pattern holes through which a deposition material may pass; a second portion comprising a welding portion having a second thickness configured to be coupled to a frame; and a third portion connecting the first portion and the third portion, wherein the first thickness is less than the second thickness, and the third portion includes an inclined surface connecting the first portion and the second portion.