Patent classifications
C25D1/10
ELECTROFORMING ASSEMBLIES FOR ELECTRICAL MACHINES
An electrical machine and method of forming includes electroforming a first set of metal laminates having a first predetermined geometry. The method also includes arranging an insulating layer between each in the first set of metal laminates in a stack to define a layered component having the first predetermined geometry.
ELECTROFORMING ASSEMBLIES FOR ELECTRICAL MACHINES
An electrical machine and method of forming includes electroforming a first set of metal laminates having a first predetermined geometry. The method also includes arranging an insulating layer between each in the first set of metal laminates in a stack to define a layered component having the first predetermined geometry.
MAKING NOZZLE STRUCTURES ON A STRUCTURED SURFACE
Methods of manufacturing fuel injector nozzle structures such as, e.g., nozzle plates, valve guides, combinations of nozzle plates and valve guides, etc., as well as other articles incorporating microstructured features. The methods may employ multiphoton processes to form microstructured patterns on a three-dimensional structured surface to provide nozzle structures and other articles that include finished microstructured features such as, e.g., through-holes extending from one or more cavities, where at least a portion of the three-dimensional structured surface is used to form the cavities. Forming a microstructured pattern on a three-dimensional structured surface can reduce the time needed to form nozzle structures that include microstructured features and other nozzle structure features (e.g., cavities) by avoiding the need to form the other nozzle structure features using the multiphoton processes.
Methods and Formulations for Durable Superhydrophic, Self-Cleaning, and Superhydrophobic Polymer Coatings and Objects Having Coatings Thereon
An object has a durable superhydrophic, self-cleaning, and icephobic coating includes a substrate and a layer disposed on the substrate, the layer resulting from coating with a formulation having an effective amount of hierarchical structuring micro/nanoparticles, liquid silane having one or more groups configured to graft to a hierarchical structuring micro/nanoparticle and at least another group that results in hydrophobicity. The hierarchical structuring micro/nanoparticles are dispersed in the liquid silane. Another effective amount of synthetic adhesive, selected from thermosetting binders, moisture curing adhesives or polymers that form a strong interaction with a surface, is in solution with a solvent. Upon curing, the layer has a contact angle greater than 90 and a sliding angle of less than 10 and, less than 5% of an area of the layer is removed in a Tape test.
Methods and Formulations for Durable Superhydrophic, Self-Cleaning, and Superhydrophobic Polymer Coatings and Objects Having Coatings Thereon
An object has a durable superhydrophic, self-cleaning, and icephobic coating includes a substrate and a layer disposed on the substrate, the layer resulting from coating with a formulation having an effective amount of hierarchical structuring micro/nanoparticles, liquid silane having one or more groups configured to graft to a hierarchical structuring micro/nanoparticle and at least another group that results in hydrophobicity. The hierarchical structuring micro/nanoparticles are dispersed in the liquid silane. Another effective amount of synthetic adhesive, selected from thermosetting binders, moisture curing adhesives or polymers that form a strong interaction with a surface, is in solution with a solvent. Upon curing, the layer has a contact angle greater than 90 and a sliding angle of less than 10 and, less than 5% of an area of the layer is removed in a Tape test.
MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF
A mask-support assembly and a producing method thereof are provided. The mask-support assembly, which is used in a process of forming organic light-emitting diode (OLED) pixels on a semiconductor wafer, includes: a support comprising an edge portion and a grid portion; and a mask connected onto the support and comprising a plurality of cell portions in each of which a mask pattern is formed.
MASK-SUPPORT ASSEMBLY AND PRODUCING METHOD THEREOF
A mask-support assembly and a producing method thereof are provided. The mask-support assembly, which is used in a process of forming organic light-emitting diode (OLED) pixels on a semiconductor wafer, includes: a support comprising an edge portion and a grid portion; and a mask connected onto the support and comprising a plurality of cell portions in each of which a mask pattern is formed.
Method of producing reinforced container
A container structure having one or more sections and a method for manufacturing such a structure is provided. Using an additive manufacturing process, a mold material is applied to produce a shaped substrate in the form of the desired sections and/or structure. Multiple reinforcement members are disposed within the substrate and extend between and are at least partially exposed at the inner and outer substrate surfaces. A coating material is applied to the inner and outer substrate surfaces and bonds to the exposed portions of the reinforcement members. The mold material is removed and replaced with another material among the reinforcement members between the substrate coatings.
Method of producing reinforced container
A container structure having one or more sections and a method for manufacturing such a structure is provided. Using an additive manufacturing process, a mold material is applied to produce a shaped substrate in the form of the desired sections and/or structure. Multiple reinforcement members are disposed within the substrate and extend between and are at least partially exposed at the inner and outer substrate surfaces. A coating material is applied to the inner and outer substrate surfaces and bonds to the exposed portions of the reinforcement members. The mold material is removed and replaced with another material among the reinforcement members between the substrate coatings.
Replication tools and related fabrication methods and apparatus
Durable seamless replication tools are disclosed for replication of seamless relief patterns in desired media, for example in optical recording or data storage media. Methods of making such durable replication tools are disclosed, including preparing a recording substrate on the inner surface of a support cylinder, recording and developing a relief pattern in the substrate, creating a durable negative relief replica of the pattern, extracting the resulting durable tool sleeve from a processing cell, and mounting the tool sleeve on a mounting fixture. Apparatus are disclosed for fabricating such seamless replication tools, including systems for recording a desired relief pattern on a photosensitive layer on an inner surface of a support cylinder. Also disclosed are electrodeposition cells for forming a durable tool sleeve having a desired relief pattern. The replication tool relief features may have critical dimensions down to the micron and nanometer regime.