A lithium ion secondary battery is provided. The lithium ion secondary battery includes an electrolytic tank having an accommodating space, a positive electrode disposed in the accommodating space, a negative electrode disposed in the accommodating space and spaced apart from the positive electrode, and an isolation film disposed between the positive electrode and the negative electrode. In the X-ray diffraction spectrum of a first surface of the electrolytic copper foil, a ratio of the diffraction peak intensity I(200) of the (200) crystal face of the first surface relative to the diffraction peak intensity I(111) of the (111) crystal face of the first surface is between 0.5 and 2.0. A ratio of the diffraction peak intensity I(200) of the (200) crystal face of a second surface relative to the diffraction peak intensity I(111) of the (111) crystal face of the second surface is between 0.5 and 2.0.

The present invention provides a catalyst for hydrogen peroxide decomposition with which hydrogen peroxide present in acid-containing water to be treated can be efficiently decomposed at low cost and which is less apt to dissolve away in the water being treated, can be stably used over a long period, and renders acid recovery and recycling possible. The present invention has solved the problems with a catalyst for hydrogen peroxide decomposition which is for use in decomposing hydrogen peroxide present in acid-containing water to be treated, the catalyst including a base and, a catalyst layer that is amorphous, includes a platinum-group metal having catalytic function and a Group-6 element metal having catalytic function and is formed over the base.

The present invention provides a catalyst for hydrogen peroxide decomposition with which hydrogen peroxide present in acid-containing water to be treated can be efficiently decomposed at low cost and which is less apt to dissolve away in the water being treated, can be stably used over a long period, and renders acid recovery and recycling possible. The present invention has solved the problems with a catalyst for hydrogen peroxide decomposition which is for use in decomposing hydrogen peroxide present in acid-containing water to be treated, the catalyst including a base and, a catalyst layer that is amorphous, includes a platinum-group metal having catalytic function and a Group-6 element metal having catalytic function and is formed over the base.

A method for manufacture of a gold-plated slipring contact, comprising steps of galvanic deposition of a copper layer on the electrically-conductive substrate; of a nickel and/or nickel phosphor layer on the copper layer; and of a gold layer on the nickel and/or nickel phosphor layer. While galvanically applying the copper layer on the substrate, the used galvanic bath explicitly does not include at least one of 3-carboxy-1-(phenylmethyl)pyridinium chloride sodium salt, cationic polymers with urea groups, 1-(3-sulfopropyl)pyridinium betaine, 1-(2-hydroxy-3-sulfopropyl)-pyridinium betaine, propargyl(3-sulfopropyl)ether sodium salt, sodium saccharin, sodium allylsulfonate, N,N-dimethyl-N-(3-cocoamidopropyl)-N-(2-hydroxy-3-sulfopropyl)ammonium betaine, polyamines, 1H-imidazole-polymer with (chloromethyl)oxiran, 3-carboxy-1-(phenylmethyl)pyridinium chloride sodium salt, 1-benzyl-3-sodium carboxy-pyridinium chloride, arsenic trioxide, potassium antimony tartrate, potassium tellurate, alkali arsenite, potassium tellerite, potassium seleno cyanate, alkali antimonyl tartrate, sodium selenite, thallium sulfate, and carbon disulfide, to create the outer surface of the contact that is at least an order of magnitude rougher than a surface of a conventionally-fabricated contact.

A method of plating a copper substrate with gold that reduces or eliminates the presence of microvoids at the interface of the gold/copper substrate is described. Suitably, live entry of the substrate into the plating bath is performed with application of external current to the bath such that no portion of the substrate is exposed to the bath for more than one second without the application of the external current. Increase of the applied current for gold strike to the mass-transfer-limit for gold reduction accomplishes the full measure of improvement in eliminating microvoids.

The embodiments herein relate to methods and apparatus for electroplating one or more materials onto a substrate. Typically, the embodiments herein utilize a channeled plate positioned near the substrate, creating a cross flow manifold between the channeled plate and substrate, and on the sides by a flow confinement ring. A seal may be provided between the bottom surface of a substrate holder and the top surface of an element below the substrate holder (e.g., the flow confinement ring). During plating, fluid enters the cross flow manifold through channels in the channeled plate, and through a cross flow inlet, then exits at the cross flow exit, positioned opposite the cross flow inlet. The apparatus may switch between a sealed state and an unsealed state during electroplating, for example by lowering and lifting the substrate and substrate holder as appropriate to engage and disengage the seal.

The embodiments herein relate to methods and apparatus for electroplating one or more materials onto a substrate. Typically, the embodiments herein utilize a channeled plate positioned near the substrate, creating a cross flow manifold between the channeled plate and substrate, and on the sides by a flow confinement ring. A seal may be provided between the bottom surface of a substrate holder and the top surface of an element below the substrate holder (e.g., the flow confinement ring). During plating, fluid enters the cross flow manifold through channels in the channeled plate, and through a cross flow inlet, then exits at the cross flow exit, positioned opposite the cross flow inlet. The apparatus may switch between a sealed state and an unsealed state during electroplating, for example by lowering and lifting the substrate and substrate holder as appropriate to engage and disengage the seal.

To provide a Sn-based plated steel sheet capable of exhibiting superior corrosion resistance, yellowing resistance, coating film adhesiveness, and sulphide stain resistance without using a chromate film. A Sn-based plated steel sheet of the present invention includes: a steel sheet; a Sn-based plating layer located on at least one surface of the steel sheet; and a coating layer located on the Sn-based plating layer, wherein the Sn-based plating layer contains 1.0 g/m.sup.2 to 15.0 g/m.sup.2 of Sn per side in terms of metal Sn, the coating layer contains zirconium oxide, and a content of the zirconium oxide is 1.0 mg/m.sup.2 to 10.0 mg/m.sup.2 per side in terms of metal Zr, the zirconium oxide includes zirconium oxide with an amorphous structure, and a crystalline layer whose main component is zirconium oxide with a crystalline structure is present on an upper layer of the zirconium oxide with the amorphous structure.

To provide a Sn-based plated steel sheet capable of exhibiting superior corrosion resistance, yellowing resistance, coating film adhesiveness, and sulphide stain resistance without using a chromate film. A Sn-based plated steel sheet of the present invention includes: a steel sheet; a Sn-based plating layer located on at least one surface of the steel sheet; and a coating layer located on the Sn-based plating layer, wherein the Sn-based plating layer contains 1.0 g/m.sup.2 to 15.0 g/m.sup.2 of Sn per side in terms of metal Sn, the coating layer contains zirconium oxide, and a content of the zirconium oxide is 1.0 mg/m.sup.2 to 10.0 mg/m.sup.2 per side in terms of metal Zr, the zirconium oxide includes zirconium oxide with an amorphous structure, and a crystalline layer whose main component is zirconium oxide with a crystalline structure is present on an upper layer of the zirconium oxide with the amorphous structure.

A composite material including a composite film formed on a base material, the composite film including a silver layer containing carbon particles, wherein a content of Sb in the composite film is 1 mass % or less, and a crystallite size of silver in the composite film is 40 nm or less.