A fabricating method of a non-enzyme sensor element includes a printing step, a coating step and an electroplating step. In the printing step, a conductive material is printed on a surface of a substrate to form a working electrode, a reference electrode and an auxiliary electrode, and a porous carbon material is printed on the working electrode to form a porous carbon layer. In the coating step, a graphene film material is coated on the porous carbon layer of the working electrode to form a graphene layer. In the electroplating step, a metal is electroplated on the graphene layer by a pulse constant current to form a catalyst layer including a metal oxide.

Methods for producing a conductive element precursor and a conductive element, such as a tape or wire, are provided. The methods comprise growing a plurality of carbon nanotubes on a metallic substrate and coating carbon nanotubes of the plurality of carbon nanotubes on the metallic substrate with a metallic material.

Methods for producing a conductive element precursor and a conductive element, such as a tape or wire, are provided. The methods comprise growing a plurality of carbon nanotubes on a metallic substrate and coating carbon nanotubes of the plurality of carbon nanotubes on the metallic substrate with a metallic material.

A plating system is provided. The plating system includes an electroplating chamber defining a plating region within which a wafer is plated. The electroplating chamber includes an inlet configured to introduce plating solution into the plating region of the electroplating chamber. The electroplating chamber includes an outlet configured to remove the plating solution from the plating region of the electroplating chamber. The plating system includes a barrier configured to inhibit removal of the plating solution from the plating region.

A plating system is provided. The plating system includes an electroplating chamber defining a plating region within which a wafer is plated. The electroplating chamber includes an inlet configured to introduce plating solution into the plating region of the electroplating chamber. The electroplating chamber includes an outlet configured to remove the plating solution from the plating region of the electroplating chamber. The plating system includes a barrier configured to inhibit removal of the plating solution from the plating region.

Exemplary methods of electroplating include contacting a patterned substrate with a plating bath in an electroplating chamber, where the pattern substrate includes at least one opening having a bottom surface and one or more sidewall surfaces. The methods may further include forming a nanotwin-containing metal material in the at least one opening. The metal material may be formed by two or more cycles that include delivering a forward current from a power supply through the plating bath of the electroplating chamber for a first period of time, plating a first amount of the metal on the bottom surface of the opening on the patterned substrate and a second amount of the metal on the sidewall surfaces of the opening, and delivering a reverse current from the power supply through the plating bath of the electroplating chamber to remove some of the metal plated in the opening on the patterned substrate.

Exemplary methods of electroplating include contacting a patterned substrate with a plating bath in an electroplating chamber, where the pattern substrate includes at least one opening having a bottom surface and one or more sidewall surfaces. The methods may further include forming a nanotwin-containing metal material in the at least one opening. The metal material may be formed by two or more cycles that include delivering a forward current from a power supply through the plating bath of the electroplating chamber for a first period of time, plating a first amount of the metal on the bottom surface of the opening on the patterned substrate and a second amount of the metal on the sidewall surfaces of the opening, and delivering a reverse current from the power supply through the plating bath of the electroplating chamber to remove some of the metal plated in the opening on the patterned substrate.

A wear-resistant coating film is disclosed that can maintain high wear resistance for a long period of time even when it is subjected to repetitive wear, and a method for producing the film, as well as a wear-resistant component. The wear-resistant coating film 10 includes a plated layer 11, lump parts 2, and a coat layer 13. The plated layer and the coat layer are laminated, and each of the lump parts is formed of a single particle 12 and/or an assembly of particles 12. The lump parts 2 are held by the plated layer 11 and are disposed to protrude from the plated layer 11. The coat layer 13 is formed to coat the surface of the plated layer 11, the lump parts 2 have flat portions 18, and the flat portions 18 are placed on the same plane as the surface of the coat layer 13.

A method for depositing a metal layer on a component is provided. The method includes applying an electrically conductive coating composition including a resin and metal particles on a coating region of the component; at least partially curing the resin forming an electrically conductive coating; and depositing, via an electrodeposition process, a metal layer on the electrically conductive coating.

Nanoparticle(NP)-decorated carbon nanotube (CNT) ropes used as sensing elements for hydrogen gas (H.sub.2) chemiresistors are described herein. The NP-decorated CNT rope sensors were prepared by dielectrophoretic deposition of a single semiconducting CNT rope followed by the electrodeposition of metal nanoparticles to highly disperse said nanoparticles on the CNT surfaces. The rope sensors produced a relative resistance change 20-30 times larger than what was observed at single, pure Pd nanowires. Thus, the rope sensors improved upon all H.sub.2 sensing metrics (speed, dynamic range, and limit-of-detection) relative to single Pd nanowires.