Provided is a copper foil provided with a carrier in which the laser hole-opening properties of the ultrathin copper layer are good and which is suitable for producing a high-density integrated circuit substrate. A copper foil provided with a carrier having, in order, a carrier, an intermediate layer, and an ultrathin copper layer, wherein the specular gloss at 60° in an MD direction of the intermediate layer side surface of the ultrathin copper layer is 140 or less.

Certain embodiments are described herein that are directed to articles comprising textured coatings that can enhance adhesion of a surface coating. In some examples, the textured coating comprises at least one metal or metallic compound present in a plurality of individual microstructures which can be positioned in different planes in different heights with respect to a reference zero point in the textured coating. In some configurations, a surface coating comprising a repellent material can be disposed onto the textured coating and may infuse into or grip the textured coating to enhance adhesion of the surface coating.

The present invention relates to a galvanic process additivated with nanotechnology, wherein silver nanoparticles are added to the composition of a galvanic bath (10b), capable of forming a nickel layer (101), onto which a chrome layer (102) is deposited to form a material with antibacterial properties, which may be applied in manufacturing the most varied devices or materials.

A partially plated plastic product includes a first base member and a second base member that are made of different plastic materials. The first base member includes a first corner portion having a curved wall surface. The second base member includes a second corner portion. The first and second corner portions are located on a front side of the product. The first and second base members are adjacent to each other at least at the first corner portion and the second corner portion. Only one of the first and second base members includes a metal coating film formed on a region of an outer surface of the base member with which the other base member is not in contact. The second corner portion includes a groove forming portion. The groove forming portion forms a groove between itself and at least the curved wall surface of the first corner portion.

A tin-plated copper alloy terminal material in which an Sn-based surface layer is formed on a surface of a base material that is made of copper or a copper alloy, and a Cu—Sn alloy layer and an Ni layer or an Ni alloy layer are sequentially formed between the Sn-based surface layer and the base material from the Sn-based surface layer side: the Cu—Sn alloy layer is a layer that is formed only of an intermetallic compound alloy which is obtained by substituting some of Cu in Cu.sub.6Sn.sub.5 alloy with Ni; and parts of the Cu—Sn alloy layer are exposed from the Sn-based surface layer, thereby forming a plurality of exposed portions; an average thickness of the Sn-based surface layer is from 0.2 μm to 0.6 μm (inclusive); and an area rate of the exposed portions of the Cu—Sn alloy layer relative to a surface area of is 1% to 40% (inclusive).

The present invention relates to a method for modifying the surface of a substrate made of electrically conductive metal oxide and notably made of ITO, comprising the following steps consisting in: (i) bringing into contact said surface with a solution containing copper ions (Cu.sup.2+) and ammonia then washing and optionally drying the surface thus obtained; and (ii) bringing into contact the surface obtained following step (i) with a solution containing sodium tetraborohydride then washing and optionally drying the surface of said conductive metal oxide substrate. The present invention relates to the use of such a method within the scope of the metallisation by copper of a conductive metal oxide substrate as well as the surfaces of a modified and metallised conductive metal oxide substrate thus obtained.

An electro plating device includes a pipe inside seal mechanism which occludes an inner channel of a steel pipe, a tubular insoluble electrode which is disposed in a pipe end so as to be opposite to a female screw, a plating solution feed mechanism which includes a plurality of nozzles which extend radially with a pipe axis of the steel pipe as a center, and a pipe end seal mechanism which accommodates the nozzles thereinside and is mounted to the pipe end, when viewed in the pipe axial direction, a tip of each of the nozzles is positioned between the female screw and the insoluble electrode, and each of the nozzles injects the plating solution toward a direction which intersects an extension direction of the nozzle, the direction being a rotational direction of a clockwise direction or a counterclockwise direction in which the pipe axis is the center.

The printed circuit board for the memory card includes an insulating layer; a mounting unit formed on a first surface of the insulating layer and electrically connected to a memory device; a terminal unit formed on a second surface of the insulating layer and electrically connected to electronic apparatuses of an outside; and metal layers formed at the mounting unit and the terminal unit and made of the same material.

A method of electroplating metal onto a transparent conductive oxide layer is described. The method comprises the steps of a) electroplating a zinc or zinc oxide seed layer directly onto the transparent conductive oxide layer and thereafter, b) electroplating one or more additional metal layers over the zinc layer. The one or more additional metal layers may include a cobalt strike layer electroplated over the zinc or zinc oxide seed layer and another metal layer such as copper, electroplated over the cobalt strike layer.

Provided is a copper-nickel alloy electroplating apparatus which is capable of stably forming a copper-nickel plated coating on a workpiece with a uniform composition and which enables a plating bath to be used for a long period. The present invention provides a copper-nickel alloy electroplating apparatus (1), comprising: a cathode chamber (4) in which a workpiece (5) is to be placed; an anode chamber (6); an anode (7) placed in the anode chamber; an electrically conductive diaphragm (14) placed to separate the cathode chamber and the anode chamber from each other; a cathode chamber oxidation-reduction potential adjusting tank (8) for adjusting the oxidation-reduction potential of a plating liquid in the cathode chamber; an anode chamber oxidation-reduction potential adjusting tank (10) for adjusting the oxidation-reduction potential of a plating liquid in the anode chamber; and a power supply unit (36) that provides an electric current to flow between the workpiece and the anode.