Provided is a metal film forming apparatus capable of forming a uniform metal film on a surface of a substrate by uniformly pressurizing an electrolyte membrane against the surface of the substrate. The film forming apparatus includes first and second film forming units, a coupling portion that couples the first and second film forming units together, a pressure device including a pressure unit that pressurizes substrates with electrolyte membranes of the respective film forming units via the coupling portion, and a power supply unit adapted to apply a voltage across each anode and each substrate. The film forming units are coupled to the coupling portion via their respective first elastic bodies that elastically deform in the pressurization direction of the pressure unit.

There is provided a powder supply apparatus that prevents powder from scattering as much as possible. There is provided the powder supply apparatus that supplies a powder containing a metal used for a plating to a plating solution. This powder supply apparatus includes a plating solution tank, a feed pipe, a gas supply line, and a spiral-air-flow-generating component. The plating solution tank is configured to house the plating solution. The feed pipe is configured to feed the powder into the plating solution tank. The gas supply line is configured to supply a gas. The spiral-air-flow-generating component is configured to receive the gas from the gas supply line to generate a spiral air flow heading toward the plating solution tank inside the feed pipe.

There is provided a powder supply apparatus that prevents powder from scattering as much as possible. There is provided the powder supply apparatus that supplies a powder containing a metal used for a plating to a plating solution. This powder supply apparatus includes a plating solution tank, a feed pipe, a gas supply line, and a spiral-air-flow-generating component. The plating solution tank is configured to house the plating solution. The feed pipe is configured to feed the powder into the plating solution tank. The gas supply line is configured to supply a gas. The spiral-air-flow-generating component is configured to receive the gas from the gas supply line to generate a spiral air flow heading toward the plating solution tank inside the feed pipe.

A system for controlling an electrochemical production process includes a variable controllable power circuit and an electrolytic cell. The cell includes two electrodes and operates in different states dependent on the potential difference across the electrodes. The system includes a power circuit controller that causes the power circuit to apply a given potential difference across the electrodes to initiate operation of the cell in the one of multiple possible states associated with the given potential difference. The possible states include a production state associated with a first non-zero potential difference in which a product of interest is produced, and an idle state associated with a second non-zero potential difference in which the product of interest is not produced. A monitoring and control subsystem maintains a predefined set of production process conditions, including a predefined operating temperature range, while the cell operates in both the production state and the idle state.

Systems and methods for generating return journey notifications include obtaining a request for navigational directions to a target destination. An outbound journey route from an initial location to the target destination can be determined, wherein the outbound journey route includes an estimated outbound journey time. A return journey route from the target destination to a return destination can be determined, wherein the return journey route includes an estimated return journey time. The outbound journey route and/or return journey route can be determined at least in part from one or more of current traffic conditions or historical traffic conditions. One or more notifications regarding the return journey route can be generated when comparing the estimated outbound journey time to the estimated return journey time results in a determination that one or more predetermined criteria are met.

A coating device for coating components, in particular for nickel-plating spark plug housings. The coating device includes: a housing having an outer anode that is designed to receive the component, an inner anode that can be introduced into a through-opening of the component, and a voltage-generating device, the voltage-generating device being designed to generate a first voltage between the outer anode and the component, as well as a second voltage between the inner anode and the component. The housing has an inlet and an outlet for introducing and discharging a process medium into or out of the housing.

Provided is a anodizing apparatus, including: a base configured to support a target product including a first bore that requires an anodizing surface treatment and a second bore that is connected to the first bore and excluded from the anodizing surface treatment; a working part configured to perform the anodizing surface treatment on the first bore; and a cover part configured to cover an outer surface of the target product, wherein the working part includes at least one electrode bar configured to access and enter the first bore, and a plurality of spray nozzles provided integrally with each of the at least one electrode bar and configured to selectively supply one of a degreasing solution, an electrolyte, and a cleaning solution to the first bore.

Systems and methods are provided for method for etch assisted gold (Au) through silicon mask plating (EAG-TSM). An example method comprises providing a seed layer on a substrate and providing a silicon mask on at least a portion of the seed layer on the substrate. The silicon mask includes one or more via to be filled with Au. The masked substrate is subjected to at least one processing cycle, each processing cycle including an Au plating sub-step and an etch treatment sub-step. The cycles are repeated until a selected via fill thickness is achieved.

A method of producing a metal strip coated with a coating, said coating containing chromium metal and chromium oxide and being electrolytically deposited from an electrolyte solution that contains a trivalent chromium compound and at least one salt for increasing conductivity and at least one acid or one base for setting a desired pH value, onto the metal strip by bringing the metal strip into electrolytically effective contact with the electrolyte solution during an electrolysis time. The metal strip is successively passed at a predefined strip travel speed in a strip travel direction through a plurality of electrolysis tanks successively arranged in the strip travel direction. At least the first electrolysis tank, as viewed in the strip travel direction, or a front group of electrolysis tanks is filled with a first electrolyte solution and the last electrolysis tank, as viewed in the strip travel direction, or a rear group of electrolysis tanks is filled with a second electrolyte solution. The second electrolyte solution contains no additional components apart from the trivalent chromium compound as well as the at least one salt and the at least one acid or base and is especially free of organic complexing agents and free of buffering agents.

A method of producing a metal strip coated with a coating, said coating containing chromium metal and chromium oxide and being electrolytically deposited from an electrolyte solution that contains a trivalent chromium compound and at least one salt for increasing conductivity and at least one acid or one base for setting a desired pH value, onto the metal strip by bringing the metal strip into electrolytically effective contact with the electrolyte solution during an electrolysis time. The metal strip is successively passed at a predefined strip travel speed in a strip travel direction through a plurality of electrolysis tanks successively arranged in the strip travel direction. At least the first electrolysis tank, as viewed in the strip travel direction, or a front group of electrolysis tanks is filled with a first electrolyte solution and the last electrolysis tank, as viewed in the strip travel direction, or a rear group of electrolysis tanks is filled with a second electrolyte solution. The second electrolyte solution contains no additional components apart from the trivalent chromium compound as well as the at least one salt and the at least one acid or base and is especially free of organic complexing agents and free of buffering agents.