Patent classifications
C30B15/02
Polycrystalline Silicon Fragment, Method for Manufacturing Polycrystalline Silicon Fragment, and Polycrystalline Silicon Block Fracture Device
Polycrystalline silicon fragments obtained by fracturing polycrystalline silicon blocks wherein a content ratio of polycrystalline silicon powder having a particle size of 500 to 1000 μm is 0.1 to 40 ppmw.
Polycrystalline Silicon Fragment, Method for Manufacturing Polycrystalline Silicon Fragment, and Polycrystalline Silicon Block Fracture Device
Polycrystalline silicon fragments obtained by fracturing polycrystalline silicon blocks wherein a content ratio of polycrystalline silicon powder having a particle size of 500 to 1000 μm is 0.1 to 40 ppmw.
Methods and devices for growing scintillation crystals with short decay time
The present disclosure discloses a method for growing a crystal with a short decay time. According to the method, a new single crystal furnace and a temperature field device are adapted and a process, a ration of reactants, and growth parameters are adjusted and/or optimized, accordingly, a crystal with a short decay time, a high luminous intensity, and a high luminous efficiency can be grown without a co-doping operation.
Methods and devices for growing scintillation crystals with short decay time
The present disclosure discloses a method for growing a crystal with a short decay time. According to the method, a new single crystal furnace and a temperature field device are adapted and a process, a ration of reactants, and growth parameters are adjusted and/or optimized, accordingly, a crystal with a short decay time, a high luminous intensity, and a high luminous efficiency can be grown without a co-doping operation.
Method of manufacturing single crystal
A manufacturing method of single crystal is provided with a melting process for dissolving raw material in a crucible and a pulling-up process of a single crystal from a melt by the Czochralski method. The pulling-up process includes detecting an edge line of a fusion ring, determining an approximated curve of the edge line by approximating the edge line of the fusion ring by an even function, eliminating constituent pixels of the fusion ring from the image of the fusion ring as noise, the constituent pixels being positioned on the side of the melt relative to the approximated curve and the constituent pixels of the fusion ring and a deviation between the constituent pixels and the approximated curve being a predetermined number of pixels, and calculating the center position of the single crystal from the edge line of the fusion ring from which the noise has been eliminated.
Method of manufacturing single crystal
A manufacturing method of single crystal is provided with a melting process for dissolving raw material in a crucible and a pulling-up process of a single crystal from a melt by the Czochralski method. The pulling-up process includes detecting an edge line of a fusion ring, determining an approximated curve of the edge line by approximating the edge line of the fusion ring by an even function, eliminating constituent pixels of the fusion ring from the image of the fusion ring as noise, the constituent pixels being positioned on the side of the melt relative to the approximated curve and the constituent pixels of the fusion ring and a deviation between the constituent pixels and the approximated curve being a predetermined number of pixels, and calculating the center position of the single crystal from the edge line of the fusion ring from which the noise has been eliminated.
Continuous replenishment crystal growth
An apparatus for growing a crystal includes a growth chamber and a melt chamber thermally isolated from the growth chamber. The growth chamber includes: a growth crucible configured to contain a liquid melt; and a die located in the growth crucible, the die having a die opening and one or more capillaries extending from within the growth crucible toward the die opening. The melt chamber includes: a melt crucible configured to receive feedstock material; and at least one heating element positioned within the melt chamber relative to the melt crucible to melt the feedstock material within the melt crucible to form the liquid melt. The apparatus also includes at least one capillary conveyor in fluid communication with the melt crucible and the growth crucible to transport the liquid melt from the melt crucible to the growth crucible.
RAW MATERIAL FEED HOPPER AND SINGLE CRYSTAL GROWTH SYSTEM
A raw material feed hopper according to the present embodiment may include a hollow tube having a raw material accommodating space formed therein, a supporter supporting the hollow tube, a cone accommodated in the raw material accommodating space so as to be able to lift up and down, a rod connected to the cone, a connector connected to an upper portion of the rod, a lifting rod connected to the connector, and an elevator installed on the supporter for lifting up and down the lifting rod.
RAW MATERIAL FEED HOPPER AND SINGLE CRYSTAL GROWTH SYSTEM
A raw material feed hopper according to the present embodiment may include a hollow tube having a raw material accommodating space formed therein, a supporter supporting the hollow tube, a cone accommodated in the raw material accommodating space so as to be able to lift up and down, a rod connected to the cone, a connector connected to an upper portion of the rod, a lifting rod connected to the connector, and an elevator installed on the supporter for lifting up and down the lifting rod.
SYSTEMS FOR PREPARING CRYSTALS
Embodiments of the present disclosure may provide a system for preparing a crystal. The system may include a furnace, a heat insulation drum, a crucible component, a resistance heating component, and a heat insulation layer. The heat insulation drum may be located inside the furnace. The crucible component may be located inside the heat insulation drum. The resistance heating component may include a heating body. The heating body may include a plurality of heating units. The plurality of heating units may form a uniform temperature field. The heat insulation layer may be located around an outer side of the plurality of heating units, a top portion of the heat insulation drum, and/or a bottom portion of the crucible component.