Disclosed is a composition for forming a silica layer including perhydropolysilazane (PHPS) and a solvent, wherein in an .sup.1H-NMR spectrum of the perhydropolysilazane (PHPS) in CDCl.sub.3, when a peak derived from N.sub.3SiH.sub.1 and N.sub.2SiH.sub.2 is referred to as Peak 1 and a peak derived from NSiH.sub.3 is referred to as Peak 2, a ratio (P.sub.1/(P.sub.1+P.sub.2)) of an area (P.sub.1) of Peak 1 relative to a total area (P.sub.1+P.sub.2) of the Peak 1 and Peak 2 is greater than or equal to 0.77, and when an area from a minimum point between the peaks of Peak 1 and Peak 2 to 4.78 ppm is referred to as a Region B and an area from 4.78 ppm to a minimum point of Peak 1 is referred to as a Region A of the area of Peak 1, a ratio (P.sub.A/P.sub.B) of an area (P.sub.A) of Region A relative to an area (P.sub.B) of Region B is greater than or equal to about 1.5.

Solid or liquid NH free, C-free, and Si-rich perhydropolysilazane compositions comprising units having the following formula [N(SiH.sub.3).sub.x(SiH.sub.2).sub.y], wherein x=0, 1, or 2 and y=0, 1, or 2 when x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 when x+y=3 are disclosed. Also disclosed are synthesis methods and applications for the same.

Solid or liquid NH free, C-free, and Si-rich perhydropolysilazane compositions comprising units having the following formula [N(SiH.sub.3).sub.x(SiH.sub.2).sub.y], wherein x=0, 1, or 2 and y=0, 1, or 2 when x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 when x+y=3 are disclosed. Also disclosed are synthesis methods and applications for the same.

A composition, comprising: trisilylamine and less than 5 ppmw of halogen. A method of making a silylamine comprising combining ammonia and a compound comprising aminosilane functionality, where the compound comprising aminosilane functionality is according to formula (I) R.sup.1 N(R.sup.2)a(SiH.sub.3).sub.2a (I), where R.sup.1 is an organic polymer, a C-.sub.1-20 hydrocarbyl group or SiR.sup.3.sub.3.sup.1, where R.sup.3 is C.sub.1-6 hydrocarbyl, R.sup.2 is a C-.sub.1-20 hydrocarbyl group, H, or -SiR.sup.3.sub.3.sup.1 , where R.sup.3 is as defined above, subscript a is 0 or 1, provided that R.sup.1 and R.sup.2 may be the same or different except if R.sup.1 is phenyl, R.sup.2 is not phenyl, under sufficient conditions to cause a reaction to form a silylamine and a byproduct.

A composition, comprising: trisilylamine and less than 5 ppmw of halogen. A method of making a silylamine comprising combining ammonia and a compound comprising aminosilane functionality, where the compound comprising aminosilane functionality is according to formula (I) R.sup.1 N(R.sup.2)a(SiH.sub.3).sub.2a (I), where R.sup.1 is an organic polymer, a C-.sub.1-20 hydrocarbyl group or SiR.sup.3.sub.3.sup.1, where R.sup.3 is C.sub.1-6 hydrocarbyl, R.sup.2 is a C-.sub.1-20 hydrocarbyl group, H, or -SiR.sup.3.sub.3.sup.1 , where R.sup.3 is as defined above, subscript a is 0 or 1, provided that R.sup.1 and R.sup.2 may be the same or different except if R.sup.1 is phenyl, R.sup.2 is not phenyl, under sufficient conditions to cause a reaction to form a silylamine and a byproduct.

Solid or liquid NH free, C-free, and Si-rich perhydropolysilazane compositions comprising units having the following formula [N(SiH.sub.3).sub.x(SiH.sub.2).sub.y], wherein x=0, 1, or 2 and y=0, 1, or 2 when x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 when x+y=3 are disclosed. Also disclosed are synthesis methods and applications for the same.

Solid or liquid NH free, C-free, and Si-rich perhydropolysilazane compositions comprising units having the following formula [N(SiH.sub.3).sub.x(SiH.sub.2).sub.y], wherein x=0, 1, or 2 and y=0, 1, or 2 when x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 when x+y=3 are disclosed. Also disclosed are synthesis methods and applications for the same.

Mono-substituted TSA precursor Si-containing film forming compositions are disclosed. The precursors have the formula: (SiH.sub.3).sub.2NSiH.sub.2X, wherein X is selected from a halogen atom; an isocyanato group; an amino group; an N-containing C.sub.4-C.sub.10 saturated or unsaturated heterocycle; or an alkoxy group. Methods for forming the Si-containing film using the disclosed mono-substituted TSA precursor are also disclosed.

Mono-substituted TSA precursor Si-containing film forming compositions are disclosed. The precursors have the formula: (SiH.sub.3).sub.2NSiH.sub.2X, wherein X is selected from a halogen atom; an isocyanato group; an amino group; an N-containing C.sub.4-C.sub.10 saturated or unsaturated heterocycle; or an alkoxy group. Methods for forming the Si-containing film using the disclosed mono-substituted TSA precursor are also disclosed.

A method of making an organoaminosilane compound, comprising i) combining A) a compound comprising a primary or secondary amine, B) monosilane (SiH.sub.4), and C) a catalyst, where the catalyst comprises magnesium or boron, where A), B) and C) are combined under sufficient conditions to form the organoaminosilane compound and hydrogen. A method of making a silylamine, the method comprising: i) forming an organoaminosilane compound by i) combining A) a compound comprising a primary or secondary amine, B) monosilane (SiH.sub.4), and C) a catalyst, where the catalyst comprises magnesium or boron, and ii) combining ammonia and the organoaminosilane compound produced in i) under sufficient conditions to form a silylamine product and a byproduct, where the byproduct is a primary or secondary amine.