An apparatus for producing conditioned water configured to add a pH adjuster and/or a redox potential regulator to ultrapure water to produce conditioned water, the generator including: a chemical tank configured to store a chemical solution containing the pH adjuster and/or the redox potential regulator; a chemical injection pipe configured to inject the chemical solution in the chemical tank into the ultrapure water; and a degassing device configured to degas the chemical solution injected into the ultrapure water. When producing conditioned water useful as wash water for semiconductor wafers by adding a pH adjuster and/or a redox potential regulator into ultrapure water, the present invention can solve problems such as incorporation of DO from the chemical solution, injection failure and measurement failure of the flow meter due to foaming of the chemical solution, thereby enabling stable production of conditioned water with a low DO concentration and high water quality.

A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.

A washing water supply arrangement (50) comprises an ultra-pure water production unit (54), a supply pipe (52), an operation control (53) and an ultra-pure water impellent arrangement (55). A first end of the supply pipe (52) is connected to an output from the ultra-pure water production unit (54). A second end of the supply pipe is adapted for being connected to a semiconductor washing apparatus. The operation control (53) is configured for controlling the ultra-pure water production unit (54) to produce a pre-determined amount of ultra-pure water upon demand. The ultra-pure water impellent arrangement (55) has access to a source of an inert gas and is configured for rinsing the supply pipe (52) from water with the inert gas after delivery of the pre-determined amount of ultra-pure water. A semiconductor washing system, a semiconductor production system and a method for supplying washing water are also disclosed.

Methods of filtering a feed comprising a liquid or a gas for or during the production of electronics, nanosystems or ultrapure water include filtering said feed using at least one filter assembly, wherein said at least one filter assembly includes at least one isoporous block copolymer filtration membrane.

A method of providing a dispense purified water stream from a water purification apparatus involving passing a water inlet stream through a first water purification station to provide a first internal purified water stream, passing the first internal purified water stream to an internal reservoir, and providing a second internal purified water stream from the reservoir, passing the second internal purified water stream into a recirculation loop, measuring the conductivity of the second internal purified water stream; passing the second internal purified water stream to a second water purification station to provide a third internal purified water stream passing the recirculated water return stream into the internal reservoir; calculating the purity of the first internal purified water stream using the measurement of the conductivity of the second internal purified water stream.

Processes for the production of bags containing saline solution. The processes include sealing bags with crystalline components and then sterilizing the sealed bags with crystalline components. The bags may be sterilized in an autoclave and then transported to a consumption site which produces water-for-injection (WFI) suitable for use in an IV bag. The WFI is added to the sterilized bags, dissolving the solid salt (USP-grade sodium chloride), to produce a bag with a 0.9 w/v % normal saline solution.

An arrangement for providing sterile water for injection purposes is described. A device for heating drinking water above the boiling point, a device for maintaining a chamber inner pressure which lies below the atmospheric pressure, and an electronic controller are provided, and the chamber is equipped with at least one membrane which is impermeable for liquids and a film or plate at a distance from the membrane, wherein steam which is permeated through the membrane is condensed on the film of plate. The membrane and the film or plate form a module, and the condensed water can be removed from the chamber via an outlet as sterile water for injection purposes.

A pure-water production device including: a first reverse osmosis membrane device to which water to be treated is supplied; a second reverse osmosis membrane device to which permeated water from the first reverse osmosis membrane device is supplied; an electrodeionization device to which permeated water from the second reverse osmosis membrane device is supplied; a brine tank to which concentrated water from the first reverse osmosis membrane device is supplied; and a third reverse osmosis membrane device connected to the brine tank, wherein the second reverse osmosis membrane device is a high-pressure reverse osmosis membrane device, the brine tank is supplied with at least one concentrated water selected from the group consisting of concentrated water from the second reverse osmosis membrane device and concentrated water from the electrodeionization device, wherein permeated water from the third reverse osmosis membrane device is supplied to water to be treated, is used.

The level of cleanliness of a hollow fiber membrane device is evaluated before it is installed in an ultrapure water production system. A method of evaluating the level of cleanliness of the hollow fiber membrane device includes capturing fine particles in permeating water by means of a first filter membrane, wherein the permeating water is ultrapure water that permeates through the hollow fiber membrane device before the hollow fiber membrane device is installed in an ultrapure water production system; and analyzing the fine particles that are captured by the filter membrane.

A gas dissolution supply apparatus dissolves a gas supplied from a gas supply unit in a liquid supplied from a liquid supply unit to produce a gas dissolution in a gas dissolving unit, stores the gas dissolution produced in the gas dissolving unit in a gas dissolution tank, supplies the gas dissolution from the gas dissolution tank to a point of use, measures the flow rate of a part of the gas dissolution supplied to the point of use that is returned to the gas dissolving unit, and adjusts the flow rate of the liquid supplied from the liquid supply unit to the gas dissolving unit based on the result of the measurement.