A waste fluid treatment apparatus includes a sedimentation tank that stores the processing waste fluid with the processing debris contained therein, an inflow port provided on the sedimentation tank for introduction of the processing waste fluid into the sedimentation tank, an acidification unit configured to acidify the processing waste fluid to be introduced from the inflow port into the sedimentation tank, whereby the processing debris is allowed to settle at a higher rate compared with a rate at which the processing debris would settle if the processing waste water is neutral, and an outflow port provided on the sedimentation tank for discharge of acidic supernatant that is obtained by allowing the processing debris in the processing waste fluid to settle in the sedimentation tank from the sedimentation tank.

Sorbent compositions that include a base sorbent material having a high porosity and surface area and a boron-selective agent are particularly useful for the sequestration of boron from waste materials such as coal combustion residual leachate (CCRs). By using a boron-selective agent in conjunction with a high surface area base sorbent material such as activated carbon or biochar, a sorbent composition with a high capacity for sequestering boron at relatively low cost is provided.

A method and system is provided for treating waste generated from manufacturing operations including at least one of Printed Circuit Boards Fabrication (PCB FAB), General Metal Finishing (GMF), semiconductors manufacturing, chemical milling, and Physical Vapour Deposition (PVD). The method and system are used to create zero liquid discharge recycling.

Disclosed are a substrate processing apparatus and a process fluid treating apparatus. The substrate processing apparatus includes a process chamber that processes a substrate with a process fluid including ozone, a discharge conduit connected to the process chamber to discharge the process fluid used to process the substrate, and a process fluid treating apparatus connected with the discharge conduit. The process fluid treating apparatus includes a housing having an inner space with a set volume in which the process fluid is received and an injection nozzle connecting the discharge conduit and the inner space of the housing.

Electrochemical water treatment devices are disclosed. The device includes an electrochemical separation module fluidly connectable to the source of water to be treated. The electrochemical separation module includes a first electrode, a second electrode, and a plurality of dilution compartments. Each of the dilution compartments includes a first region of ion exchange media having a first average particle size, a second region of ion exchange media having a second average particle size, and a third region of ion exchange media having a third average particle size. A volume of the second region of ion exchange media being greater than or equal to a total volume of the first and third regions of ion exchange media. Methods of facilitating treatment of water containing weakly ionized species, e.g., dissolved boron containing species and dissolved silica containing species, are disclosed. Electrochemical separation modules are also disclosed.

A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.

A metal adsorption agent including a chelating agent (A) and a chelating agent (B), wherein the chelating agent (A) is a metal adsorption agent containing a carrier having a glucamine-type functional group, and the chelating agent (B) is a metal adsorption agent containing a carrier having a thiol group, a thiourea group, an amino group, a triazabicyclodecene-inducing group, a thiouronium group, an imidazole group, a sulfonate group, a hydroxy group, an aminoacetate group, an amidoxime group, an aminophosphate group, or any combination of these groups. The carrier of each of the chelating agent (A) and the chelating agent (B) may be silica, a silica component-containing substance, polystyrene, or crosslinked porous polystyrene. The solution may contain water or an organic solvent.

A processing liquid circulating apparatus includes an ultraviolet radiation applying unit and a cleaning unit for cleaning a water flow passageway from a waste liquid tank to a clear water pump. The ultraviolet radiation applying unit includes an ultraviolet lamp, a quartz glass tube defining therein a first space surrounding the ultraviolet lamp, such that gas can be introduced into and discharged from the first space, and a frame defining therein a second space surrounding the quartz glass tube, such that clear water can be introduced into and discharged from the second space. The cleaning unit has an oxygen charge unit for charging oxygen into the first space, a first pipe interconnecting the second space and the clear water tank, and a second pipe interconnecting the ultraviolet radiation applying unit and the waste liquid tank.

A porous porphyrin polymer and a method of recovering precious metal elements using the same are described. A porous porphyrin polymer represented by Formula 1 has high selectivity for precious metal elements and a high ability to adsorb precious metal elements, and can be applied to the recovery of precious metal elements either from metal leachates of waste electronic products or from river water or seawater.

A system for providing treated water includes a water treatment unit including an inlet water quality probe, a worker bed, a probe to measure a parameter of water from the worker bed, a polisher bed connected downstream from the worker bed and having a probe to measure a parameter of water from the polisher bed, and a flow meter upstream of the worker bed or downstream of the polisher bed. A controller in communication with the flow meter and the probes is configured to receive data from same. A remote server in communication with the local water treatment unit is configured to receive data from the local water treatment unit. The controller or the server may determine a cumulative flow total, a billing cycle flow total, a current exchange flow total, a contaminant load, or a remaining capacity of the water treatment unit.