A process for the production of a fluorinated quartz glass including the steps of generating SiO.sub.2 particles in a synthesis burner; depositing the resulting SiO.sub.2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner.

A process for the production of a fluorinated quartz glass including the steps of generating SiO.sub.2 particles in a synthesis burner; depositing the resulting SiO.sub.2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner.

A method for manufacturing a large sized opaque quartz glass ingot having excellent heat ray shielding and light blocking properties without using a foaming agent. The obtained opaque quartz glass has small diameter spherical bubbles and a preferable mechanical strength. Silica powder is dispersed in water to form a slurry having a silica powder concentration of 45 to 75 wt % and the average particle size of the silica powder is adjusted to 8 μm or less and the standard deviation of the particle size is adjusted to 6 μm or more by wet pulverization. The slurry is sprayed for forming granules of the silica powder. An opaque quartz glass ingot with a small bubble diameter and high mechanical strength is obtained by melting the granulated silica powder.

A method for manufacturing a large sized opaque quartz glass ingot having excellent heat ray shielding and light blocking properties without using a foaming agent. The obtained opaque quartz glass has small diameter spherical bubbles and a preferable mechanical strength. Silica powder is dispersed in water to form a slurry having a silica powder concentration of 45 to 75 wt % and the average particle size of the silica powder is adjusted to 8 μm or less and the standard deviation of the particle size is adjusted to 6 μm or more by wet pulverization. The slurry is sprayed for forming granules of the silica powder. An opaque quartz glass ingot with a small bubble diameter and high mechanical strength is obtained by melting the granulated silica powder.

A method of manufacturing a quartz glass fibre includes producing a quartz glass primary preform by modified chemical vapor deposition (MCVD) in a quartz glass substrate tube and inserting the quartz glass primary preform into a glass jacketing tube. Defect-generating UV radiation is irridiated into the cross-sectional area of the glass jacketing tube while combining the quartz glass primary preform with the glass jacketing tube in the jacketing process to form a cladding layer to a secondary preform. A quartz glass fibre is pulled from the secondary preform.

A method of manufacturing a quartz glass fibre includes producing a quartz glass primary preform by modified chemical vapor deposition (MCVD) in a quartz glass substrate tube and inserting the quartz glass primary preform into a glass jacketing tube. Defect-generating UV radiation is irridiated into the cross-sectional area of the glass jacketing tube while combining the quartz glass primary preform with the glass jacketing tube in the jacketing process to form a cladding layer to a secondary preform. A quartz glass fibre is pulled from the secondary preform.

The present invention is a low dielectric resin substrate, which is a composite including an annealed quartz glass cloth and an organic resin, where the annealed quartz glass cloth has a dielectric loss tangent of less than 0.0010 at 10 GHz, and tensile strength of 1.0 N/25 mm or more per cloth weight (g/m.sup.2). This provides a resin substrate that includes a quartz glass cloth which has a low dielectric loss tangent and which is also excellent in tensile strength.

The present invention is an annealed quartz glass cloth that has an SiO.sub.2 content of 99.5 mass % or more, a dielectric loss tangent of less than 0.0010 at 10 GHz, and a tensile strength of 1.0 N/25 mm or more per cloth weight (g/m.sup.2). This provides an annealed quartz glass cloth that has a low dielectric loss tangent and that is also excellent in tensile strength; and a method for manufacturing an annealed quartz glass cloth by which strength recovers after a high-temperature heat treatment.

The present invention is an annealed quartz glass cloth that has an SiO.sub.2 content of 99.5 mass % or more, a dielectric loss tangent of less than 0.0010 at 10 GHz, and a tensile strength of 1.0 N/25 mm or more per cloth weight (g/m.sup.2). This provides an annealed quartz glass cloth that has a low dielectric loss tangent and that is also excellent in tensile strength; and a method for manufacturing an annealed quartz glass cloth by which strength recovers after a high-temperature heat treatment.

Method of fabricating a microfluidic device by means of inducing internal cracks in fused silica employing a picosecond laser beam, firstly utilizing irradiation of a focused temporally controlled picosecond laser beam in fused silica to generate a spatially selective modification region including randomly oriented nanocracks, then employing chemical etching to remove the irradiated area and obtain a hollow and connected three-dimensional microstructure, thereby achieving three-dimensional fabrication of microchannel structures inside the fused silica. The method can realize polarization insensitive three-dimensional uniform etching by regulating the pulse width of the picosecond laser beam, and has high chemical etch rate and selectivity, applicable for fabrication of large-sized three-dimensional microfluidic systems, high-precision 3D glass printing, etc.