C03C17/225

SPANDREL

A spandrel including a first substrate, an intermediate film made of polymer material, and a second, opaque substrate, such that the first substrate is coated with at most two layers which are deposited on the surface located on the side facing the intermediate film made of polymer material and which include at least one upper dielectric layer.

Methods for camera movement compensation

A method, system, apparatus, and/or device for adjusting or removing frames in a set of frames. The method, system, apparatus, and/or device may include: associating a first frame of a set of frames with motion data that is captured approximately contemporaneously with the first frame; when a sampling rate of the motion data is greater than a frame rate of the set of frames, aggregating a first sample of the motion data captured at the first frame and a second sample of the motion data captured between the first frame and a second frame of the set of frames to obtain a movement value; when the movement value does not exceed a first threshold value, accepting the first frame from the set of frames; and when the movement value exceeds the first threshold value, rejecting the first frame from the set of frames.

Coated articles with optical coatings having residual compressive stress

Disclosed herein are coated articles which may include a substrate and an optical coating that includes one or more layers of deposited material. At least a portion of the optical coating may include a residual compressive stress of more than 100 MPa. The coated article may include a strain-to-failure of 0.4% or more as measured by a Ring-on-Ring Tensile Testing Procedure. The optical coating may include a maximum hardness of 8 GPa or more and an average photopic transmission of 50% or greater.

Coated cover substrates and electronic devices including the same

In one or more embodiments disclosed herein, an electronic device may include a display device operable to project an image, a front cover substrate positioned over the display device and including a transparent material, and a protective coating disposed on at least a portion of the non-display area of the front cover substrate. The front cover substrate may include a display area over the display device and a non-display area around at least the perimeter of the front cover substrate. The protective coating may include an inorganic material. The protective coating may not be positioned over the display area.

Light reflection modification for fireplaces and other products

The present disclosure relates to products and methods for modifying the reflection of a light source in a fireplace and other products.

SCRATCH-RESISTANT AND OPTICALLY TRANSPARENT MATERIALS AND ARTICLES
20170355172 · 2017-12-14 ·

Embodiments of a scratch-resistant and optically transparent material comprising silicon, aluminum, nitrogen, and optionally oxygen are disclosed. In one or more embodiments, the material exhibits an extinction coefficient (k) at a wavelength of 400 nm of less than about 1×10.sup.−3, and an average transmittance of about 80% or greater, over an optical wavelength regime in the range from about 380 nm to about 780 nm, as measured through the material having a thickness of about 0.4 micrometer. In one or more embodiments, the material comprises an intrinsic maximum hardness of about 12 GPa or greater as measured on a major surface of the material having a thickness of about 400 by a Berkovich Indenter Hardness Test along an indentation depth of about 100 nm or greater, low compressive stress and low roughness (Ra). Articles and devices incorporating the material are also disclosed.

LAMINATE AND METHOD FOR PRODUCING LAMINATE

A laminate including a glass plate and a coating layer, wherein the coating layer includes one or more components selected from the group consisting of silicon nitride, titanium oxide, alumina, niobium oxide, zirconia, indium tin oxide, silicon oxide, magnesium fluoride, and calcium fluoride, wherein a ratio (dc/dg) of a thickness dc of the coating layer to a thickness dg of the glass plate is in a range of 0.05×10.sup.−3 to 1.2×10.sup.−3, and wherein a radius of curvature r1 of the laminate with negating of self-weight deflection is 10 m to 150 m.

Materials and methods for passivation of metal-plated through glass vias

A through-glass via (TGV) formed in a glass substrate may comprise a metal plating layer formed in the TGV. The TGV may have a three-dimensional (3D) topology through the glass substrate and the metal plating layer conformally covering the 3D topology. The TGV may further comprise a barrier layer disposed over the metal plating layer, and a metallization layer disposed over the barrier layer. The metallization layer may be electrically coupled to the metal plating layer through the barrier layer. The barrier layer may comprise a metal-nitride film disposed on the metal plating layer that is electrically coupled to the metallization layer. The barrier layer may comprise a metal film disposed over the metal plating layer and over a portion of glass surrounding the TGV, and an electrically-insulating film disposed upon the metal film, the electrically-insulating film completely overlapping the metal plating layer and partially overlapping the metal film.

GLASS, GLASS-CERAMIC AND CERAMIC ARTICLES WITH GRADED PROTECTIVE COATINGS HAVING HARDNESS AND STRENGTH

An article is described herein that includes: a substrate having a glass, glass-ceramic or a ceramic composition and comprising a primary surface; and a protective film disposed on the primary surface. The protective film comprises a thickness of greater than 1.5 microns and a maximum hardness of greater than 15 GPa at a depth of 500 nanometers, as measured on the film disposed on the substrate. Further, the protective film comprises a metal oxynitride that is graded such that an oxygen concentration in the film varies by 1.3 or more atomic %. In addition, the substrate comprises an elastic modulus less than an elastic modulus of the film.

Method and an apparatus for producing a film of carbon nitride material

A method of producing a film of carbon nitride material, including the steps of providing a precursor of the carbon nitride material in a reacting vessel and a substrate substantially above the precursor of the carbon nitride material; heating the reacting vessel, the precursor of the carbon nitride material and the substrate at the first predetermined temperature; and quenching the reacting vessel to reach the second predetermined temperature; wherein the film of carbon nitride material is formed on a surface of the substrate during the quenching of the reacting vessel.