A method of manufacturing a coated glass pane comprising the following steps in sequence a) providing a glass substrate, b) depositing by chemical vapour deposition (CVD) at least one CVD coating on a surface of the glass substrate using titanium tetraisopropoxide (TTIP) as a precursor, and c) depositing by physical vapour deposition (PVD) at least one PVD coating on said at least one CVD coating.

Disclosed are methods of fabricating an integrated computational element for use in an optical computing device. One method includes providing a substrate that has a first surface and a second surface substantially opposite the first surface, depositing multiple optical thin films on the first and second surfaces of the substrate via a thin film deposition process, and thereby generating a multilayer film stack device, cleaving the substrate to produce at least two optical thin film stacks, and securing one or more of the at least two optical thin film stacks to a secondary optical element for use as an integrated computational element (ICE).

In these metal oxide microparticles, surfaces of microparticles of a metal oxide are modified by a fatty acid having 5 or more and 14 or less carbon atoms and having a branched chain, the metal oxide is metal oxides of a plurality of kinds of metals selected from the group consisting of Zn, In, Sn, and Sb, and an average particle diameter of the microparticles is 80 nm or less. In a dispersion for forming an infrared-shielding film, the metal oxide microparticles are dispersed in a hydrophobic solvent, and a light transmittance in a wavelength range of 800 nm to 1,100 nm is 20% or more and less than 70%.

Aspects of the present disclosure relate generally to methods and apparatus of processing transparent substrates, such as glass substrates. In one implementation, a film stack for optical devices includes a glass substrate including a first surface and a second surface. The film stack includes a device function layer formed on the first surface, a hard mask layer formed on the device function layer, and a substrate recognition layer formed on the hard mask layer. The hard mask layer includes one or more of chromium, ruthenium, or titanium nitride. The film stack includes a backside layer formed on the second surface. The backside layer formed on the second surface includes one or more of a conductive layer or an oxide layer.

Aspects of the present disclosure relate generally to methods and apparatus of processing transparent substrates, such as glass substrates. In one implementation, a film stack for optical devices includes a glass substrate including a first surface and a second surface. The film stack includes a device function layer formed on the first surface, a hard mask layer formed on the device function layer, and a substrate recognition layer formed on the hard mask layer. The hard mask layer includes one or more of chromium, ruthenium, or titanium nitride. The film stack includes a backside layer formed on the second surface. The backside layer formed on the second surface includes one or more of a conductive layer or an oxide layer.

A method of making a coated substrate having a transparent conductive oxide layer with a dopant selectively distributed in the layer includes selectively supplying an oxide precursor material and a dopant precursor material to each coating cell of a multi-cell chemical vapor deposition coater, wherein the amount of dopant material supplied is selected to vary the dopant content versus coating depth in the resultant coating.

A material includes a glass sheet coated on at least part of one of its faces with a stack of thin layers, the stack being coated on at least part of its surface with an enamel layer including zinc and less than 5% by weight of bismuth oxide, the stack further including, in contact with the enamel layer, a layer, called contact layer, which is based on an oxide, the physical thickness of the contact layer being at least 5 nm.

The present invention relates to a coated substrate comprising: a substrate; a soft coating provided on at least a part of at least one face of the substrate; a protective sol-gel coating provided on at least a part of said face above the soft coating, to a process for making such coated substrate and to glazing units comprising such coated substrate.

An article that includes: an inorganic oxide substrate having opposing major surfaces; and an optical film structure disposed on a first major surface of the substrate, the optical film structure comprising one or more of a silicon-containing oxide, a silicon-containing nitride and a silicon-containing oxynitride and a physical thickness from about 50 nm to less than 500 nm. The article exhibits a hardness of 8 GPa or greater measured at an indentation depth of about 100 nm or a maximum hardness of 9 GPa or greater measured over an indentation depth range from about 100 nm to about 500 nm, the hardness and the maximum hardness measured by a Berkovich Indenter Hardness Test. Further, the article exhibits a single-side photopic average reflectance that is less than 1%.

Disclosed herein is method for fabricating a graphene layer on a non-graphene carbon layer including steps of cleaning and seeding a substrate, depositing a crystalline diamond on the substrate, sputtering an aluminum layer on the crystalline diamond, where the aluminum layer is greater than 5 nanometers and less than 50 nanometers; and treating a surface of the aluminum layer with an ion beam resulting in a graphene layer on the crystalline diamond.