A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N.sub.2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×10.sup.16 ions/cm.sup.2 and −5.00×10.sup.15×A/kV+2.00×10.sup.17 ions/cm.sup.2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.

A quartz glass crucible (1) includes: a cylindrical crucible body (10) which has a bottom and is made of quartz glass; and a first crystallization-accelerator-containing coating film (13A) which is formed on an inner surface (10a) so as to cause an inner crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the inner surface (10a) of the crucible body (10) by heating during a step of pulling up the silicon single crystal by a Czochralski method. The quartz glass crucible is intended to withstand a single crystal pull-up step undertaken for a very long period of time.

A method for structuring a decorative or technical pattern in the thickness of an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material, wherein the object is made of an at least partially transparent material including a top surface and a bottom surface which extends away from the top surface. The top or bottom surfaces is provided with a mask defining an opening whose outline corresponds to the profile of the pattern to be structured, the mask covering the top or bottom surface at the positions which are not to be structured. The pattern is structured with a mono- or multicharged ion beam through the opening of the mask, wherein the mechanical properties of the mask are sufficient to prevent the ions of the ion beam from etching the top or bottom surface at the positions where this top or bottom surface is covered by the mask.

A method of implanting ions to modify the invading ion surface layer concentration of a chemically strengthened glass substrate, where the ions are selected from the group consisting of N, H, O, He, Ne, Ar, and Kr and are implanted in the chemically strengthened glass substrate with a dosage between 10.sup.14 ions/cm.sup.2 and 10.sup.18 ions/cm.sup.2, and an acceleration voltage between 5 kV and 100 kV.

In an exemplary embodiment, a quartz glass crucible 1 includes: a cylindrical crucible body 10 which has a bottom and is made of quartz glass; and a first crystallization-accelerator-containing coating film 13A which is formed on an inner surface 10a so as to cause an inner crystal layer composed of an aggregate of dome-shaped or columnar crystal grains to be formed on a surface-layer portion of the inner surface 10a of the crucible body 10 by heating during a step of pulling up the silicon single crystal by a Czochralski method. The quartz glass crucible is capable of withstanding a single crystal pull-up step undertaken for a very long period of time.

The invention relates generally to optically high transparency and high haze structures and, more particularly, to plastic, e.g., polymer, and glass structures having a sub-wavelength texture formed on a surface thereof, which is effective to impart the optical properties of high transparency and high haze to the structures. The texture is in a grass-like or needle-like form. Additionally, the optically high transparency and high haze structures may include a transparent conductor. Furthermore, the glass structures may exhibit a self-cleaning function.

In some implementations, a carbon-containing glass material includes a surface-to-air interface and an interphase region extending from the surface-to-air interface along a direction to a depth within the carbon-containing glass material. The surface-to-air interface may be exposed to ambient air, and the interphase region may include a plurality of few layer graphene (FLG) nanoplatelets formed in response to recombination and/or self-nucleation of a plurality of carbon-containing radicals implanted within the interphase region. The FLG nanoplatelets have a non-periodic orientation configured to at least partially inhibit formation or propagation of microcracks and/or micro-voids in the carbon-containing glass material. The glass material may also include a compressive stress layer disposed between the interphase region and the surface-to-air interface of the carbon-containing glass material, the compressive stress layer induced by ion bombardment of the carbon-containing glass material by a plurality of ionized inert gas particles.

The invention relates generally to optically high transparency and high haze structures and, more particularly, to plastic, e.g., polymer, and glass structures having a sub-wavelength texture formed on a surface thereof, which is effective to impart the optical properties of high transparency and high haze to the structures. The texture is in a grass-like or needle-like form. Additionally, the optically high transparency and high haze structures may include a transparent conductor. Furthermore, the glass structures may exhibit a self-cleaning function.

A method for structuring a decorative or technical pattern in the thickness of an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material, wherein the object is made of an at least partially transparent material including a top surface and a bottom surface which extends away from the top surface. The top or bottom surfaces is provided with a mask defining an opening whose outline corresponds to the profile of the pattern to be structured, the mask covering the top or bottom surface at the positions which are not to be structured. The pattern is structured with a mono- or multicharged ion beam through the opening of the mask, wherein the mechanical properties of the mask are sufficient to prevent the ions of the ion beam from etching the top or bottom surface at the positions where this top or bottom surface is covered by the mask.

Methods for manufacturing and/or reinforcing a carbon-containing glass material are disclosed. The method includes supplying a non-thermal equilibrium plasma including a plurality of positive charged gas particles and a plurality of ionized inert gas particles into a reaction chamber, and accelerating at least the plurality of positive charged gas particles through the reaction chamber based on application of an external electric potential to the non-thermal equilibrium plasma. The method includes bombarding a surface-to-air interface of the glass material with the accelerated positive charged gas particles and the ionized inert gas particles, and forming an interphase region in the glass material in response to the bombardment. The method includes forming a compressive stress layer in the glass material in response to the bombardment by at least the ionized inert gas particles. The compressive stress layer may be disposed between the interphase region and the surface-to-air interface of the carbon-containing glass material.