A vacuum insulated glazing unit comprising a first glass pane and a second glass pane arranged in parallel, the second glass pane spaced apart from the first glass pane, wherein each glass pane comprises inner and outer surfaces, wherein the inner surfaces define a gap therebetween; a plurality of spacers arranged in the gap between of the inner surface of the first glass pane and the inner surface of the second glass pane; and a side seal material attached around a periphery of the first glass pane and the second glass pane, thereby forming a sealed cavity between the glass panes, wherein at least a portion of the inner surface of the first glass pane comprises a strengthened portion that comprises a plurality of implanted ions, wherein the plurality of implanted ions are nitrogen ions, carbon ions, argon ions, or a combination comprising at least one of the foregoing.

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said substrate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.

The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 10.sup.14 ions/cm.sup.2 and 2.510.sup.17 ions/cm.sup.2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.

The invention relates generally to optically high transparency and high haze structures and, more particularly, to plastic, e.g., polymer, and glass structures having a sub-wavelength texture formed on a surface thereof, which is effective to impart the optical properties of high transparency and high haze to the structures. The texture is in a grass-like or needle-like form. Additionally, the optically high transparency and high haze structures may include a transparent conductor. Furthermore, the glass structures may exhibit a self-cleaning function.

Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.

A method for single or multiply charged ion implantation into a surface of a treated object, and a device for implementing the implantation method, the method including: directing towards the surface of the treated object an ion beam produced by an ion source of the electronic cyclotron resonance type; producing at least one primary electron beam and directing the primary electron beam so that it passes through the ion beam; and producing a secondary electron beam by reflecting the primary electron beam onto a target once the primary electron beam has traversed the ion beam, the target being oriented such that the secondary electron beam falls onto the surface of the treated object.

A method of treating a glass cylinder for a piston-cylinder arrangement for reducing the friction of a piston on an inner cylinder wall of the glass cylinder includes: elevating surface energy of glass of an interior bounded by the inner cylinder wall and hence lowering a contact angle of the glass with water. The contact angle is lowered by: a gas discharge that acts on the glass at the inner cylinder wall and is generated by an electric or electromagnetic field; or the action of ozone on the glass surface. The glass with the lowered contact angle is contacted with water to form a water film on the contacted glass.

Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.

The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said sub-strate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.

A hollow body includes a wall of glass which at least partially surrounds an interior volume of the hollow body. The wall of glass has a wall surface which has a surface region. At least in the surface region the wall surface has a content of N in a range from 0.3 to 10.0 at-%, and at least 5 at-% Si.