Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.

Described herein is functionalized glass allowing for robust attachment of extracellular matrix proteins (ECM) withstanding extended culturing periods. By first treating glass with a sulfur silane reagent, the treated glass can be activated via an amine-sulfur linker, after which ECM proteins are attached to the linker. The Inventors observed that this glass treatment combination (sulfur silane-linker-ECM) resisted degradation when compared to conventional surface coatings, such as poly-L-orthinine coated glass.

A plasma etching method using a Faraday cage, comprising: providing a Faraday cage having a mesh portion on an upper surface thereof in a plasma etching apparatus; providing a quartz substrate having a metal mask with an opening provided on one surface of the metal mask in the Faraday cage; and patterning the quartz substrate with plasma etching.

Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optical grating layer, and forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled trenches disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the optical grating layer. The method may further include delivering light from a light source into the optical grating layer, and measuring at least one of: an undiffracted portion of the light exiting the optical grating layer, and a diffracted portion of the light exiting the optical grating layer.

A method includes: providing a glassy element including a glass mesh structure and gap fillers at least at an interface area; heating the glassy element to a temperature whereas the gap fillers are mobilized in relation to the glass mesh structure; employing a radio-frequency plasma process that utilizes a plasma; and exposing the interface area to kinetic interaction members having a kinetic energy, whereby the kinetic interaction members interact with the gap fillers, whereby gap fillers are removed from the glass mesh structure, the kinetic interaction members are selected from the group consisting of noble gas ions, including any combinations thereof, the kinetic interaction members are the plasma or are resulting from the plasma and are directed to the interface area of the glassy element as effect of having a velocity with a vector pointing towards the respective interface area of the glassy element.

A method of treating a glass cylinder for a piston-cylinder arrangement for reducing the friction of a piston on an inner cylinder wall of the glass cylinder includes: elevating surface energy of glass of an interior bounded by the inner cylinder wall and hence lowering a contact angle of the glass with water. The contact angle is lowered by: a gas discharge that acts on the glass at the inner cylinder wall and is generated by an electric or electromagnetic field; or the action of ozone on the glass surface. The glass with the lowered contact angle is contacted with water to form a water film on the contacted glass.

A method of making a device substrate article having a device modified substrate supported on a glass carrier substrate, including: treating at least a portion of the first surface of a device substrate, at least a portion of a first surface of a glass carrier, or a combination thereof, wherein the treating produces a surface having: silicon; oxygen; carbon; and fluorine amounts; and a metal to fluorine ratio as defined herein; contacting the treated surface with an untreated or like-treated counterpart device substrate or glass carrier substrate to form a laminate comprised of the device substrate bonded to the glass carrier substrate; modifying at least a portion of the non-bonded second surface of the device substrate of the laminate with at least one device surface modification treatment; and separating the device substrate having the device modified second surface from the glass carrier substrate.

An object cutting method includes: a first step of preparing an object to be processed including a single crystal silicon substrate and a functional device layer provided on a first main surface side; a second step of irradiating the object with laser light to form at least one row of modified regions in the single crystal silicon substrate and to form a fracture in the object so as to extend between the at least one row of modified regions and a second main surface of the object; a third step of forming an etching protection layer having a gas passing region formed, on the second main surface; and a fourth step of performing dry etching on the object from the second main surface side, in a state in which the etching protection layer is formed on the second main surface, to form a groove opening to the second main surface.

A hollow body includes a wall of glass which at least partially surrounds an interior volume of the hollow body. The wall of glass has a wall surface which has a surface region. At least in the surface region the wall surface has a content of N in a range from 0.3 to 10.0 at-%, and at least 5 at-% Si.

A plasma treatment method is provided. The method includes generating a planar plasma in a plasma treatment chamber, observing an effective influence region of the planar plasma by using an optical observation system in which an observation lens has a transparent substrate and a fluorescent coating thereon, adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma, and then adjusting a location of the observation lens to observe a brightness change of the fluorescent coating and the transparent substrate to obtain a location and a thickness range of the effective influence region of the planar plasma. A location of a sample is adjusted to within the effective influence region, and a plasma treatment is then performed on the sample.