A cesium tungsten oxide film has high heat ray shielding performance and a radio wave transmissivity, and a method for manufacturing a cesium tungsten oxide film capable of manufacturing such film by a dry method. A cesium tungsten oxide film including cesium, tungsten and oxygen as main components, wherein, an atomic ratio of the cesium and the tungsten is Cs/W, which is 0.1 or more and 0.5 or less, and the cesium tungsten oxide film is having a hexagonal crystal structure. A method for manufacturing a cesium tungsten oxide film including cesium, tungsten and oxygen as main components, including: a film deposition process using a cesium tungsten oxide target; and a heat treatment process for heat-treating the film at a temperature of 400 C. or more and less than 1000 C., wherein either the film deposition process or the heat treatment process is performed in an atmosphere containing oxygen.

The present invention includes a method of creating electrical air gap low loss low cost RF mechanically and thermally stabilized interdigitated resonate filter in photo definable glass ceramic substrate. Where a ground plane may be used to adjacent to or below the RF filter in order to prevent parasitic electronic signals, RF signals, differential voltage build up and floating grounds from disrupting and degrading the performance of isolated electronic devices by the fabrication of electrical isolation and ground plane structures on a photo-definable glass substrate.

A method for manufacturing a substrate is disclosed. The method comprises the following steps: step one, depositing an amorphous silicon layer on a base material; step two, depositing a silicon dioxide layer with a first thickness on the amorphous silicon layer; and step three, etching the silicon dioxide layer until a thickness thereof is reduced to a second thickness. According to the method of the present disclosure, the silicon dioxide layer with a needed thickness can be manufactured on the amorphous silicon layer. When the ELA procedure is performed, the silicon dioxide layer has an enough thickness to prevent the formation of protrusions at grain boundary of polysilicon, so that the semi-conductive layer manufactured therein can have a relatively low roughness.

The present invention includes a method of creating electrical air gap low loss low cost RF mechanically and thermally stabilized interdigitated resonate filter in photo definable glass ceramic substrate. Where a ground plane may be used to adjacent to or below the RF filter in order to prevent parasitic electronic signals, RF signals, differential voltage build up and floating grounds from disrupting and degrading the performance of isolated electronic devices by the fabrication of electrical isolation and ground plane structures on a photo-definable glass substrate.

The present invention is a method for producing a quartz glass crucible for pulling a single crystal silicon from a silicon melt held therein, including the steps of: producing a quartz glass crucible having an outer layer including an opaque quartz glass containing bubbles therein and an inner layer including a transparent quartz glass containing substantially no bubbles; roughening a region of an inner surface of the produced quartz glass crucible, the region being in contact with the silicon melt when holding the silicon melt; and heating the quartz glass crucible having the roughened inner surface to crystallize a surface of the roughened region. This can produce a quartz glass crucible for pulling a single crystal silicon which can suppress generation of a brown ring on the inner surface of the crucible during pulling the single crystal silicon and can suppress crystallinity disorder of the single crystal silicon.

A method of manufacturing a laminated glass article is disclosed that includes forming a laminated glass article with at least one glass cladding layer and a glass core layer adhered to the glass cladding layer. The glass core layer is amenable to crystallization and optionally has a viscosity amenable to forming by a fusion lamination method. The method further includes removing a portion of the laminated glass article such that the glass core layer is exposed on at least one edge of the laminated glass article, and crystallizing at least a portion of the exposed glass core layer. A crystallized or semi-crystallized surface of the exposed glass core layer has a lower CTE than a remainder of the glass core layer. A laminated glass article and a glass article having a crystalline or semi-crystalline surface portion that is integral with a bulk of the glass body are also disclosed.

A quartz glass crucible (1) includes: a crucible body (10) made of silica glass; and a crystallization-accelerator-containing layer (13) formed on an outer surface of the crucible body (10). A concentration of a crystallization accelerator contained in the crystallization-accelerator-containing layer (13) is 1.0?10.sup.13 atoms/cm.sup.2 or more and 4.8?10.sup.15 atoms/cm.sup.2 or less. The quarts glass crucible is intended to be capable of not only enduring a single crystal pulling-up process that takes a very long time, such as multi-pulling, but also stably controlling the oxygen concentration and crystal diameter of a silicon single crystal by eliminating a gap between the carbon susceptor and the crucible as much as possible.

A method of manufacturing a laminated glass article is disclosed that includes forming a laminated glass article with at least one glass cladding layer and a glass core layer adhered to the glass cladding layer. The glass core layer is amenable to crystallization and optionally has a viscosity amenable to forming by a fusion lamination method. The method further includes removing a portion of the laminated glass article such that the glass core layer is exposed on at least one edge of the laminated glass article, and crystallizing at least a portion of the exposed glass core layer. A crystallized or semi-crystallized surface of the exposed glass core layer has a lower CTE than a remainder of the glass core layer. A laminated glass article and a glass article having a crystalline or semi-crystalline surface portion that is integral with a bulk of the glass body are also disclosed.

Embodiments are related to scalable surface structure (e.g., a well or other structure) formation in a substrate and, more particularly, to systems and methods for forming displays using a photo-machinable material layer.

A method for manufacturing a substrate is disclosed. The method comprises the following steps: step one, depositing an amorphous silicon layer on a base material; step two, depositing a silicon dioxide layer with a first thickness on the amorphous silicon layer; and step three, etching the silicon dioxide layer until a thickness thereof is reduced to a second thickness. According to the method of the present disclosure, the silicon dioxide layer with a needed thickness can be manufactured on the amorphous silicon layer. When the ELA procedure is performed, the silicon dioxide layer has an enough thickness to prevent the formation of protrusions at grain boundary of polysilicon, so that the semi-conductive layer manufactured therein can have a relatively low roughness.