A laser texturing process modifies the surface of a semiconductor wafer-handling device so that flatness is maintained, but controlled roughness is imparted to prevent unwanted wafer sticking. The laser texturing may be from a thermal laser, a cold ablation laser, or either laser modified with an inert cover gas. The laser etches or burns away a portion or fraction of a flat surface, thereby reducing the area of contact to the semiconductor wafer and thereby reducing friction and sticking. The etched or burned-away portion is thus at a reduced, relieved or lower elevation than the unaffected portion. The laser texturing may take the form of a plurality of channels cut into the surface, or a plurality of holes. Laser machining can yield a semiconductor wafer handling device having finer detail than can be produced by other shaping techniques, with feature sizes on the order of 50 microns being achievable.

The present invention relates to a kit of parts comprising a dental mill blank comprising a porous zirconia material and a colouring solution for colouring the porous zirconia material. The porous zirconia material comprises Zr oxide calculated as ZrO2: from 80 to 97 wt.-%, Al oxide calculated as Al2O3: from 0 to 0.15 wt.-%, Y oxide calculated as Y2O3: from 1 to 10 wt.-%, Bi oxide calculated as Bi2O3: from 0.01 to 0.2 wt.-%, the porous zirconia material not comprising Fe calculated as Fe2O3 in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the porous zirconia material. The colouring solution comprises solvent(s), colouring agent(s) comprising metal ions selected from Tb, Er, Pr, Mn or combinations thereof, the solution not comprising Fe ions in an amount of more than 0.01 wt.-%, the solution not comprising Bi ions in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the colouring solution. The invention also relates to a process of producing a dental restoration, the process comprising the steps: providing a dental mill blank comprising a porous zirconia material as described in any of the preceding claims, machining an article out of the porous zirconia material, the article having the shape of a dental restoration with an outer and inner surface, providing a colouring solution as described in any of the preceding claims, applying the colouring solution to at least portions of the surface of the article having the shape of a dental restoration.

The present invention relates to a kit of parts comprising a dental mill blank comprising a porous zirconia material and a colouring solution for colouring the porous zirconia material. The porous zirconia material comprises Zr oxide calculated as ZrO2: from 80 to 97 wt.-%, Al oxide calculated as Al2O3: from 0 to 0.15 wt.-%, Y oxide calculated as Y2O3: from 1 to 10 wt.-%, Bi oxide calculated as Bi2O3: from 0.01 to 0.2 wt.-%, the porous zirconia material not comprising Fe calculated as Fe2O3 in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the porous zirconia material. The colouring solution comprises solvent(s), colouring agent(s) comprising metal ions selected from Tb, Er, Pr, Mn or combinations thereof, the solution not comprising Fe ions in an amount of more than 0.01 wt.-%, the solution not comprising Bi ions in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the colouring solution. The invention also relates to a process of producing a dental restoration, the process comprising the steps: providing a dental mill blank comprising a porous zirconia material as described in any of the preceding claims, machining an article out of the porous zirconia material, the article having the shape of a dental restoration with an outer and inner surface, providing a colouring solution as described in any of the preceding claims, applying the colouring solution to at least portions of the surface of the article having the shape of a dental restoration.

A method of decontaminating a lithium conducting ceramic oxide material. The method includes soaking the lithium conducting ceramic oxide material having a first thickness of surface contaminants in a first organic solvent containing an inorganic salt at an inorganic salt concentration to obtain a soaked lithium conducting ceramic oxide material. The method further includes rinsing the soaked lithium conducting ceramic oxide material in a second organic solvent to obtain a decontaminated lithium conducting ceramic oxide material having a second thickness of surface contaminants less than the first thickness of surface contaminants.

A method for forming a protective coating on a surface of a ceramic substrate includes combining a rare-earth oxide, alumina, and silica to form a powder, etching the surface of the ceramic substrate, applying the powder on the etched surface in an amount of from about 0.001 to about 0.1 g/cm.sup.2 to reduce capture of bubbles from off-gassing of the ceramic substrate, heating the powder for a time of from about 5 to about 60 minutes to a temperature at or above the melting point such that the powder melts and forms a molten coating on the surface that has a minimized number of bubbles, and cooling the molten coating to ambient temperature to form the protective coating disposed on and in direct contact with the surface of the ceramic substrate such that the protective coating has a thickness of less than about 1 mil.

A method for forming a protective coating on a surface of a ceramic substrate includes combining a rare-earth oxide, alumina, and silica to form a powder, etching the surface of the ceramic substrate, applying the powder on the etched surface in an amount of from about 0.001 to about 0.1 g/cm.sup.2 to reduce capture of bubbles from off-gassing of the ceramic substrate, heating the powder for a time of from about 5 to about 60 minutes to a temperature at or above the melting point such that the powder melts and forms a molten coating on the surface that has a minimized number of bubbles, and cooling the molten coating to ambient temperature to form the protective coating disposed on and in direct contact with the surface of the ceramic substrate such that the protective coating has a thickness of less than about 1 mil.

A method of processing a ceramic matrix composite (CMC) component includes extracting silicon from a surface region of the CMC component such that free silicon is present in the surface region at a reduced amount of about 5 vol. % or less. The extraction comprises contacting the surface region with a wicking medium comprising an element reactive with silicon. The extraction is carried out at an elevated temperature prior to assembling the CMC component with a metal component.

A method of processing a ceramic matrix composite (CMC) component includes extracting silicon from a surface region of the CMC component such that free silicon is present in the surface region at a reduced amount of about 5 vol. % or less. The extraction comprises contacting the surface region with a wicking medium comprising an element reactive with silicon. The extraction is carried out at an elevated temperature prior to assembling the CMC component with a metal component.

A housing for a portable electronic device is disclosed. The housing is composed of yttria-sensitized zirconia. Yttria-sensitized zirconia has from about 1.5 to about 2.5 mole percent yttria, and more typically about 2 mole percent yttria, and most typically 2 mole percent yttria, in zirconia. Yttria-sensitized zirconia is both tough and able to limit the formation and propagation of micro-cracks. Methods for manufacturing yttria-sensitized zirconia composed housings are also disclosed.

A housing for a portable electronic device is disclosed. The housing is composed of yttria-sensitized zirconia. Yttria-sensitized zirconia has from about 1.5 to about 2.5 mole percent yttria, and more typically about 2 mole percent yttria, and most typically 2 mole percent yttria, in zirconia. Yttria-sensitized zirconia is both tough and able to limit the formation and propagation of micro-cracks. Methods for manufacturing yttria-sensitized zirconia composed housings are also disclosed.